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IEEE

IEEE International Integrated Reliability Workshop (IIRW)

Location: South Lake Tahoe , United States

Submission deadline: 7/9/2022

Conference dates: 10/9/2022 - 10/14/2022

Research H-index
5

Ranking & Metrics

Discipline name Position Best Scientists Publications D-Index
Materials Science 88 13 22 3
Electronics and Electrical Engineering 387 35 48 5
Engineering and Technology 610 4 7 1

Call for Papers

The IIRW technical program and management committee invites abstracts related to the many areas of semiconductor reliability, such as:

FOCUS AREA: Circuit reliability, device-circuit degradation, aging

FOCUS AREA: In-memory computing and neuromorphic reliability

FOCUS AREA: Plasma-induced damage, electrostatic discharge

FEOL/MOL/BEOL dielectrics (high-k, SiO 2 , SiON, low-k)

FET, FinFET, SOI, III-V, SiGe reliability (HC, BTI, TDDB, RTN, etc.)

Conventional and emerging memories (Flash, RRAM, etc.)

Emerging technologies and devices (2D materials, IGZO, etc.)

Power, wide-bandgap (SiC, GaN, etc.) devices reliability and circuits reliability

RF and mm/sub-mm Wave devices reliability and circuits reliability

Modeling and simulation of reliability, including self-heating

Process integration reliability

Failure analysis and advanced packaging reliability

Impact of devices degradation on circuit reliability

Design-in-reliability (products, circuits, systems, processes)

Advanced automotive circuits, systems, products reliability

Customer/manufacturer product reliability requirements

Wafer-level reliability tests for monitoring and qualification

Overview

This ranking presents a comprehensive evaluation of scientific conferences within the field of Engineering and Technology, meticulously compiled by Research.com—a recognized leader in providing trustworthy data and insights on scientific research since 2014. The ranking showcases the most influential conferences, helping scholars, professionals, and academic institutions identify events that consistently drive high-impact research and foster the participation of prominent scientists.

Conference positions are determined using a proprietary bibliometric score uniquely developed by Research.com. This score is calculated based on a combination of the estimated h-index and the number of leading scientists who have contributed to conference proceedings during the preceding three years. By integrating these factors, the ranking prioritizes conferences that not only have significant scholarly output but also attract ongoing engagement from reputable researchers in the domain.

The current Impact Score values incorporate data gathered as of November 27, 2024. The rigorous process for ranking entailed an in-depth assessment of over 2,262 conferences, selected through detailed scrutiny of more than 26,934 scientific documents published during the last three years. These materials represent the work of 9,385 leading and widely respected scientists specializing in Engineering and Technology. Such a broad and methodologically robust examination ensures that the resulting rankings accurately reflect both the quality and influence of each conference within its research landscape.

For a comprehensive understanding of how the ranking scores are computed, as well as a detailed breakdown of the underlying methodology and evaluation criteria, please refer to our Methodology Page.

Papers citation over time

A key indicator for each conference is its effectiveness in reaching other researchers with the papers published at that venue.

The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.

The top authors publishing at International Integrated Reliability Workshop (based on the number of publications) are:

  • Kuan-Cheng Su (4 papers) published 4 papers at the last edition,
  • Gerard Ghibaudo (4 papers) published 4 papers at the last edition,
  • Joseph Bernstein (3 papers) published 3 papers at the last edition,
  • Gennadi Bersuker (3 papers) published 3 papers at the last edition,
  • D. Ney (2 papers) published 2 papers at the last edition.

The overall trend for top authors publishing at this conference is outlined below. The chart shows the number of publications at each edition of the conference for top authors.

Only papers with recognized affiliations are considered

The top affiliations publishing at International Integrated Reliability Workshop (based on the number of publications) are:

  • STMicroelectronics (10 papers) published 10 papers at the last edition,
  • United Microelectronics Corporation (6 papers) published 6 papers at the last edition,
  • University of Maryland, College Park (4 papers) published 4 papers at the last edition,
  • Infineon Technologies (4 papers) published 4 papers at the last edition,
  • Samsung (3 papers) published 3 papers at the last edition.

The overall trend for top affiliations publishing at this conference is outlined below. The chart shows the number of publications at each edition of the conference for top affiliations.

Publication chance based on affiliation

The publication chance index shows the ratio of articles published by the best research institutions at the conference edition to all articles published within that conference. The best research institutions were selected based on the largest number of articles published during all editions of the conference.

The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.

During the most recent 2006 edition, 13.56% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 66.67% were posted by at least one author from the top 10 institutions publishing at the conference. Another 19.61% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 13.73% of all publications and 0.00% were from other institutions.

Returning Authors Index

A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of conferences they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same conference from year to year.

The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the conference in relation to all participants in a given year.

Returning Institution Index

The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.

The experience to innovation index

Our experience to innovation index was created to show a cross-section of the experience level of authors publishing at a conference. The index includes the authors publishing at the last edition of a conference, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).

The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:

  • Novice - P < 5 or C < 25 (the number of publications less than 5 or the number of citations less than 25),
  • Competent - P < 10 or C < 100 (the number of publications less than 10 or the number of citations less than 100),
  • Experienced - P < 25 or C < 625 (the number of publications less than 25 or the number of citations less than 625),
  • Master - P < 50 or C < 2500 (the number of publications less than 50 or the number of citations less than 2500),
  • Star - P ≥ 50 and C ≥ 2500 (both the number of publications greater than 50 and the number of citations greater than 2500).

The chart below illustrates experience levels of first authors in cases of publications with multiple authors.

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