The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Claude Lévy-Clément sits on this spectrum.
This scientist: 212 publications — 35th percentile
35% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Claude Lévy-Clément sits on this spectrum.
This scientist: 51 D-Index — 24th percentile
24% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Claude Lévy-Clément is affiliated with the Centre national de la recherche scientifique (CNRS) in France. Their research focuses on the fields of Chemical Engineering with a specific emphasis on Catalysis. The scientist's work primarily covers topics related to Ammonia Synthesis and Nitrogen Reduction.
Their recent publication record includes the following paper:
This contribution was published in the ECS Meeting Abstracts.
Frequent co-authors in their work include:
Claude Lévy-Clément's research explores innovative approaches within electrochemical processes aimed at nitrogen compound transformations. The investigation of silicon as an electrode material for the electrochemical reduction of nitrates represents a focal point of their recent scientific output.
Their involvement in the field of Catalysis situates them within ongoing efforts to develop and optimize chemical reaction processes, particularly in the context of ammonia synthesis and nitrogen reduction strategies. The alignment with Chemical Engineering indicates a broader application interest in practical and industrial chemical processes.
C. Chartier;S. Bastide;C. Lévy-Clément
C. Lévy‐Clément;R. Tena‐Zaera;R. Tena‐Zaera;M. A. Ryan;M. A. Ryan;A. Katty
Iván Mora-Seró;Francisco Fabregat-Santiago;Benjamin Denier;Juan Bisquert
Ivan Mora-Sero;Juan Bisquert;Francisco Fabregat-Santiago;Germa Garcia-Belmonte
R. Könenkamp;K. Boedecker;M. C. Lux-Steiner;M. Poschenrieder
Jamil Elias;Claude Lévy-Clément;Mikhael Bechelany;Johann Michler
Chandan Mazumdar;R. Nagarajan;C. Godart;L.C. Gupta
E.A. Ponomarev;M. Neumann-Spallart;G. Hodes;C. Lévy-Clément
Ramon Tena-Zaera;Jamil Elias;Gillaume Wang;Claude Levy-Clement
Jamil Elias;Ramon Tena-Zaera;Guillaume-Yangshu Wang;Claude Lévy-Clément
J. Elias;R. Tena-Zaera;C. Lévy-Clément
J. Elias;R. Tena-Zaera;C. Lévy-Clément
F. Bouamrane;F. Bouamrane;A. Tadjeddine;J.E. Butler;R. Tenne
I. Duo;C. Levy-Clement;A. Fujishima;C. Comninellis
Jamil Elias;and Ramon Tena-Zaera;Claude Lévy-Clément
Claude Lévy‐Clément;Abdelghani Lagoubi;Micha Tomkiewicz
C. Reuben;E. Galun;H. Cohen;R. Tenne
Renat Bilyalov;R Lüdemann;W Wettling;Lieven Stalmans
Ramon Tena-Zaera;Ramon Tena-Zaera;Margaret A. Ryan;Margaret A. Ryan;Abou Katty;Gary Hodes;Gary Hodes
R. Tena-Zaera;R. Tena-Zaera;A. Katty;S. Bastide;C. Lévy-Clément
C. Mazumdar;R. Nagarajan;C. Godart;L.C. Gupta
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