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Masaharu Oshima

Masaharu Oshima

University of Tokyo
Japan

D-Index & Metrics

Discipline name D-Index World Ranking Current World Ranking National Ranking Current National Ranking Publications Citations
Materials Science 66 5328 5155 259 253 690 16207

Masaharu Oshima publications per year

The chart shows the history of publications by Masaharu Oshima between 1977 and 2023, highlighting the no. of papers published in each year and offering an overview of the publication velocity of this scholar. Masaharu Oshima published across 47 years, from 1977 to 2023, averaging 15.4 papers a year. Output peaked at 38 publications in 2008. 3 of the 724 publications appeared in the last two years.

No. of publications
10 20 30
Bar chart. Horizontal axis: year, 1977 to 2023. Vertical axis: number of publications, 0 to 38. Peak 38 publications in 2008. 1977: 1 publication 1978: 3 publications 1979: 1 publication 1980: 2 publications 1981: 3 publications 1982: 1 publication 1983: 2 publications 1984: 2 publications 1985: 7 publications 1986: 2 publications 1987: 0 publications 1988: 11 publications 1989: 18 publications 1990: 4 publications 1991: 18 publications 1992: 16 publications 1993: 19 publications 1994: 19 publications 1995: 16 publications 1996: 19 publications 1997: 7 publications 1998: 15 publications 1999: 18 publications 2000: 33 publications 2001: 28 publications 2002: 37 publications 2003: 29 publications 2004: 33 publications 2005: 30 publications 2006: 33 publications 2007: 33 publications 2008: 38 publications 2009: 34 publications 2010: 37 publications 2011: 33 publications 2012: 22 publications 2013: 23 publications 2014: 28 publications 2015: 12 publications 2016: 14 publications 2017: 7 publications 2018: 5 publications 2019: 7 publications 2020: 1 publication 2021: 0 publications 2022: 2 publications 2023: 1 publication
1977 2023

724 publications in total across all disciplines

View publications per year as a table
Masaharu Oshima: publications per year, 1977 to 2023
Year Publications
1977 1
1978 3
1979 1
1980 2
1981 3
1982 1
1983 2
1984 2
1985 7
1986 2
1987 0
1988 11
1989 18
1990 4
1991 18
1992 16
1993 19
1994 19
1995 16
1996 19
1997 7
1998 15
1999 18
2000 33
2001 28
2002 37
2003 29
2004 33
2005 30
2006 33
2007 33
2008 38
2009 34
2010 37
2011 33
2012 22
2013 23
2014 28
2015 12
2016 14
2017 7
2018 5
2019 7
2020 1
2021 0
2022 2
2023 1
Total 724
Download as CSV

Masaharu Oshima publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Masaharu Oshima sits on this spectrum.

No. of scientists
200 400 600 800
Bar chart with 57 bars. Horizontal axis: publications, 50–69 to 1,163+. Vertical axis: number of scientists, 0 to 891. Most scientists, 891, have 190–209 publications. The last bar groups every scientist with 1,163 publications or more. The highlighted bar, 690–709 publications, is where this scientist sits. 50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50–69 publications 1,163+

This scientist: 690 publications — 95th percentile

95% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

View publications distribution as a table
Number of Materials Science scientists by publication count, Research.com 2026 ranking edition. Based on 12,847 ranked scientists.
Publications Scientists This scientist
50–69 28
70–89 152
90–109 356
110–129 487
130–149 723
150–169 835
170–189 850
190–209 891
210–229 862
230–249 766
250–269 726
270–289 665
290–309 593
310–329 537
330–349 477
350–369 440
370–389 356
390–409 321
410–429 256
430–449 246
450–469 216
470–489 212
490–509 174
510–529 194
530–549 162
550–569 131
570–589 111
590–609 103
610–629 99
630–649 77
650–669 92
670–689 56
690–709 53 690
710–729 53
730–749 38
750–769 52
770–789 43
790–809 38
810–829 34
830–849 25
850–869 18
870–889 20
890–909 24
910–929 27
930–949 20
950–969 17
970–989 10
990–1,009 16
1,010–1,029 13
1,030–1,049 12
1,050–1,069 9
1,070–1,089 8
1,090–1,109 7
1,110–1,129 9
1,130–1,149 2
1,150–1,162 5
1,163+ 100
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Masaharu Oshima D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Masaharu Oshima sits on this spectrum.

