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Materials Science
India
2026

D-Index & Metrics

Materials Science

D-Index
108
Citations
41764
World Ranking
759
National Ranking
3

Chandrakant D. Lokhande publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Chandrakant D. Lokhande sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 615 publications — 93rd percentile

93% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Chandrakant D. Lokhande D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Chandrakant D. Lokhande sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 108 D-Index — 94th percentile

94% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Research.com Recognitions

  • 2026 - Research.com Materials Science in India Leader Award
  • 2025 - Research.com Materials Science in India Leader Award
  • 2023 - Research.com Materials Science in India Leader Award
  • 2022 - Research.com Materials Science in India Leader Award

Overview

What is he best known for?

The fields of study he is best known for:

  • Organic chemistry
  • Thin film
  • Redox

His primary areas of investigation include Thin film, Chemical engineering, Scanning electron microscope, Analytical chemistry and Supercapacitor. His Thin film research is multidisciplinary, incorporating perspectives in Amorphous solid, Substrate, Band gap and Nanocrystalline material. The concepts of his Chemical engineering study are interwoven with issues in Zinc nitrate, Zinc, Mineralogy, Tin oxide and Cobalt oxide.

His Scanning electron microscope research integrates issues from Contact angle, Direct and indirect band gaps, Electrical resistivity and conductivity, Absorption and Cyclic voltammetry. His Analytical chemistry research integrates issues from Doping, Fourier transform infrared spectroscopy, X-ray crystallography, Transmission electron microscopy and Horizontal scan rate. In his study, which falls under the umbrella issue of Supercapacitor, Aqueous solution and Inorganic chemistry is strongly linked to Electrolyte.

His most cited work include:

  • Chemical deposition method for metal chalcogenide thin films (612 citations)
  • Metal oxide thin film based supercapacitors (606 citations)
  • Metal oxide thin film based supercapacitors (606 citations)

What are the main themes of his work throughout his whole career to date?

Chandrakant D. Lokhande mostly deals with Thin film, Chemical engineering, Analytical chemistry, Scanning electron microscope and Chemical bath deposition. His Thin film research includes elements of Amorphous solid, Supercapacitor, Substrate, Band gap and Nanocrystalline material. The various areas that he examines in his Band gap study include Annealing and Electrical resistivity and conductivity.

His Chemical engineering research incorporates themes from Oxide, Layer, Nanotechnology, Mineralogy and Electrochemistry. His study looks at the relationship between Analytical chemistry and topics such as Cyclic voltammetry, which overlap with Dielectric spectroscopy. Chandrakant D. Lokhande works mostly in the field of Scanning electron microscope, limiting it down to topics relating to Contact angle and, in certain cases, Wetting.

He most often published in these fields:

  • Thin film (76.40%)
  • Chemical engineering (49.37%)
  • Analytical chemistry (33.69%)

What were the highlights of his more recent work (between 2015-2021)?

  • Thin film (76.40%)
  • Chemical engineering (49.37%)
  • Supercapacitor (21.62%)

In recent papers he was focusing on the following fields of study:

Chandrakant D. Lokhande spends much of his time researching Thin film, Chemical engineering, Supercapacitor, Electrode and Analytical chemistry. His Thin film research focuses on Chemical bath deposition in particular. His studies in Chemical engineering integrate themes in fields like Oxide, Electrochemistry and Specific surface area.

His biological study spans a wide range of topics, including Electrolyte, Horizontal scan rate and Nanotechnology, Graphene. His studies deal with areas such as Optoelectronics and Transition metal as well as Electrode. His Analytical chemistry study integrates concerns from other disciplines, such as Nanoparticle, Band gap and Scanning electron microscope.

Between 2015 and 2021, his most popular works were:

  • Synthetic approach from polypyrrole nanotubes to nitrogen doped pyrolyzed carbon nanotubes for asymmetric supercapacitors (127 citations)
  • Development of Cu2SnS3 (CTS) thin film solar cells by physical techniques: A status review (87 citations)
  • Supercapacitive composite metal oxide electrodes formed with carbon, metal oxides and conducting polymers (85 citations)

In his most recent research, the most cited papers focused on:

  • Organic chemistry
  • Redox
  • Hydrogen

Thin film, Supercapacitor, Chemical engineering, Electrode and Analytical chemistry are his primary areas of study. Many of his research projects under Thin film are closely connected to Specific energy with Specific energy, tying the diverse disciplines of science together. His Supercapacitor research is multidisciplinary, incorporating elements of Electrolyte, Horizontal scan rate and Nanotechnology.

His Chemical engineering research incorporates elements of Layer and Substrate. He has researched Electrode in several fields, including Composite number, Cobalt oxide, Spinel and Transition metal. He combines subjects such as Phase, Band gap and Scanning electron microscope with his study of Analytical chemistry.

