David E. Laughlin is affiliated with Carnegie Mellon University in the United States. Their research primarily spans the fields of Engineering, Materials Science, and Physics and Astronomy, contributing extensively to various subfields such as Atomic and Molecular Physics and Optics, Electronic, Optical and Magnetic Materials, Mechanics of Materials, Materials Chemistry, and Mechanical Engineering.
Their scientific work explores several main topics, including Magnetic properties of thin films, Magnetic Properties and Applications, Metal and Thin Film Mechanics, Metallic Glasses and Amorphous Alloys, Copper Interconnects and Reliability, Adhesion, Friction, and Surface Interactions, and Diamond and Carbon-based Materials Research.
David E. Laughlin has published research in several academic venues. Frequent publication venues include:
Their recent papers comprise:
Notable frequent co-authors in David E. Laughlin's collaborations include:
Michael E McHenry;Matthew A Willard;David E Laughlin
D.J Chakrabarti;David E Laughlin
M. A. Willard;D. E. Laughlin;M. E. McHenry;D. Thoma
M.E. McHenry;D.E. Laughlin
W.F Miao;D.E Laughlin
W. F. Miao;D. E. Laughlin
D. J. Chakrabarti;D. E. Laughlin
C. L. Platt;K. W. Wierman;E. B. Svedberg;R. van de Veerdonk
David E. Laughlin;David E. Laughlin;John W. Cahn
W.A. Soffa;D.E. Laughlin
Yu-Nu Hsu;Sangki Jeong;David E. Laughlin;David N. Lambeth
H. Okamoto;D. J. Chakrabarti;D. E. Laughlin;T. B. Massalski
P.R Subramanian;D.E Laughlin
M. A. Willard;M.-Q. Huang;D. E. Laughlin;M. E. McHenry
M. Murayama;K. Hono;W. F. Miao;D. E. Laughlin
W.A. Soffa;D.E. Laughlin
T. J. Klemmer;N. Shukla;C. Liu;X. W. Wu
M.E. McHenry;F. Johnson;H. Okumura;T. Ohkubo
Shahid Ma;Mahajan S;Laughlin De;Cox Hm
Chao Liu;Xiaowei Wu;Timothy Klemmer;Nisha Shukla
P. R. Subramanian;D. J. Chakrabarti;D. E. Laughlin
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