World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
42
Citations
7371
World Ranking
4103
National Ranking
1467

Brian Thibeault publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Brian Thibeault sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 446 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 180 publications — 23rd percentile

23% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

Brian Thibeault D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Brian Thibeault sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 263 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 42 D-Index — 42nd percentile

42% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Overview

Brian Thibeault is affiliated with the University of California, Santa Barbara in the United States. Their research spans multiple fields including Engineering, Physics and Astronomy, and Materials Science. Within these broad areas, their work focuses particularly on Electrical and Electronic Engineering, Atomic and Molecular Physics and Optics, as well as Materials Chemistry.

The scientist's research topics cover a range of specialized subjects. Key areas of interest include Photonic and Optical Devices, Mechanical and Optical Resonators, Semiconductor Materials and Devices, Advanced Fluorescence Microscopy Techniques, CCD and CMOS Imaging Sensors, Force Microscopy Techniques and Applications, and Advanced Fiber Laser Technologies.

Brian Thibeault has published in several scientific journals, demonstrating interdisciplinary research activity. Frequent publication venues include:

  • Nature Physics
  • Optics Letters
  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • Optics Communications
  • Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

Some of their recent papers are:

  • Deuterated silicon dioxide for heterogeneous integration of ultra-low-loss waveguides, 2020, Optics Letters
  • Nonlinear nanomechanical resonators approaching the quantum ground state, 2023, Nature Physics
  • Highly selective and vertical etch of silicon dioxide using ruthenium films as an etch mask, 2021, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • Mechanisms of Fano-resonant biosensing: Mechanical loading of plasmonic oscillators, 2020, Optics Communications
  • Fabricating distributed feedback laser gratings with bismuth and gold focused ion beams, 2024, Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

Collaborative work is indicated by frequent co-authors, including:

  • Demis D. John
  • William J. Mitchell
  • Eduardo Hirata-Miyasaki
  • Gustav M. Pettersson
  • Sara Abrahamsson

Best Publications

  • Light emitting diodes including optically matched substrates

    David B. Slater;Robert C. Glass;Charles M. Swoboda;Bernd Keller

  • Solid state lamp

    Eric J. Tarsa;Brian Thibeault

  • Light-emitting diodes with enhanced light extraction through use of internal and external optical elements

    Siviewlt Brian;シビュールト ブライアン;Mack Michael;マック マイケル

  • Enhanced light extraction through the use of micro-LED arrays

    Brian Thibeault;Steven DenBaars

  • Enhanced performance of offset-gain high-barrier vertical-cavity surface-emitting lasers

    D.B. Young;J.W. Scott;F.H. Peters;M.G. Peters

  • Band‐gap engineered digital alloy interfaces for lower resistance vertical‐cavity surface‐emitting lasers

    M. G. Peters;B. J. Thibeault;D. B. Young;J. W. Scott

  • Scalable led with improved current spreading structures

    Eric J. Tarsa;Brian Thibeault;James Ibbetson;Michael Mack

  • High efficiency light emitters with reduced polarization-induced charges

    Brian Thibeault;James Ibbetson

  • Inductively Coupled Plasma Etching of Bulk Titanium for MEMS Applications

    E. R. Parker;B. J. Thibeault;M. F. Aimi;M. P. Rao

  • Parallel free-space optical interconnect based on arrays of vertical-cavity lasers and detectors with monolithic microlenses.

    Eva M. Strzelecka;Duane A. Louderback;Brian J. Thibeault;Geoff B. Thompson

  • High-speed characteristics of low-optical loss oxide-apertured vertical-cavity lasers

    B.J. Thibeault;K. Bertilsson;E.R. Hegblom;E. Strzelecka

  • $\hbox{In}_{0.53}\hbox{Ga}_{0.47}\hbox{As}$ Channel MOSFETs With Self-Aligned InAs Source/Drain Formed by MEE Regrowth

    U. Singisetti;M.A. Wistey;G.J. Burek;A.K. Baraskar

  • Scattering losses from dielectric apertures in vertical-cavity lasers

    E.R. Hegblom;D.I. Babic;B.J. Thibeault;L.A. Coldren

  • High efficiency submilliamp vertical cavity lasers with intracavity contacts

    J.W. Scott;B.J. Thibeault;D.B. Young;L.A. Coldren

  • Reduced optical scattering loss in vertical-cavity lasers using a thin (300 /spl Aring/) oxide aperture

    B.J. Thibeault;E.R. Hegblom;P.D. Floyd;R. Naone

  • Estimation of scattering losses in dielectrically apertured vertical cavity lasers

    E. R. Hegblom;D. I. Babic;B. J. Thibeault;L. A. Coldren

  • GaN-Based FETs for Microwave Power Amplification

    Yi-Feng Wu;Bernd P. Keller;Stacia Keller;Jane J. Xu

  • Ultralow resistance in situ Ohmic contacts to InGaAs/InP

    Uttam Singisetti;Mark A. Wistey;Jeramy D. Zimmerman;Brian J. Thibeault

  • Multi element, multi color solid state LED/laser

    Steven P. DenBaars;Eric J. Tarsa;Michael Mack;Bernd Keller

  • High-power vertical-cavity surface-emitting lasers

    F.H. Peters;M.G. Peters;D.B. Young;J.W. Scott

Frequent Co-Authors

Larry A. Coldren
Larry A. Coldren University of California, Santa Barbara
Mark J. W. Rodwell
Mark J. W. Rodwell University of California, Santa Barbara
Arthur C. Gossard
Arthur C. Gossard University of California, Santa Barbara
bernd keller
bernd keller Cree (United States)
Susanne Stemmer
Susanne Stemmer University of California, Santa Barbara
Mark A. Wistey
Mark A. Wistey Texas State University
Steven P. DenBaars
Steven P. DenBaars University of California, Santa Barbara
Scott W. Corzine
Scott W. Corzine Infinera (United States)
Umesh K. Mishra
Umesh K. Mishra University of California, Santa Barbara
Miguel Urteaga
Miguel Urteaga Teledyne Technologies (United States)

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Related Online Degrees & Career Pathways

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Moreover, competency-based degrees and programs offer flexible learning tailored to individual skill mastery. This approach is increasingly popular among engineering students who want to focus on practical, job-ready skills at their own pace.

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