Best Publications

  • Chemical deposition method for metal chalcogenide thin films

    R.S. Mane;C.D. Lokhande

  • Metal oxide thin film based supercapacitors

    Chandrakant Lokhande;Chandrakant Lokhande;Deepak Dubal;Oh-Shim Joo

  • Deposition of metal chalcogenide thin films by successive ionic layer adsorption and reaction (SILAR) method

    H. M. Pathan;C. D. Lokhande

  • Supercapacitive cobalt oxide (Co3O4) thin films by spray pyrolysis

    V.R. Shinde;S.B. Mahadik;T.P. Gujar;C.D. Lokhande

  • Porous polypyrrole clusters prepared by electropolymerization for a high performance supercapacitor

    Deepak P. Dubal;Deepak P. Dubal;Sang Ho Lee;Jong Guk Kim;Won Bae Kim

  • Recent status of chemical bath deposited metal chalcogenide and metal oxide thin films

    S.M. Pawar;B.S. Pawar;J.H. Kim;Oh-Shim Joo

  • Fabrication of copper oxide multilayer nanosheets for supercapacitor application

    Deepak Dubal;Dattatray Dhawale;Rahul Salunkhe;Vinayak Jamdade

  • Characterization of honeycomb-like "β-Ni(OH) 2 " thin films synthesized by chemical bath deposition method and their supercapacitor application

    U.M. Patil;K.V. Gurav;V.J. Fulari;C.D. Lokhande;C.D. Lokhande

  • Chemical synthesis of Fe2O3 thin films for supercapacitor application

    Prakash Kulal;Deepak Dubal;Chandrakant Lokhande;Vijay Fulari

  • Chemical synthesis of spinel cobalt ferrite (CoFe2O4) nano-flakes for supercapacitor application

    V.S. Kumbhar;A.D. Jagadale;N.M. Shinde;C.D. Lokhande

  • Preparation of cobalt oxide thin films and its use in supercapacitor application

    S.G. Kandalkar;J.L. Gunjakar;C.D. Lokhande

  • Mn doped and undoped ZnO films: A comparative structural, optical and electrical properties study

    V.R. Shinde;T.P. Gujar;C.D. Lokhande;R.S. Mane

  • Electrosynthesis of Bi2O3 thin films and their use in electrochemical supercapacitors

    T.P. Gujar;V.R. Shinde;C.D. Lokhande;C.D. Lokhande;Sung-Hwan Han

  • Hydrophobic and textured ZnO films deposited by chemical bath deposition: Annealing effect

    V. R. Shinde;C. D. Lokhande;R. S. Mane;Sung Hwan Han

  • Chemically deposited nanocrystalline NiO thin films for supercapacitor application

    U.M. Patil;R.R. Salunkhe;K.V. Gurav;C.D. Lokhande

  • LPG sensing properties of ZnO films prepared by spray pyrolysis method : Effect of molarity of precursor solution

    V.R. Shinde;T.P. Gujar;C.D. Lokhande

  • CuO cauliflowers for supercapacitor application: Novel potentiodynamic deposition

    Deepak P. Dubal;Girish S. Gund;Chandrakant D. Lokhande;Rudolf Holze

  • Chemical synthesis of cobalt oxide thin film electrode for supercapacitor application

    S. G. Kandalkar;D. S. Dhawale;Chang Koo Kim;C. D. Lokhande

  • Electrodeposited porous and amorphous copper oxide film for application in supercapacitor

    V.D. Patake;S.S. Joshi;C.D. Lokhande;C.D. Lokhande;Oh-Shim Joo

  • Enhanced activity of chemically synthesized hybrid graphene oxide/Mn3O4 composite for high performance supercapacitors

    Girish S. Gund;Deepak P. Dubal;Bebi H. Patil;Sujata S. Shinde

Frequent Co-Authors

Rajaram S. Mane
Rajaram S. Mane Swami Ramanand Teerth Marathwada University
Deepak P. Dubal
Deepak P. Dubal Queensland University of Technology
Jin Hyeok Kim
Jin Hyeok Kim Chonnam National University
Sung-Hwan Han
Sung-Hwan Han Hanyang University
Dattatray S. Dhawale
Dattatray S. Dhawale Commonwealth Scientific and Industrial Research Organisation
Oh-Shim Joo
Oh-Shim Joo Korea Institute of Science and Technology
Babasaheb R. Sankapal
Babasaheb R. Sankapal Visvesvaraya National Institute of Technology
Umakant M. Patil
Umakant M. Patil D.Y. Patil University
Rahul R. Salunkhe
Rahul R. Salunkhe National Institute for Materials Science
Nilesh R. Chodankar
Nilesh R. Chodankar Khalifa University

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