The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where John Adam Edmond sits on this spectrum.
This scientist: 134 publications — 10th percentile
10% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,065 publications or more.
The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where John Adam Edmond sits on this spectrum.
This scientist: 48 D-Index — 56th percentile
56% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 111 D-Index or more.
John Adam Edmond is a researcher affiliated with Wolfspeed, Inc. in the United States. Their main fields of study include Physics and Astronomy as well as Materials Science, with a particular focus on subfields such as Condensed Matter Physics, Materials Chemistry, and Atomic and Molecular Physics, and Optics.
The scientist's research primarily covers topics related to GaN-based semiconductor devices and materials, machine learning applications in materials science, and semiconductor quantum structures and devices. These areas indicate an emphasis on advanced materials and the integration of computational methods within materials research.
Frequent collaborators include F. A. Ponce, Russell D. Dupuis, and Shuji Nakamura, reflecting a network of professionals working in semiconductor and materials science fields.
John Adam Edmond has contributed to academic literature through various papers, though specific titles and venues of recent papers are not listed. However, they have authored a book published by Springer International Publishing entitled Gallium Nitride and Related Materials, scheduled for 2025, which has already garnered citations, indicating its relevance to the field.
Frequent publication venues are not specifically documented for this scientist, but the breadth of their collaborative network and book publication suggests linkage to well-regarded sources in materials science and applied physics.
John Adam Edmond;Hua-Shuang Kong;Kathleen Marie Doverspike;Michelle Turner Leonard
R.F. Davis;G. Kelner;M. Shur;J.W. Palmour
R.F. Davis;Z. Sitar;B.E. Williams;H.S. Kong
Edmond John A;Slater David B;Kong Hua-Shuang;Donofrio Matthew
Hua-Shuang Kong;John Adam Edmond;Kevin Ward Haberern;David Todd Emerson
J.W. Palmour;J.A. Edmond;H.S. Kong;C.H. Carter
Kathleen Marie Doverspike;John Adam Edmond;Hua-Shuang Kong;Heidi Marie Dieringer
Edmond John;エドモンド ジョン
John Adam Edmond;Kathleen Marie Doverspike;Hua-Shuang Kong;Michael John Bergmann
Matthew Donofrio;David B. Slater;John A. Edmond;Hua-Shuang Kong
John Edmond;Amber Abare;Mike Bergman;Jayesh Bharathan
J. Crofton;P. A. Barnes;J. R. Williams;J. A. Edmond
C.H. Carter;V.F. Tsvetkov;R.C. Glass;D. Henshall
Unknown
Christopher P. Hussell;John Adam Edmond;Gerald H. Negley;Curt Progl
John Adam Edmond;David Beardsley Slater;Jayesh Bharathan;Matthew Donofrio
Emerson David Todd;Haberern Kevin;Bergmann Michael John;Slater David
John Adam Edmond;Michael John Bergmann;David Todd Emerson;Kevin Ward Haberern
J. A. Edmond;K. Das;R. F. Davis
Matthew Donofrio;Christopher P. Hussell;John Adam Edmond
David B. Slater;Bradley E. Williams;Peter S. Andrews;John A. Edmond
J. A. Edmond;J. Ryu;J. T. Glass;R. F. Davis
David B. Slater;Jayesh Bharathan;John Edmond;Mark Raffetto
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