No. of scientists
200 400 600
Bar chart with 64 bars. Horizontal axis: D-Index, 40–41 to 165+. Vertical axis: number of scientists, 0 to 667. Most scientists, 667, have 52–53 D-Index. The last bar groups every scientist with 165 D-Index or more. The highlighted bar, 66–67 D-Index, is where this scientist sits. 40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40–41 D-Index 165+

This scientist: 66 D-Index — 59th percentile

59% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

View D-Index distribution as a table
Number of Materials Science scientists by D-index, Research.com 2026 ranking edition. Based on 12,847 ranked scientists.
D-Index Scientists This scientist
40–41 211
42–43 450
44–45 612
46–47 612
48–49 598
50–51 657
52–53 667
54–55 621
56–57 597
58–59 610
60–61 587
62–63 606
64–65 533
66–67 490 66
68–69 469
70–71 378
72–73 421
74–75 359
76–77 323
78–79 299
80–81 230
82–83 210
84–85 195
86–87 203
88–89 175
90–91 175
92–93 142
94–95 121
96–97 117
98–99 107
100–101 88
102–103 85
104–105 68
106–107 62
108–109 57
110–111 45
112–113 49
114–115 50
116–117 34
118–119 38
120–121 37
122–123 29
124–125 28
126–127 24
128–129 33
130–131 28
132–133 21
134–135 20
136–137 23
138–139 17
140–141 12
142–143 17
144–145 21
146–147 13
148–149 11
150–151 14
152–153 13
154–155 9
156–157 10
158–159 7
160–161 4
162–163 4
164 3
165+ 98
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Overview

Masaharu Oshima is a researcher affiliated with the University of Tokyo in Japan, with a focus on engineering and materials science. Their work covers several subfields, including electrical and electronic engineering, materials chemistry, surfaces, coatings and films, biomedical engineering, and mechanical engineering.

The research topics explored by Oshima include advancements in battery materials, electron and X-ray spectroscopy techniques, graphene research and applications, ZnO doping and properties, nanowire synthesis and applications, semiconductor materials and devices, and extraction and separation processes.

Several recent papers illustrate the scope of their research activities:

  • Facet-dependent electrochemical performance and electronic structure of LiCoO2 polyhedral particles revealed by microscopic resonant X-ray photoelectron spectroscopy (2022, CrystEngComm)
  • Photoelectron spectromicroscopy analysis of graphene during gate-controlled photo-oxidation process (2022, Nano Express)
  • Analysis of Electrode Materials for Li-Ion Batteries by Synchrotron Soft X-Ray Microspectroscopy (2023, ECS Meeting Abstracts)

Oshima frequently collaborates with several co-authors, including Naoka Nagamura, Wen-Xiong Zhang, Eiji Hosono, Daisuke Asakura, and Shingo Tanaka. These collaborations have contributed to multiple publications, consolidating the research cluster around materials science and spectroscopy.

Their work has appeared in notable publication venues such as Nano Express, CrystEngComm, and ECS Meeting Abstracts, each representing different facets of materials chemistry and engineering research.

Best Publications

  • Carbon Alloy Catalysts: Active Sites for Oxygen Reduction Reaction

    Takashi Ikeda;Mauro Boero;Sheng-Feng Huang;Kiyoyuki Terakura

  • X-ray absorption analysis of nitrogen contribution to oxygen reduction reaction in carbon alloy cathode catalysts for polymer electrolyte fuel cells

    Hideharu Niwa;Koji Horiba;Yoshihisa Harada;Masaharu Oshima

  • Highly reliable TaOx ReRAM and direct evidence of redox reaction mechanism

    Z. Wei;Y. Kanzawa;K. Arita;Y. Katoh

  • Atomic-scale characterization of nitrogen-doped graphite: Effects of dopant nitrogen on the local electronic structure of the surrounding carbon atoms

    Takahiro Kondo;Simone Casolo;Tetsuya Suzuki;Taishi Shikano

  • Universal passivation effect of (NH4)2Sx treatment on the surface of III-V compound semiconductors

    Haruhiro Oigawa;Jia-Fa Fan;Yasuo Nannichi;Hirohiko Sugahara

  • Chemical structure of the ultrathin SiO 2 / S i ( 100 ) interface: An angle-resolved Si 2 p photoemission study

    J. H. Oh;H. W. Yeom;Y. Hagimoto;K. Ono

  • First-principles calculation of the electronic properties of graphene clusters doped with nitrogen and boron: Analysis of catalytic activity for the oxygen reduction reaction

    Sheng-Feng Huang;Kiyoyuki Terakura;Kiyoyuki Terakura;Taisuke Ozaki;Takashi Ikeda

  • Dimensional-Crossover-Driven Metal-Insulator Transition in SrVO3 Ultrathin Films

    K. Yoshimatsu;T. Okabe;H. Kumigashira;H. Kumigashira;S. Okamoto

  • Interplay between nitrogen dopants and native point defects in graphene

    Zhufeng Hou;Xianlong Wang;Takashi Ikeda;Kiyoyuki Terakura;Kiyoyuki Terakura

  • A high-resolution synchrotron-radiation angle-resolved photoemission spectrometer with in situ oxide thin film growth capability

