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Masaharu Oshima

Masaharu Oshima

D-Index & Metrics

Materials Science

D-Index
66
Citations
16207
World Ranking
5330
National Ranking
259

Overview

Masaharu Oshima is a researcher affiliated with the University of Tokyo in Japan, with a focus on engineering and materials science. Their work covers several subfields, including electrical and electronic engineering, materials chemistry, surfaces, coatings and films, biomedical engineering, and mechanical engineering.

The research topics explored by Oshima include advancements in battery materials, electron and X-ray spectroscopy techniques, graphene research and applications, ZnO doping and properties, nanowire synthesis and applications, semiconductor materials and devices, and extraction and separation processes.

Several recent papers illustrate the scope of their research activities:

  • Facet-dependent electrochemical performance and electronic structure of LiCoO2 polyhedral particles revealed by microscopic resonant X-ray photoelectron spectroscopy (2022, CrystEngComm)
  • Photoelectron spectromicroscopy analysis of graphene during gate-controlled photo-oxidation process (2022, Nano Express)
  • Analysis of Electrode Materials for Li-Ion Batteries by Synchrotron Soft X-Ray Microspectroscopy (2023, ECS Meeting Abstracts)

Oshima frequently collaborates with several co-authors, including Naoka Nagamura, Wen-Xiong Zhang, Eiji Hosono, Daisuke Asakura, and Shingo Tanaka. These collaborations have contributed to multiple publications, consolidating the research cluster around materials science and spectroscopy.

Their work has appeared in notable publication venues such as Nano Express, CrystEngComm, and ECS Meeting Abstracts, each representing different facets of materials chemistry and engineering research.

Best Publications

  • Carbon Alloy Catalysts: Active Sites for Oxygen Reduction Reaction

    Takashi Ikeda;Mauro Boero;Sheng-Feng Huang;Kiyoyuki Terakura

  • X-ray absorption analysis of nitrogen contribution to oxygen reduction reaction in carbon alloy cathode catalysts for polymer electrolyte fuel cells

    Hideharu Niwa;Koji Horiba;Yoshihisa Harada;Masaharu Oshima

  • Highly reliable TaOx ReRAM and direct evidence of redox reaction mechanism

    Z. Wei;Y. Kanzawa;K. Arita;Y. Katoh

  • Atomic-scale characterization of nitrogen-doped graphite: Effects of dopant nitrogen on the local electronic structure of the surrounding carbon atoms

    Takahiro Kondo;Simone Casolo;Tetsuya Suzuki;Taishi Shikano

  • Universal passivation effect of (NH4)2Sx treatment on the surface of III-V compound semiconductors

    Haruhiro Oigawa;Jia-Fa Fan;Yasuo Nannichi;Hirohiko Sugahara

  • Chemical structure of the ultrathin SiO 2 / S i ( 100 ) interface: An angle-resolved Si 2 p photoemission study

    J. H. Oh;H. W. Yeom;Y. Hagimoto;K. Ono

  • First-principles calculation of the electronic properties of graphene clusters doped with nitrogen and boron: Analysis of catalytic activity for the oxygen reduction reaction

    Sheng-Feng Huang;Kiyoyuki Terakura;Kiyoyuki Terakura;Taisuke Ozaki;Takashi Ikeda

  • Dimensional-Crossover-Driven Metal-Insulator Transition in SrVO3 Ultrathin Films

    K. Yoshimatsu;T. Okabe;H. Kumigashira;H. Kumigashira;S. Okamoto

  • Interplay between nitrogen dopants and native point defects in graphene

    Zhufeng Hou;Xianlong Wang;Takashi Ikeda;Kiyoyuki Terakura;Kiyoyuki Terakura

  • A high-resolution synchrotron-radiation angle-resolved photoemission spectrometer with in situ oxide thin film growth capability

    K. Horiba;H. Ohguchi;H. Kumigashira;M. Oshima

  • Electronic Band Structure of Transparent Conductor: Nb-Doped Anatase TiO2

    Taro Hitosugi;Hideyuki Kamisaka;Koichi Yamashita;Hiroyuki Nogawa

  • Synchrotron radiation photoemission analysis for (NH4)2Sx‐treated GaAs

    Hirohiko Sugahara;Masaharu Oshima;Haruhiro Oigawa;Hidemi Shigekawa

  • Fabrication, magnetic properties, and electronic structures of nanoscale zinc-blende MnAs dots (invited)

    Kanta Ono;Jun Okabayashi;Masaki Mizuguchi;Masaharu Oshima

  • Thickness-dependent electronic structure of ultrathin SrRuO3 films studied by in situ photoemission spectroscopy

    D. Toyota;I. Ohkubo;H. Kumigashira;M. Oshima

  • Preparation of thermally stable TiO2-terminated SrTiO3(100) substrate surfaces

    T. Ohnishi;K. Shibuya;M. Lippmaa;D. Kobayashi

  • Origin of metallic states at the heterointerface between the band insulators LaAlO3 and SrTiO3.

    K. Yoshimatsu;R. Yasuhara;H. Kumigashira;M. Oshima

  • Hole-doping-induced changes in the electronic structure of La 1 − x Sr x FeO 3 : Soft x-ray photoemission and absorption study of epitaxial thin films

    H. Wadati;D. Kobayashi;H. Kumigashira;K. Okazaki

  • Electronic structure of N-doped graphene with native point defects

    Zhufeng Hou;Xianlong Wang;Takashi Ikeda;Kiyoyuki Terakura;Kiyoyuki Terakura

  • Metallic Quantum Well States in Artificial Structures of Strongly Correlated Oxide

    K. Yoshimatsu;K. Horiba;H. Kumigashira;H. Kumigashira;T. Yoshida

  • Surface Damage on Si Substrates Caused by Reactive Sputter Etching

    Norikuni Yabumoto;Masaharu Oshima;Osamu Michikami;Shizuka Yoshii

  • Blue and ultraviolet cathodoluminescence from Mn-doped epitaxial ZnO thin films

    Zheng Wu Jin;Y. Z. Yoo;T. Sekiguchi;T. Chikyow

Frequent Co-Authors

Hiroshi Kumigashira
Hiroshi Kumigashira Tohoku University
Kanta Ono
Kanta Ono High Energy Accelerator Research Organization
Hideomi Koinuma
Hideomi Koinuma Tokyo Institute of Technology
Masashi Kawasaki
Masashi Kawasaki University of Tokyo
A. Fujimori
A. Fujimori University of Tokyo
Tsuyoshi Ohnishi
Tsuyoshi Ohnishi National Institute for Materials Science
Zhi Liu
Zhi Liu ShanghaiTech University
Yuji Matsumoto
Yuji Matsumoto Nara Institute of Science and Technology
Masaaki Tanaka
Masaaki Tanaka University of Tokyo
Kiyoyuki Terakura
Kiyoyuki Terakura National Institute for Materials Science

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