The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Alan V. Chadwick sits on this spectrum.
This scientist: 346 publications — 69th percentile
69% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Alan V. Chadwick sits on this spectrum.
This scientist: 57 D-Index — 39th percentile
39% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Alan V. Chadwick is affiliated with the University of Kent in the United Kingdom and specializes in materials science and engineering. Their research primarily targets advancements in battery materials and related technologies.
The scientist's work spans various subfields including electrical and electronic engineering, materials chemistry, electronic, optical and magnetic materials, inorganic chemistry, as well as surfaces, coatings, and films. This multidisciplinary approach supports investigations into the development of materials with applications in energy conversion and storage.
The main research topics covered by Chadwick include:
Chadwick has published extensively, including notable papers such as:
Frequent collaborators in their research include David M. Pickup, Giannantonio Cibin, John T. S. Irvine, A. Robert Armstrong, and Stephanie F. Linnell.
Chadwick's publications are often featured in journals such as Journal of Materials Chemistry A, Chemistry of Materials, ChemPlusChem, The Cambridge Structural Database, and Nature Communications.
Kun Luo;Matthew R. Roberts;Rong Hao;Niccoló Guerrini
J. Aleman;Alan V. Chadwick;J. He;M. Hess
Urmimala Maitra;Robert A. House;James W. Somerville;Nuria Tapia-Ruiz
Feng Jiao;Andrew Harrison;Jean-Claude Jumas;Alan V. Chadwick
Kristopher Page;Robert G. Palgrave;Ivan P. Parkin;Michael Wilson
Kun Luo;Matthew R. Roberts;Niccoló Guerrini;Nuria Tapia-Ruiz
C. Delmas;J.P. Peres;A. Rougier;A. Demourgues
Feng Jiao;‡ Jean-Claude Jumas;Manfred Womes;Alan V. Chadwick
Feng Jiao;Adrian H. Hill;Andrew Harrison;Aaron Berko
C. R. A. Catlow;A. V. Chadwick;G. N. Greaves;L. M. Moroney
A. Rougier;C. Delmas;Alan V. Chadwick
Ryan Chatten;Alan V. Chadwick;and Aline Rougier;Philip J. D. Lindan
Robert A. House;Urmimala Maitra;Liyu Jin;Juan G. Lozano
B. Vessal;G.N. Greaves;G.N. Greaves;P.T. Marten;Alan V. Chadwick
G. N. Greaves;S. J. Gurman;C. R. A. Catlow;A. V. Chadwick
A.V. Chadwick
U. Lafont;Daniela Carta;Gavin Mountjoy;Alan V. Chadwick
C. R. A. Catlow;A. V. Chadwick;G. N. Greaves;L. M. Moroney
Robert L. van Ewyk;Alan V. Chadwick;John D. Wright
L. A. O'Dell;S. L. P. Savin;A. V. Chadwick;Mark E. Smith
Chunzhen Yang;Christel Laberty-Robert;Dmitry Batuk;Giannantonio Cibin
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