The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Thomas A. Lograsso sits on this spectrum.
This scientist: 449 publications — 82nd percentile
82% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Thomas A. Lograsso sits on this spectrum.
This scientist: 68 D-Index — 63rd percentile
63% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Thomas A. Lograsso is affiliated with Ames Laboratory in the United States. Their research focuses primarily on materials science and physics, particularly in the areas of electronic, optical, and magnetic materials, as well as condensed matter physics. Their work also spans materials chemistry, mechanical engineering, and general materials science.
The scientist's main topics of research include rare-earth and actinide compounds, magnetic properties of alloys, and iron-based superconductors research. Additional areas of focus cover the physics of superconductivity and magnetism, metallic glasses and amorphous alloys, metallurgical and alloy processes, and magnetic properties of thin films.
Thomas A. Lograsso has published extensively, with several notable recent papers such as:
Frequent collaborators include D. L. Schlagel, Andriy Palasyuk, Yong Liu, Kyuil Cho, and M. Kończykowski. Their collaboration contributed to several publications over time, particularly in the fields of materials science and condensed matter physics.
The scientist has published multiple papers in prominent venues such as:
Their academic contributions largely concern the investigation and development of advanced materials with focus on magnetic and superconducting properties, enabling deeper understanding of the underlying physics and potential applications in technology and industry.
S. J. Murray;M. Marioni;S. M. Allen;R. C. O'Handley
A.E. Clark;J.B. Restorff;M. Wun-Fogle;T.A. Lograsso
A. E. Clark;K. B. Hathaway;M. Wun-Fogle;J. B. Restorff
Karl Gschneidner;Alan Russell;Alexandra Pecharsky;James Morris
A.E. Clark;M. Wun-Fogle;J.B. Restorff;T.A. Lograsso
M. Pasquale;C. P. Sasso;L. H. Lewis;L. Giudici
T.A. Lograsso;A.R. Ross;D.L. Schlagel;A.E. Clark
Arthur E. Clark;Marilyn Wun-Fogle;James B. Restorff;Thomas A. Lograsso
Q. Xing;Y. Du;R.J. McQueeney;R.J. McQueeney;T.A. Lograsso
J.R Cullen;A.E Clark;M Wun-Fogle;J.B Restorff
R.A. Kellogg;A.M. Russell;A.M. Russell;T.A. Lograsso;T.A. Lograsso;A.B. Flatau
J.-Q. Yan;Andreas Kreyssig;Shibabrata Nandi;N. Ni
Ling Li;Angelica Tirado;I. C. Nlebedim;Orlando Rios
R. A. Kellogg;Alison B. Flatau;A. E. Clark;M. Wun-Fogle
Lihong Bao;Liang He;Nicholas Meyer;Xufeng Kou
Tianqi Li;Aaron Patz;Aaron Patz;Leonidas Mouchliadis;Leonidas Mouchliadis;Jiaqiang Yan;Jiaqiang Yan
E. M. Summers;T. A. Lograsso;M. Wun-Fogle
D.L Schlagel;Y.L Wu;W Zhang;T.A Lograsso
J. B. Restorff;M. Wun-Fogle;K. B. Hathaway;A. E. Clark
Z. Papadopolos;G. Kasner;J. Ledieu;E. J. Cox
If you think any of the details on this page are incorrect, let us know.
University of Wisconsin–Madison
University of Nottingham
Kyoto University
Heidelberg University
Tokyo Institute of Technology
Brunel University London
King's College London
University of Oklahoma Health Sciences Center
Amsterdam University Medical Centers
Istituto Universitario Di Studi Superiori Di Pavia
Cisco Systems (United States)
University of York
Sofia University
University of Wisconsin–Madison
Washington University in St. Louis
Norwegian University of Science and Technology
