The chart shows the distribution of publications by all Research.com ranked scientists in the field of Physics in 2026. The highlighted bar marks where C.T. Foxon sits on this spectrum.
This scientist: 781 publications — 83rd percentile
83% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,469 publications or more.
The chart shows the D-index (discipline H-index) distribution of Physics scientists ranked by Research.com in 2026. The highlighted bar marks where C.T. Foxon sits on this spectrum.
This scientist: 89 D-Index — 38th percentile
38% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 185 D-Index or more.
C.T. Foxon is affiliated with the University of Nottingham in the United Kingdom and focuses research efforts primarily within the fields of Materials Science and Physics and Astronomy. The scientist's work covers various subfields, including Materials Chemistry, Atomic and Molecular Physics and Optics, Electronic, Optical and Magnetic Materials, and Civil and Structural Engineering.
The main research topics addressed by Foxon include:
Foxon has published scholarly articles in notable scientific journals, contributing to the understanding of novel materials and their optical properties. Recent papers include:
The research output reflects a focus on two-dimensional materials, particularly boron nitride monolayers, and their interactions with graphene, as well as studies of radiative processes in nanomaterials.
Frequent collaborators in Foxon's research include:
Publication venues where Foxon's work has appeared are:
van Bart Wees;H. van Houten;C.W.J. Beenakker;J.G. Williamson
J. Feldmann;G. Peter;E. O. Göbel;P. Dawson
L.P. Kouwenhoven;A.T. Johnson;N.C. van der Vaart;C.J.P.M. Harmans
J W Orton;C T Foxon
K. W. Edmonds;P. Bogusławski;P. Bogusławski;K. Y. Wang;R. P. Campion
M. Leszczynski;H. Teisseyre;T. Suski;I. Grzegory
T. Jungwirth;K. Y. Wang;J. Mašek;K. W. Edmonds
H. van Houten;C.W.J. Beenakker;J.G. Williamson;M.E.I. Broekaart
A.T. Johnson;L.P. Kouwenhoven;W. de Jong;N.C. van der Vaart
van Bart Wees;L.P. Kouwenhoven;C.J.P.M. Harmans;J.G. Williamson
K. W. Edmonds;K. Y. Wang;R. P. Campion;A. C. Neumann
K.W. Edmonds;K.Y. Wang;R.P. Campion;A.C. Neumann
N. C. van der Vaart;S. F. Godijn;Y. V. Nazarov;C. J. P. M. Harmans
van Bart Wees;L.P. Kouwenhoven;E.M.M. Willems;C.J.P.M. Harmans
L. P. Kouwenhoven;N. C. van der Vaart;A. T. Johnson;W. Kool
L.P. Kouwenhoven;F.W.J. Hekking;van Bart Wees;C.J.P.M. Harmans
van Bart Wees;L.P. Kouwenhoven;H. van Houten;C.W.J. Beenakker
F. I. B. Williams;P. A. Wright;R. G. Clark;E. Y. Andrei
M. C. Tatham;J. F. Ryan;C. T. Foxon
A. J. Turberfield;S. R. Haynes;P. A. Wright;R. A. Ford
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