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Materials Science

D-Index
46
Citations
10565
World Ranking
11330
National Ranking
2659

Overview

Stephen A. Campbell is affiliated with the University of Minnesota in the United States. Their research primarily focuses on materials science and engineering, with particular emphasis on materials chemistry and electrical and electronic engineering. Their work involves the study and application of various advanced materials, including two-dimensional (2D) materials, perovskite materials, graphene, chalcogenide semiconductor thin films, and MXene and MAX phase materials.

The scientist's recent publications include the following papers:

  • Growth of black arsenic phosphorus thin films and its application for field-effect transistors, published in 2021 in Nanotechnology
  • Growth of Very Large MoS2 Single Crystals Using Out-Diffusion Transport and Their Use in Field Effect Transistors, published in 2021 in IEEE Transactions on Nanotechnology
  • Rational control of WSe2 layer number via hydrogen-controlled chemical vapor deposition, published in 2020 in Nanotechnology

Their frequent coauthors include Nezhueyotl Izquierdo, Jason C. Myers, Prafful Golani, Adonica De Los Santos, and Nicholas C. A. Seaton. Publications are predominantly found in the journals Nanotechnology and IEEE Transactions on Nanotechnology.

The main topics of Stephen A. Campbell's research cover:

  • 2D Materials and Applications
  • Perovskite Materials and Applications
  • Graphene research and applications
  • Chalcogenide Semiconductor Thin Films
  • MXene and MAX Phase Materials

The scientist's work intersects several advanced materials and applications, focusing on both the synthesis and device implementation aspects. This includes thin films and large single crystals, particularly applied in field-effect transistors, showcasing a blend of chemical vapor deposition techniques and transport phenomena.

Best Publications

  • The Science and Engineering of Microelectronic Fabrication

    Stephen A. Campbell

  • MOSFET transistors fabricated with high permitivity TiO/sub 2/ dielectrics

    S.A. Campbell;D.C. Gilmer;Xiao-Chuan Wang;Ming-Ta Hsieh

  • Titanium dioxide (TiO 2 )-based gate insulators

    S. A. Campbell;H.-S. Kim;D. C. Gilmer;B. He

  • Chemical vapour deposition of the oxides of titanium, zirconium and hafnium for use as high‐k materials in microelectronic devices. A carbon‐free precursor for the …

    Unknown

  • Imaging and phase identification of Cu2ZnSnS4 thin films using confocal Raman spectroscopy

    A. J. Cheng;M. Manno;A. Khare;Chris Leighton

  • Fabrication Engineering at the Micro and Nanoscale

    Stephen A. Campbell

  • Internal photoemission of electrons and holes from (100)Si into

    Unknown

  • Doping efficiency, dopant location, and oxidation of Si nanocrystals

    X. D. Pi;R. Gresback;R. W. Liptak;S. A. Campbell

  • Atmospheric hydrogen peroxide

    Unknown

  • Leakage current and electrical breakdown in metal‐organic chemical vapor deposited TiO2 dielectrics on silicon substrates

    Hyeon Seag Kim;D. C. Gilmer;Stephen A Campbell;D. L. Polla

  • The impact of genetic counselling about breast cancer risk on women’s risk perceptions and levels of distress

    A Cull;E D C Anderson;S Campbell;J Mackay

  • Does Chemistry Really Matter in the Chemical Vapor Deposition of Titanium Dioxide? Precursor and Kinetic Effects on the Microstructure of Polycrystalline Films

    Charles J. Taylor;David C. Gilmer;Daniel G. Colombo;G. D. Wilk

  • Air-stable full-visible-spectrum emission from silicon nanocrystals synthesized by an all-gas-phase plasma approach.

    X D Pi;R W Liptak;J Deneen Nowak;N P Wells

  • Anhydrous Metal Nitrates as Volatile Single Source Precursors for the CVD of Metal Oxide Films

    Daniel G. Colombo;David C. Gilmer;Victor G. Young;Stephen A. Campbell

  • Structural and electrical characterization of TiO2 grown from titanium tetrakis‐isopropoxide (TTIP) and TTIP/H2O ambients

    J. Yan;D. C. Gilmer;Stephen A Campbell;Wayne L Gladfelter

  • Reduction of titanium and other metal oxides using electrodeoxidation

    Unknown

  • Method and apparatus for reducing reactant crossover in a liquid feed electrochemical fuel cell

    David P. Wilkinson;Mark C. Johnson;Kevin M. Colbow;Stephen A. Campbell

  • Approaching nanoxerography: The use of electrostatic forces to position nanoparticles with 100 nm scale resolution

    Heiko O. Jacobs;Stephen A. Campbell;Michael G. Steward

  • Room-temperature atmospheric oxidation of Si nanocrystals after HF etching

    X. D. Pi;L. Mangolini;S. A. Campbell;U. Kortshagen

  • Plasma synthesis of single-crystal silicon nanoparticles for novel electronic device applications

    Ameya Bapat;Curtis Anderson;Christopher R. Perrey;C. Barry Carter

  • A study of mixtures of HfO2 and TiO2 as high-k gate dielectrics

    Unknown

  • Task-oriented sensing, computation, and communication integration for multi-device edge AI

    Unknown

  • Revealing the Origins of 3D Anisotropic Thermal Conductivities of Black Phosphorus

    Jie Zhu;Jie Zhu;Haechan Park;Jun‐Yang Chen;Xiaokun Gu

  • Post-synthetic modification of covalent organic frameworks for CO2 electroreduction

    Unknown

Frequent Co-Authors

Wayne L. Gladfelter
Wayne L. Gladfelter University of Minnesota
Uwe R. Kortshagen
Uwe R. Kortshagen University of Minnesota
David P. Wilkinson
David P. Wilkinson University of British Columbia
Eray S. Aydil
Eray S. Aydil New York University
Siyu Ye
Siyu Ye SinoHyKey
Xiaodong Pi
Xiaodong Pi Zhejiang University
Peter H. McMurry
Peter H. McMurry University of Minnesota
Tianhong Cui
Tianhong Cui University of Minnesota

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