The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Masaharu Oshima sits on this spectrum.
This scientist: 690 publications — 95th percentile
95% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Masaharu Oshima sits on this spectrum.
This scientist: 66 D-Index — 59th percentile
59% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Masaharu Oshima is a researcher affiliated with the University of Tokyo in Japan, with a focus on engineering and materials science. Their work covers several subfields, including electrical and electronic engineering, materials chemistry, surfaces, coatings and films, biomedical engineering, and mechanical engineering.
The research topics explored by Oshima include advancements in battery materials, electron and X-ray spectroscopy techniques, graphene research and applications, ZnO doping and properties, nanowire synthesis and applications, semiconductor materials and devices, and extraction and separation processes.
Several recent papers illustrate the scope of their research activities:
Oshima frequently collaborates with several co-authors, including Naoka Nagamura, Wen-Xiong Zhang, Eiji Hosono, Daisuke Asakura, and Shingo Tanaka. These collaborations have contributed to multiple publications, consolidating the research cluster around materials science and spectroscopy.
Their work has appeared in notable publication venues such as Nano Express, CrystEngComm, and ECS Meeting Abstracts, each representing different facets of materials chemistry and engineering research.
Takashi Ikeda;Mauro Boero;Sheng-Feng Huang;Kiyoyuki Terakura
Hideharu Niwa;Koji Horiba;Yoshihisa Harada;Masaharu Oshima
Z. Wei;Y. Kanzawa;K. Arita;Y. Katoh
Takahiro Kondo;Simone Casolo;Tetsuya Suzuki;Taishi Shikano
Haruhiro Oigawa;Jia-Fa Fan;Yasuo Nannichi;Hirohiko Sugahara
J. H. Oh;H. W. Yeom;Y. Hagimoto;K. Ono
Sheng-Feng Huang;Kiyoyuki Terakura;Kiyoyuki Terakura;Taisuke Ozaki;Takashi Ikeda
K. Yoshimatsu;T. Okabe;H. Kumigashira;H. Kumigashira;S. Okamoto
Zhufeng Hou;Xianlong Wang;Takashi Ikeda;Kiyoyuki Terakura;Kiyoyuki Terakura
K. Horiba;H. Ohguchi;H. Kumigashira;M. Oshima
Taro Hitosugi;Hideyuki Kamisaka;Koichi Yamashita;Hiroyuki Nogawa
Hirohiko Sugahara;Masaharu Oshima;Haruhiro Oigawa;Hidemi Shigekawa
Kanta Ono;Jun Okabayashi;Masaki Mizuguchi;Masaharu Oshima
D. Toyota;I. Ohkubo;H. Kumigashira;M. Oshima
T. Ohnishi;K. Shibuya;M. Lippmaa;D. Kobayashi
K. Yoshimatsu;R. Yasuhara;H. Kumigashira;M. Oshima
H. Wadati;D. Kobayashi;H. Kumigashira;K. Okazaki
Zhufeng Hou;Xianlong Wang;Takashi Ikeda;Kiyoyuki Terakura;Kiyoyuki Terakura
K. Yoshimatsu;K. Horiba;H. Kumigashira;H. Kumigashira;T. Yoshida
Norikuni Yabumoto;Masaharu Oshima;Osamu Michikami;Shizuka Yoshii
Zheng Wu Jin;Y. Z. Yoo;T. Sekiguchi;T. Chikyow
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