The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Deep Jariwala sits on this spectrum.
This scientist: 214 publications — 53rd percentile
53% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 804 publications or more.
The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Deep Jariwala sits on this spectrum.
This scientist: 70 D-Index — 90th percentile
90% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 107 D-Index or more.
Deep Jariwala is a researcher affiliated with the University of Pennsylvania in the United States. Their work primarily spans the fields of Materials Science and Engineering, with a particular emphasis on Materials Chemistry and Electrical and Electronic Engineering. The research also touches on Biomedical Engineering, Atomic and Molecular Physics and Optics, and Electronic, Optical, and Magnetic Materials.
The main research topics explored by Deep Jariwala include 2D Materials and Applications, Perovskite Materials and Applications, and Graphene research and applications. Additional topics of focus are MXene and MAX Phase Materials, Ferroelectric and Negative Capacitance Devices, Advanced Memory and Neural Computing, and Acoustic Wave Resonator Technologies.
They have frequently published in venues such as arXiv (Cornell University), ACS Nano, Nano Letters, Nature Communications, and ACS Photonics. These are among the leading platforms for dissemination of cutting-edge materials science and nanotechnology research.
Deep Jariwala has collaborated recurrently with several researchers, including Eric A. Stach, Roy H. Olsson, Seunguk Song, Nicholas R. Glavin, and Gwangwoo Kim. These collaborations indicate a network of research partnerships across materials characterization, device engineering, and related fields.
Notable recent publications include:
Deep Jariwala;Vinod K. Sangwan;Lincoln J. Lauhon;Tobin J. Marks
Lijie Ci;Li Song;Chuanhong Jin;Deep Jariwala;Deep Jariwala
Joshua D. Wood;Spencer A. Wells;Deep Jariwala;Kan Sheng Chen
Deep Jariwala;Tobin J. Marks;Mark C. Hersam
B. P. Abbott;R. Abbott;T. D. Abbott;S. Abraham
Deep Jariwala;Vinod K. Sangwan;Lincoln J. Lauhon;Tobin J. Marks
Christopher R. Ryder;Joshua D. Wood;Spencer A. Wells;Yang Yang
Vinod K. Sangwan;Deep Jariwala;In Soo Kim;Kan Sheng Chen
Deep Jariwala;Vinod K. Sangwan;Chung Chiang Wu;Pradyumna L. Prabhumirashi
Deep Jariwala;Vinod K. Sangwan;Dattatray J. Late;Dattatray J. Late;James E. Johns
Deep Jariwala;Vinod K. Sangwan;Dattatray J. Late;James E. Johns
In Soo Kim;Vinod K. Sangwan;Deep Jariwala;Joshua D. Wood
Deep Jariwala;Sarah L. Howell;Kan Sheng Chen;Junmo Kang
Anchal Srivastava;Charudatta Galande;Lijie Ci;Li Song
Deep Jariwala;Artur R. Davoyan;Joeson Wong;Harry A. Atwater
Feng Wu;Qing Li;Peng Wang;Hui Xia
Vinod K. Sangwan;Heather N. Arnold;Deep Jariwala;Tobin J. Marks
Chung Chiang Wu;Deep Jariwala;Vinod K. Sangwan;Tobin J. Marks
Partha Kumbhakar;Chinmayee Chowde Gowda;Preeti Lata Mahapatra;Madhubanti Mukherjee
In Soo Kim;Vinod K. Sangwan;Deep Jariwala;Joshua D. Wood
Unknown
Joeson Wong;Deep Jariwala;Giulia Tagliabue;Kevin Tat
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