World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
62
Citations
18460
World Ranking
6369
National Ranking
1919

Shiyu Du publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Shiyu Du sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 259 publications — 49th percentile

49% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Shiyu Du D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Shiyu Du sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 62 D-Index — 51st percentile

51% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Shiyu Du is affiliated with the Chinese Academy of Sciences in China, with a research profile centered on materials science and engineering. Their scholarly output includes extensive work on MXene and MAX phase materials as well as nuclear materials and properties, which constitute core areas of their research. They have contributed to the advancement of 2D materials and applications alongside specialized topics like advanced ceramic materials synthesis and aluminum alloys composites properties.

Their research spans several subfields, predominantly materials chemistry, mechanical engineering, and electrical and electronic engineering, while also covering aerospace engineering and renewable energy, sustainability, and the environment.

Frequent collaborators include Qing Huang, Yiming Zhang, Nianxiang Qiu, Zhifang Chai, and Youbing Li. Shiyu Du has published extensively in venues such as arXiv (Cornell University), SSRN Electronic Journal, Journal of Materials Research and Technology, IEEE Access, and Journal of Nuclear Materials.

Notable recent papers include:

  • "A general Lewis acidic etching route for preparing MXenes with enhanced electrochemical performance in non-aqueous electrolyte" (2020, Nature Materials)
  • "Halogenated Ti3C2 MXenes with Electrochemically Active Terminals for High-Performance Zinc Ion Batteries" (2021, ACS Nano)
  • "Rational Design of Highly Stable and Active MXene-Based Bifunctional ORR/OER Double-Atom Catalysts" (2021, Advanced Materials)
  • "Lattice Matching and Halogen Regulation for Synergistically Induced Uniform Zinc Electrodeposition by Halogenated Ti3C2 MXenes" (2021, ACS Nano)
  • "Enhanced Electromagnetic Shielding and Thermal Conductive Properties of Polyolefin Composites with a Ti3C2Tx MXene/Graphene Framework Connected by a Hydrogen-Bonded Interface" (2022, ACS Nano)

Best Publications

  • A general Lewis acidic etching route for preparing MXenes with enhanced electrochemical performance in non-aqueous electrolyte

    Youbing Li;Hui Shao;Hui Shao;Zifeng Lin;Jun Lu

  • Element Replacement Approach by Reaction with Lewis Acidic Molten Salts to Synthesize Nanolaminated MAX Phases and MXenes

    Mian Li;Jun Lu;Kan Luo;Youbing Li

  • Photoluminescent Ti3C2 MXene Quantum Dots for Multicolor Cellular Imaging

    Qi Xue;Huijie Zhang;Minshen Zhu;Zengxia Pei

  • A Two-Dimensional Zirconium Carbide by Selective Etching of Al3C3 from Nanolaminated Zr3Al3C5.

    Jie Zhou;Xianhu Zha;Fan Y. Chen;Qun Ye

  • Effects of graphene content on the microstructure and properties of copper matrix composites

    Fanyan Chen;Jiamin Ying;Yifei Wang;Shiyu Du

  • Synthesis and Electrochemical Properties of Two-Dimensional Hafnium Carbide

    Jie Zhou;Xianhu Zha;Xiaobing Zhou;Fanyan Chen

  • Chemical scissor–mediated structural editing of layered transition metal carbides

    Unknown

  • Role of the surface effect on the structural, electronic and mechanical properties of the carbide MXenes

    Xian-Hu Zha;Kan Luo;Qiuwu Li;Qing Huang

  • Enhanced thermal properties of poly(vinylidene fluoride) composites with ultrathin nanosheets of MXene

    Yong Cao;Qihuang Deng;Zhiduo Liu;Dianyu Shen

  • Rational Design of Flexible Two-Dimensional MXenes with Multiple Functionalities

    Zhongheng Fu;Ning Wang;Dominik Legut;Chen Si

  • Halogenated Ti3C2 MXenes with Electrochemically Active Terminals for High-Performance Zinc Ion Batteries.

    Mian Li;Xinliang Li;Guifang Qin;Kan Luo

  • Facile preparation of in situ coated Ti3C2Tx/Ni0.5Zn0.5Fe2O4 composites and their electromagnetic performance

    Youbing Li;Youbing Li;Xiaobing Zhou;Xiaobing Zhou;Jing Wang;Qihuang Deng

  • Metal-Level Thermally Conductive yet Soft Graphene Thermal Interface Materials.

    Wen Dai;Tengfei Ma;Qingwei Yan;Jingyao Gao

  • Loading Actinides in Multilayered Structures for Nuclear Waste Treatment: The First Case Study of Uranium Capture with Vanadium Carbide MXene

    Lin Wang;Liyong Yuan;Ke Chen;Yujuan Zhang

  • Promising electron mobility and high thermal conductivity in Sc2CT2 (T = F, OH) MXenes

    Xian-Hu Zha;Jie Zhou;Yuhong Zhou;Qing Huang

  • The thermal and electrical properties of the promising semiconductor MXene Hf2CO2.

    Xian-Hu Zha;Qing Huang;Jian He;Heming He

  • Rational Design of Highly Stable and Active MXene-Based Bifunctional ORR/OER Double-Atom Catalysts

    Bo Wei;Zhongheng Fu;Dominik Legut;Timothy C Germann

  • A Paper-Like Inorganic Thermal Interface Material Composed of Hierarchically Structured Graphene/Silicon Carbide Nanorods.

    Wen Dai;Le Lv;Jibao Lu;Hao Hou

  • Lattice Matching and Halogen Regulation for Synergistically Induced Uniform Zinc Electrodeposition by Halogenated Ti3C2 MXenes.

    Unknown

  • Intrinsic Structural, Electrical, Thermal, and Mechanical Properties of the Promising Conductor Mo2C MXene

    Xian-Hu Zha;Jingshuo Yin;Yuhong Zhou;Qing Huang

  • The thermal and electrical properties of the promising semiconductor MXene Hf2CO2

    Xian-Hu Zha;Qing Huang;Jian He;Heming He

  • A general Lewis acidic etching route for preparing MXenes with enhanced electrochemical performance in non-aqueous electrolyte

    Youbing Li;Hui Shao;Zifeng Lin;Jun Lu

Frequent Co-Authors

Qing Huang
Qing Huang Chinese Academy of Sciences
Cheng-Te Lin
Cheng-Te Lin Chinese Academy of Sciences
Per Eklund
Per Eklund Uppsala University
Joseph S. Francisco
Joseph S. Francisco University of Pennsylvania
Zhifang Chai
Zhifang Chai Chinese Academy of Sciences
Per Persson
Per Persson Linköping University
Timothy C. Germann
Timothy C. Germann Los Alamos National Laboratory
Lars Hultman
Lars Hultman Linköping University
Ruifeng Zhang
Ruifeng Zhang Beihang University
Minghui Yang
Minghui Yang Chinese Academy of Sciences

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