Thin film transistor, method of manufacturing the same, and flat panel display having the same
Jae-Chul Park;Chang-Jung Kim;Sun-Il Kim;I-hun Song.
Improvements in the device characteristics of amorphous indium gallium zinc oxide thin-film transistors by Ar plasma treatment
Jin-Seong Park;Jae Kyeong Jeong;Yeon-Gon Mo;Hye Dong Kim.
Applied Physics Letters (2007)
High performance amorphous oxide thin film transistors with self-aligned top-gate structure
Jae Chul Park;Sang Wook Kim;Sun Il Kim;Huaxiang Yin.
international electron devices meeting (2009)
High-Performance Oxide Thin Film Transistors Passivated by Various Gas Plasmas
Sangwook Kim;Jaechul Park;Changjung Kim;Sunil Kim.
Meeting Abstracts (2008)
Thin film transistors and methods of manufacturing the same
Sun-Il Kim;Young-soo Park;Jae-Chul Park.
Amorphous hafnium-indium-zinc oxide semiconductor thin film transistors
Chang-Jung Kim;Sangwook Kim;Je-Hun Lee;Jin-Seong Park.
Applied Physics Letters (2009)
Thin film transistor and method of forming the same
Jae-Chul Park;Young-soo Park;Sun-Il Kim.
High-performance amorphous gallium indium zinc oxide thin-film transistors through N2O plasma passivation
Jaechul Park;Sangwook Kim;Changjung Kim;Sunil Kim.
Applied Physics Letters (2008)
Nearly single-crystalline GaN light-emitting diodes on amorphous glass substrates
Jun Hee Choi;Jun Hee Choi;Andrei Zoulkarneev;Sun Il Kim;Chan Wook Baik.
Nature Photonics (2011)
Oxide semiconductors and thin film transistors comprising the same
Chang-Jung Kim;Sang-Wook Kim;Sun-Il Kim.
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