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D-Index & Metrics

Materials Science

D-Index
55
Citations
13560
World Ranking
8495
National Ranking
234

José Avila publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where José Avila sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 323 publications — 65th percentile

65% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

José Avila D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where José Avila sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 55 D-Index — 34th percentile

34% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

José Avila is affiliated with Synchrotron SOLEIL in France. Their research primarily focuses on materials science and engineering, with a significant emphasis on materials chemistry and electrical and electronic engineering. Their expertise extends into atomic and molecular physics, optics, as well as biomedical engineering.

Avila's work covers multiple specialized topics, including:

  • 2D materials and applications
  • Graphene research and applications
  • Chalcogenide semiconductor thin films
  • Quantum dots synthesis and properties
  • Topological materials and phenomena
  • MXene and MAX phase materials
  • Nanowire synthesis and applications

The publication record includes frequently contributing to venues such as:

  • arXiv (Cornell University)
  • Nano Letters
  • Physical Review B
  • The Journal of Physical Chemistry C
  • Physical Review Letters

Recent papers from José Avila's collaborations include:

  • "Layer-controlled single-crystalline graphene film with stacking order via Cu-Si alloy formation," 2020, Nature Nanotechnology
  • "Programming twist angle and strain profiles in 2D materials," 2023, Science
  • "Dimensionality-Mediated Semimetal-Semiconductor Transition in Ultrathin PtTe2 Films," 2020, Physical Review Letters
  • "Large-area epitaxial growth of curvature-stabilized ABC trilayer graphene," 2020, Nature Communications
  • "Visualizing electron localization of WS2/WSe2 moiré superlattices in momentum space," 2021, Science Advances

José Avila has collaborated frequently with several researchers, including:

  • Pavel Dudin
  • Emmanuel Lhuillier
  • Debora Pierucci
  • M. C. Asensio
  • Abdelkarim Ouerghi

Best Publications

  • Silicene: Compelling Experimental Evidence for Graphenelike Two-Dimensional Silicon

    Patrick Vogt;Patrick Vogt;Paola De Padova;Claudio Quaresima;Jose Avila

  • Band Alignment and Minigaps in Monolayer MoS2-Graphene van der Waals Heterostructures

    Debora Pierucci;Hugo Henck;Jose Avila;Adrian Balan;Adrian Balan

  • Towards high quality CVD graphene growth and transfer

    G. Deokar;J. Avila;I. Razado-Colambo;J.-L. Codron

  • Black Arsenic: A Layered Semiconductor with Extreme In-Plane Anisotropy

    Yabin Chen;Chaoyu Chen;Robert Kealhofer;Huili Liu;Huili Liu

  • DYNAMICAL FLUCTUATIONS AS THE ORIGIN OF A SURFACE PHASE TRANSITION IN SN/GE(111)

    J. Avila;J. Avila;A. Mascaraque;E. G. Michel;M. C. Asensio;M. C. Asensio

  • Quasicrystalline 30° twisted bilayer graphene as an incommensurate superlattice with strong interlayer coupling.

    Wei Yao;Eryin Wang;Changhua Bao;Yiou Zhang

  • Evidence of Dirac fermions in multilayer silicene

    Paola De Padova;Patrick Vogt;Andrea Resta;Jose Avila

  • Evaluation of food consumption and dietary patterns in Spain by the Food Consumption Survey: updated information

    G Varela-Moreiras;J M Avila;C Cuadrado;S del Pozo

  • Direct Observation of Interlayer Hybridization and Dirac Relativistic Carriers in Graphene/MoS2 van der Waals Heterostructures

    Horacio Coy Diaz;José Avila;Chaoyu Chen;Rafik Addou

  • Charge Density Wave State Suppresses Ferromagnetic Ordering in VSe2 Monolayers

    Paula Mariel Coelho;Kien Nguyen Cong;Manuel Bonilla;Sadhu Kolekar

  • Observation of a two-dimensional liquid of Fröhlich polarons at the bare SrTiO3 surface

    Chaoyu Chen;José Avila;Emmanouil Frantzeskakis;Anna Levy

  • Self-aligned silicon quantum wires on Ag(110)

    C. Leandri;G. Le Lay;B. Aufray;C. Girardeaux

  • Polycrystalline graphene with single crystalline electronic structure.

    Lola Brown;Edward B. Lochocki;José Avila;Cheol-Joo Kim

  • Chitosan-coated mesoporous MIL-100(Fe) nanoparticles as improved bio-compatible oral nanocarriers.

    T. Hidalgo;M. Giménez-Marqués;E. Bellido;J. Avila

  • Topology of the Pseudogap and Shadow Bands in Bi 2 Sr 2 CaCu 2 O 8+δ at Optimum Doping

    N. L. Saini;J. Avila;A. Bianconi;A. Lanzara

  • MISTRAL: a transmission soft X-ray microscopy beamline for cryo nano-tomography of biological samples and magnetic domains imaging.

    Andrea Sorrentino;Josep Nicolás;Ricardo Valcárcel;Francisco Javier Chichón

  • Atomic structure of the √3 × √3 phase of silicene on Ag(111)

    Seymur Cahangirov;Veli Ongun Özçelik;Lede Xian;Jose Avila

  • Diamond-like carbon coating under oleic acid lubrication: Evidence for graphene oxide formation in superlow friction.

    Maria Isabel De Barros Bouchet;Jean Michel Martin;José Avila;Makoto Kano

  • Layer-controlled single-crystalline graphene film with stacking order via Cu–Si alloy formation

    Van Luan Nguyen;Dinh Loc Duong;Sang Hyub Lee;José Avila

  • GraftFast Surface Engineering to Improve MOF Nanoparticles Furtiveness

    Mónica Giménez-Marqués;Mónica Giménez-Marqués;Mónica Giménez-Marqués;Elena Bellido;Thomas Berthelot;Teresa Simón-Yarza;Teresa Simón-Yarza

  • Exploring electronic structure of one-atom thick polycrystalline graphene films: A nano angle resolved photoemission study

    José Avila;Ivy Razado;Stéphane Lorcy;Romain Fleurier

  • Correction: Corrigendum: Multiple π-bands and Bernal stacking of multilayer graphene on C-face SiC, revealed by nano-Angle Resolved Photoemission

    Leif I. Johansson;Rickard Armiento;Jose Avila;Chao Xia

Frequent Co-Authors

Maria C. Asensio
Maria C. Asensio Spanish National Research Council
Guy Le Lay
Guy Le Lay Aix-Marseille University
Lorena Gómez-Aparicio
Lorena Gómez-Aparicio Spanish National Research Council
D.P. Woodruff
D.P. Woodruff University of Warwick
Alessandra Lanzara
Alessandra Lanzara University of California, Berkeley
G. D. Gu
G. D. Gu Brookhaven National Laboratory
Young Hee Lee
Young Hee Lee Sungkyunkwan University
Emmanuel Lhuillier
Emmanuel Lhuillier Sorbonne University
Patricia Horcajada
Patricia Horcajada IMDEA Energy Institute
Peter A. Dowben
Peter A. Dowben University of Nebraska–Lincoln

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