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David J. H. Cockayne

David J. H. Cockayne

D-Index & Metrics

Materials Science

D-Index
53
Citations
9264
World Ranking
9291
National Ranking
373

Overview

David J. H. Cockayne is affiliated with the University of Oxford in the United Kingdom. Their academic work is associated with this institution, where they conduct research and contribute to their field.

There is no available data on specific research papers authored by David J. H. Cockayne. Likewise, information regarding frequent co-authors, publication venues, and book publishers is not provided.

No detailed information exists about David J. H. Cockayne's main fields of study, subfields, or specific research topics. Similarly, no awards or honors have been recorded.

Due to the limited data, a comprehensive view of David J. H. Cockayne's research portfolio, collaborations, and academic contributions cannot be outlined in detail. The affiliation with the University of Oxford indicates involvement at a recognized research institution in the United Kingdom.

Best Publications

  • Investigations of dislocation strain fields using weak beams

    D. J. H. Cockayne;I. L. F. Ray;M. J. Whelan

  • Effects of interdiffusion on the luminescence of InGaAs/GaAs quantum dots

    R. Leon;Yong Kim;C. Jagadish;M. Gal

  • The measurement of stacking-fault energies of pure face-centred cubic metals

    Unknown

  • The structure of the C 70 molecule

    D. R. McKenzie;C. A. Davis;D. J. H. Cockayne;D. A. Muller

  • The Dissociation of Dislocations in Silicon

    I. L. F. Ray;David John Hugh Cockayne

  • Electron diffraction analysis of polycrystalline and amorphous thin films

    D. J. H. Cockayne;D. R. McKenzie

  • Dissociation of near-screw dislocations in germanium and silicon

    A. Gomez;D. J. H. Cockayne;P. B. Hirsch;V. Vitek

  • A Theoretical Analysis of the Weak-beam Method of Electron Microscopy

    D.J.H. Cockayne

  • The principles and practice of the weak-beam method of electron microscopy

    D. J. H. Cockayne

  • Rare earth element trends and cerium-uranium-manganese associations in weathered rock from Koongarra, Northern Territory, Australia

    Anthony J. Koppi;Robert Edis;Damien J. Field;Harold R. Geering

  • Damage to epitaxial GaN layers by silicon implantation

    H. H. Tan;J. S. Williams;J. Zou;D. J. H. Cockayne

  • The Study of Nanovolumes of Amorphous Materials Using Electron Scattering

    David J. H. Cockayne

  • Inhibited carrier transfer in ensembles of isolated quantum dots

    C Lobo;R Leon;S Marcinkevicius;W Yang

  • Strain relaxation by alloying effects in Ge islands grown on Si(001)

    X. Z. Liao;J. Zou;D. J. H. Cockayne;J. Qin

  • Electrical and structural analysis of high-dose Si implantation in GaN

    J. C. Zolper;H. H. Tan;J. S. Williams;J. Zou

  • A versatile double aberration-corrected, energy filtered HREM/STEM for materials science.

    John L. Hutchison;John M. Titchmarsh;David J.H. Cockayne;Ron C. Doole

  • Annealing of ion implanted gallium nitride

    H. H. Tan;J. S. Williams;J. Zou;D. J. H. Cockayne

  • Indium segregation and enrichment in coherent InxGa1-xAs/GaAs quantum dots

    X Z Liao;Jin Zou;David John Hugh Cockayne;R Leon

  • The observation of dissociated dislocations in silicon

    I. L. F. Ray;D. J. H. Cockayne

  • Electron optical characterization of cubic boron nitride thin films prepared by reactive ion plating

    D. R. McKenzie;D. J. H. Cockayne;D. A. Muller;M. Murakawa

  • Bulk Nanocrystalline Fe3Al-Based Material Prepared by Aluminothermic Reaction

    Peiqing La;Peiqing La;Jim Yang;David J. H. Cockayne;Weimin Liu

Frequent Co-Authors

Jin Zou
Jin Zou University of Queensland
David R. McKenzie
David R. McKenzie University of Sydney
Xiaozhou Liao
Xiaozhou Liao University of Sydney
Chennupati Jagadish
Chennupati Jagadish Australian National University
Hark Hoe Tan
Hark Hoe Tan Australian National University
James Williams
James Williams Australian National University
Dougal G. McCulloch
Dougal G. McCulloch RMIT University
Michael J. Hoffmann
Michael J. Hoffmann Karlsruhe Institute of Technology
Angus I. Kirkland
Angus I. Kirkland University of Oxford
Peter D. Nellist
Peter D. Nellist University of Oxford

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