    K. Horiba;H. Ohguchi;H. Kumigashira;M. Oshima

  • Electronic Band Structure of Transparent Conductor: Nb-Doped Anatase TiO2

    Taro Hitosugi;Hideyuki Kamisaka;Koichi Yamashita;Hiroyuki Nogawa

  • Synchrotron radiation photoemission analysis for (NH4)2Sx‐treated GaAs

    Hirohiko Sugahara;Masaharu Oshima;Haruhiro Oigawa;Hidemi Shigekawa

  • Fabrication, magnetic properties, and electronic structures of nanoscale zinc-blende MnAs dots (invited)

    Kanta Ono;Jun Okabayashi;Masaki Mizuguchi;Masaharu Oshima

  • Thickness-dependent electronic structure of ultrathin SrRuO3 films studied by in situ photoemission spectroscopy

    D. Toyota;I. Ohkubo;H. Kumigashira;M. Oshima

  • Preparation of thermally stable TiO2-terminated SrTiO3(100) substrate surfaces

    T. Ohnishi;K. Shibuya;M. Lippmaa;D. Kobayashi

  • Origin of metallic states at the heterointerface between the band insulators LaAlO3 and SrTiO3.

    K. Yoshimatsu;R. Yasuhara;H. Kumigashira;M. Oshima

  • Hole-doping-induced changes in the electronic structure of La 1 − x Sr x FeO 3 : Soft x-ray photoemission and absorption study of epitaxial thin films

    H. Wadati;D. Kobayashi;H. Kumigashira;K. Okazaki

  • Electronic structure of N-doped graphene with native point defects

    Zhufeng Hou;Xianlong Wang;Takashi Ikeda;Kiyoyuki Terakura;Kiyoyuki Terakura

  • Metallic Quantum Well States in Artificial Structures of Strongly Correlated Oxide

    K. Yoshimatsu;K. Horiba;H. Kumigashira;H. Kumigashira;T. Yoshida

  • Surface Damage on Si Substrates Caused by Reactive Sputter Etching

    Norikuni Yabumoto;Masaharu Oshima;Osamu Michikami;Shizuka Yoshii

  • Blue and ultraviolet cathodoluminescence from Mn-doped epitaxial ZnO thin films

    Zheng Wu Jin;Y. Z. Yoo;T. Sekiguchi;T. Chikyow

Frequent Co-Authors

Hiroshi Kumigashira
Hiroshi Kumigashira Tohoku University
Kanta Ono
Kanta Ono High Energy Accelerator Research Organization
Hideomi Koinuma
Hideomi Koinuma Tokyo Institute of Technology
Masashi Kawasaki
Masashi Kawasaki University of Tokyo
A. Fujimori
A. Fujimori University of Tokyo
Tsuyoshi Ohnishi
Tsuyoshi Ohnishi National Institute for Materials Science
Zhi Liu
Zhi Liu ShanghaiTech University
Yuji Matsumoto
Yuji Matsumoto Nara Institute of Science and Technology
Masaaki Tanaka
Masaaki Tanaka University of Tokyo
Kiyoyuki Terakura
Kiyoyuki Terakura National Institute for Materials Science

External Links

Personal website of Masaharu Oshima

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Best Scientists Citing Masaharu Oshima

Hiroshi Kumigashira

Hiroshi Kumigashira

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Publications: 56

Harold Y. Hwang

Harold Y. Hwang

Stanford University

Publications: 42

Stephen J. Pearton

Stephen J. Pearton

University of Florida

Publications: 24

Masaaki Tanaka

Masaaki Tanaka

University of Tokyo

Publications: 24

Tetsuya Hasegawa

Tetsuya Hasegawa

University of Tokyo

Publications: 22

Rainer Waser

Rainer Waser

RWTH Aachen University

Publications: 22

Hyung-Ho Park

Hyung-Ho Park

Yonsei University

Publications: 21

Taro Hitosugi

Taro Hitosugi

University of Tokyo

Publications: 20

Koki Takanashi

Koki Takanashi

Tohoku University

Publications: 17

Gertjan Koster

Gertjan Koster

University of Twente

Publications: 17

Lars G. M. Pettersson

Lars G. M. Pettersson

Stockholm University

Publications: 17

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C. R. Abernathy

University of Florida

Publications: 16

Arthur F. Hebard

Arthur F. Hebard

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Publications: 16

Jinghua Guo

Jinghua Guo

Lawrence Berkeley National Laboratory

Publications: 16

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Zhi Liu

ShanghaiTech University

Publications: 16

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Dietrich R. T. Zahn

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Publications: 15

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