The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Thomas F. Jaramillo sits on this spectrum.
This scientist: 473 publications — 84th percentile
84% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Thomas F. Jaramillo sits on this spectrum.
This scientist: 113 D-Index — 95th percentile
95% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Thomas F. Jaramillo is a researcher affiliated with Stanford University in the United States. Their academic work primarily spans the fields of Energy and Engineering, with a focus on Renewable Energy, Sustainability and the Environment, Electrical and Electronic Engineering, Materials Chemistry, Catalysis, and Electrochemistry.
Their research addresses a range of topics related to energy conversion and electrochemical processes. Key topics include:
Thomas F. Jaramillo has published extensively in various scientific venues. The most frequent publication venues are:
Among their recent papers are several notable works, including:
The researcher collaborates frequently with several coauthors, including:
Thomas F. Jaramillo was recognized as a Hellman Fellow in 2009.
Zhi Wei Seh;Zhi Wei Seh;Zhi Wei Seh;Jakob Kibsgaard;Jakob Kibsgaard;Jakob Kibsgaard;Colin F. Dickens;Colin F. Dickens;Ib Chorkendorff
Charles C. L. McCrory;Suho Jung;Jonas C. Peters;Thomas F. Jaramillo
Thomas Jaramillo;Kristina Pilt Jørgensen;Jacob Bonde;Jane Hvolbæk Nielsen
Isabela C. Man;Hai-Yan Su;Federico Calle-Vallejo;Heine Anton Hansen
Stephanie A. Nitopi;Erlend Bertheussen;Søren Bertelsen Scott;Xinyan Liu
Jeffrey Philip Greeley;Thomas Jaramillo;Jacob Bonde;Ib Chorkendorff
Charles C. L. McCrory;Suho Jung;Ivonne M. Ferrer;Shawn M. Chatman
J. Greeley;I. E. L. Stephens;A. S. Bondarenko;T. P. Johansson
Jakob Kibsgaard;Zhebo Chen;Benjamin N. Reinecke;Thomas F. Jaramillo
Kendra P. Kuhl;Etosha R. Cave;David N. Abram;Thomas F. Jaramillo
Phil De Luna;Phil De Luna;Phil De Luna;Christopher Hahn;Christopher Hahn;Drew Higgins;Drew Higgins;Drew Higgins;Shaffiq A. Jaffer
Linsey C. Seitz;Colin F. Dickens;Colin F. Dickens;Kazunori Nishio;Kazunori Nishio;Yasuyuki Hikita
Yelena Gorlin;Thomas F. Jaramillo
Zhiyi Lu;Guangxu Chen;Samira Siahrostami;Zhihua Chen
Kendra P. Kuhl;Toru Hatsukade;Etosha R. Cave;David N. Abram
Jesse D. Benck;Thomas R. Hellstern;Jakob Kibsgaard;Pongkarn Chakthranont
Joseph H. Montoya;Linsey C. Seitz;Linsey C. Seitz;Linsey C. Seitz;Pongkarn Chakthranont;Pongkarn Chakthranont;Aleksandra Vojvodic;Aleksandra Vojvodic
Blaise A. Pinaud;Jesse D. Benck;Linsey Christine Seitz;Arnold J. Forman
Zhi Wei Seh;Kurt D. Fredrickson;Babak Anasori;Jakob Kibsgaard
Suzanne Zamany Andersen;Viktor Čolić;Sungeun Yang;Sungeun Yang;Jay A. Schwalbe
Zhebo Chen;Thomas F. Jaramillo;Todd G. Deutsch;Alan Kleiman-Shwarsctein
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