John T. Vaughey is affiliated with Argonne National Laboratory in the United States. Their research primarily spans the fields of engineering and materials science, with specific focus on electrical and electronic engineering, materials chemistry, mechanical engineering, automotive engineering, and electronic, optical, and magnetic materials.
The scientist's work covers numerous topics related to battery technology, crystallography, and material processes. The main topics of their research include:
John T. Vaughey has contributed to various publication venues, frequently publishing in:
Their collaborations include frequent co-authors such as Saul H. Lapidus, Baris Key, Gerbrand Ceder, Justin C. Hancock, and Kenneth R. Poeppelmeier.
Recent papers authored or co-authored by John T. Vaughey include:
John T. Vaughey was recognized in 2018 as a Fellow of the American Association for the Advancement of Science (AAAS).
Michael M. Thackeray;Sun Ho Kang;Christopher S. Johnson;John T. Vaughey
Michael M. Thackeray;Christopher S. Johnson;John T. Vaughey;N. Li
C.S. Johnson;J-S. Kim;C. Lefief;N. Li
Christopher S. Johnson;Naichao Li;Christina Lefief;John T. Vaughey
Jeom Soo Kim;Christopher S. Johnson;John T. Vaughey;Michael M. Thackeray
Michael M. Thackeray;Yang Shao‐Horn;Arthur J. Kahaian;Keith D. Kepler
C. H. Chen;J. T. Vaughey;A. N. Jansen;D. W. Dees
Keith D. Kepler;John T. Vaughey;Michael M. Thackeray
Donghan Kim;Sun-Ho Kang;Michael Slater;Shawn Rood
M.M. Thackeray;S.-H. Kang;C.S. Johnson;J.T. Vaughey
K. D. Kepler;J. T. Vaughey;M. Thackeray
Fikile R. Brushett;John T. Vaughey;Andrew N. Jansen
Erin M. Sorensen;Scott J. Barry;Ha Kyun Jung;James R. Rondinelli
Albert L. Lipson;Baofei Pan;Saul H. Lapidus;Chen Liao
S.-H. Kang;C. S. Johnson;J. T. Vaughey;K. Amine
Josefine D. McBrayer;Josefine D. McBrayer;Marco-Tulio F. Rodrigues;Maxwell C. Schulze;Daniel P. Abraham
Chen Liao;Baofei Pan;Anthony Burrell
Sang Don Han;Soojeong Kim;Dongguo Li;Valeri Petkov
K.D. Kepler;J.T. Vaughey;M.M. Thackeray
L Fransson;JT Vaughey;R Benedek;Kristina Edström
Yair Ein‐Eli;W. F. Howard;Sharon H. Lu;Sanjeer Mukerjee
Erin M. Sorensen;Scott J. Barry;Ha Kyun Jung;James R. Rondinelli
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