The chart shows the distribution of publications by all Research.com ranked scientists in the field of Chemistry in 2026. The highlighted bar marks where Gang Wu sits on this spectrum.
This scientist: 606 publications — 93rd percentile
93% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,295 publications or more.
The chart shows the D-index (discipline H-index) distribution of Chemistry scientists ranked by Research.com in 2026. The highlighted bar marks where Gang Wu sits on this spectrum.
This scientist: 151 D-Index — 99th percentile
99% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 159 D-Index or more.
Gang Wu is a researcher affiliated with the University at Buffalo, State University of New York in the United States. Their work primarily spans the fields of Materials Science and Engineering, with a focus on subfields such as Materials Chemistry, Electrical and Electronic Engineering, Civil and Structural Engineering, Electronic, Optical and Magnetic Materials, and Atomic and Molecular Physics and Optics.
The scientist's research topics include advanced thermoelectric materials and devices, thermal properties of materials, thermal radiation and cooling technologies, advancements in battery materials, pharmaceutical and antibiotic environmental impacts, advanced battery materials and technologies, and chalcogenide semiconductor thin films.
Frequent co-authors collaborating with Gang Wu include:
They have published extensively in several scientific venues, with repeated contributions to:
Selected recent publications by Gang Wu include:
Gang Wu;Karren Leslie More;Christina Johnston;Piotr Zelenay
X. H. Chen;T. Wu;G. Wu;R. H. Liu
Frédéric Jaouen;Eric Proietti;Michel Lefèvre;Régis Chenitz
Hanguang Zhang;Sooyeon Hwang;Maoyu Wang;Zhenxing Feng
Jiazhan Li;Jiazhan Li;Mengjie Chen;David A. Cullen;Sooyeon Hwang
Gang Wu;Piotr Zelenay
Xiao Xia Wang;Mark T. Swihart;Gang Wu
Xiao Xia Wang;Xiao Xia Wang;David A. Cullen;Yung‐Tin Pan;Sooyeon Hwang
Hannah Osgood;Surya V. Devaguptapu;Hui Xu;Jaephil Cho
Yuxuan Wang;Hongyang Su;Yanghua He;Ligui Li
Q. Huang;Y. Qiu;Y. Qiu;Wei Bao;M. A. Green;M. A. Green
Yanghua He;Sooyeon Hwang;David A. Cullen;M. Aman Uddin
Gang Wu;Ana Santandreu;William Kellogg;Shiva Gupta
Yanghua He;Shengwen Liu;Cameron Priest;Qiurong Shi
Lijian Zuo;Zhuowei Gu;Tao Ye;Weifei Fu
Xiaohong Xie;Cheng He;Boyang Li;Yanghua He
Qingying Jia;Qingying Jia;Nagappan Ramaswamy;Nagappan Ramaswamy;Hasnain Hafiz;Hasnain Hafiz;Urszula Tylus;Urszula Tylus
Gang Wu;Christina M. Johnston;Nathan H. Mack;Kateryna Artyushkova
Anix Casimir;Hanguang Zhang;Ogechi Ogoke;Joseph C. Amine
Xien Liu;Wen Liu;Minseong Ko;Minjoon Park
Hanguang Zhang;Hoon T. Chung;David A. Cullen;Stephan Wagner
Gang Wu;Nathan H. Mack;Wei Gao;Shuguo Ma
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