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D-Index & Metrics

Materials Science

D-Index
46
Citations
10565
World Ranking
11328
National Ranking
2656

Stephen A. Campbell publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Stephen A. Campbell sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 431 publications — 81st percentile

81% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Stephen A. Campbell D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Stephen A. Campbell sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 46 D-Index — 12th percentile

12% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Stephen A. Campbell is affiliated with the University of Minnesota in the United States. Their research primarily focuses on materials science and engineering, with particular emphasis on materials chemistry and electrical and electronic engineering. Their work involves the study and application of various advanced materials, including two-dimensional (2D) materials, perovskite materials, graphene, chalcogenide semiconductor thin films, and MXene and MAX phase materials.

The scientist's recent publications include the following papers:

  • Growth of black arsenic phosphorus thin films and its application for field-effect transistors, published in 2021 in Nanotechnology
  • Growth of Very Large MoS2 Single Crystals Using Out-Diffusion Transport and Their Use in Field Effect Transistors, published in 2021 in IEEE Transactions on Nanotechnology
  • Rational control of WSe2 layer number via hydrogen-controlled chemical vapor deposition, published in 2020 in Nanotechnology

Their frequent coauthors include Nezhueyotl Izquierdo, Jason C. Myers, Prafful Golani, Adonica De Los Santos, and Nicholas C. A. Seaton. Publications are predominantly found in the journals Nanotechnology and IEEE Transactions on Nanotechnology.

The main topics of Stephen A. Campbell's research cover:

  • 2D Materials and Applications
  • Perovskite Materials and Applications
  • Graphene research and applications
  • Chalcogenide Semiconductor Thin Films
  • MXene and MAX Phase Materials

The scientist's work intersects several advanced materials and applications, focusing on both the synthesis and device implementation aspects. This includes thin films and large single crystals, particularly applied in field-effect transistors, showcasing a blend of chemical vapor deposition techniques and transport phenomena.

Best Publications

  • The Science and Engineering of Microelectronic Fabrication

    Stephen A. Campbell

  • MOSFET transistors fabricated with high permitivity TiO/sub 2/ dielectrics

    S.A. Campbell;D.C. Gilmer;Xiao-Chuan Wang;Ming-Ta Hsieh

  • Titanium dioxide (TiO 2 )-based gate insulators

    S. A. Campbell;H.-S. Kim;D. C. Gilmer;B. He

  • Chemical vapour deposition of the oxides of titanium, zirconium and hafnium for use as high‐k materials in microelectronic devices. A carbon‐free precursor for the …

    Unknown

  • Imaging and phase identification of Cu2ZnSnS4 thin films using confocal Raman spectroscopy

    A. J. Cheng;M. Manno;A. Khare;Chris Leighton

  • Fabrication Engineering at the Micro and Nanoscale

    Stephen A. Campbell

  • Internal photoemission of electrons and holes from (100)Si into

    Unknown

  • Doping efficiency, dopant location, and oxidation of Si nanocrystals

    X. D. Pi;R. Gresback;R. W. Liptak;S. A. Campbell

  • Atmospheric hydrogen peroxide

    Unknown

  • Leakage current and electrical breakdown in metal‐organic chemical vapor deposited TiO2 dielectrics on silicon substrates

    Hyeon Seag Kim;D. C. Gilmer;Stephen A Campbell;D. L. Polla

  • The impact of genetic counselling about breast cancer risk on women’s risk perceptions and levels of distress

    A Cull;E D C Anderson;S Campbell;J Mackay

  • Does Chemistry Really Matter in the Chemical Vapor Deposition of Titanium Dioxide? Precursor and Kinetic Effects on the Microstructure of Polycrystalline Films

    Charles J. Taylor;David C. Gilmer;Daniel G. Colombo;G. D. Wilk

  • Air-stable full-visible-spectrum emission from silicon nanocrystals synthesized by an all-gas-phase plasma approach.

    X D Pi;R W Liptak;J Deneen Nowak;N P Wells

  • Anhydrous Metal Nitrates as Volatile Single Source Precursors for the CVD of Metal Oxide Films

    Daniel G. Colombo;David C. Gilmer;Victor G. Young;Stephen A. Campbell

  • Structural and electrical characterization of TiO2 grown from titanium tetrakis‐isopropoxide (TTIP) and TTIP/H2O ambients

    J. Yan;D. C. Gilmer;Stephen A Campbell;Wayne L Gladfelter

  • Reduction of titanium and other metal oxides using electrodeoxidation

    Unknown

  • Method and apparatus for reducing reactant crossover in a liquid feed electrochemical fuel cell

    David P. Wilkinson;Mark C. Johnson;Kevin M. Colbow;Stephen A. Campbell

  • Approaching nanoxerography: The use of electrostatic forces to position nanoparticles with 100 nm scale resolution

    Heiko O. Jacobs;Stephen A. Campbell;Michael G. Steward

  • Room-temperature atmospheric oxidation of Si nanocrystals after HF etching

    X. D. Pi;L. Mangolini;S. A. Campbell;U. Kortshagen

  • Plasma synthesis of single-crystal silicon nanoparticles for novel electronic device applications

    Ameya Bapat;Curtis Anderson;Christopher R. Perrey;C. Barry Carter

  • A study of mixtures of HfO2 and TiO2 as high-k gate dielectrics

    Unknown

  • Task-oriented sensing, computation, and communication integration for multi-device edge AI

    Unknown

  • Revealing the Origins of 3D Anisotropic Thermal Conductivities of Black Phosphorus

    Jie Zhu;Jie Zhu;Haechan Park;Jun‐Yang Chen;Xiaokun Gu

  • Post-synthetic modification of covalent organic frameworks for CO2 electroreduction

    Unknown

Frequent Co-Authors

Wayne L. Gladfelter
Wayne L. Gladfelter University of Minnesota
Uwe R. Kortshagen
Uwe R. Kortshagen University of Minnesota
David P. Wilkinson
David P. Wilkinson University of British Columbia
Eray S. Aydil
Eray S. Aydil New York University
Siyu Ye
Siyu Ye SinoHyKey
Xiaodong Pi
Xiaodong Pi Zhejiang University
Peter H. McMurry
Peter H. McMurry University of Minnesota
Tianhong Cui
Tianhong Cui University of Minnesota

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