The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Todd D. Krauss sits on this spectrum.
This scientist: 180 publications — 24th percentile
24% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Todd D. Krauss sits on this spectrum.
This scientist: 54 D-Index — 32nd percentile
32% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Todd D. Krauss is affiliated with the University of Rochester in the United States. Their research spans the fields of Physics and Astronomy, Materials Science, and Engineering, with a significant focus on subfields such as Atomic and Molecular Physics, and Optics, Materials Chemistry, and Electrical and Electronic Engineering.
The scientist's main topics of work include:
Todd D. Krauss has published extensively, with frequent appearances in the following venues:
Recent papers include:
Collaborations with other researchers are an important aspect of Krauss's work. Frequent coauthors include:
Krauss has also contributed to book publications, including a title published by the American Chemical Society:
The breadth of research conducted by Todd D. Krauss covers interdisciplinary studies within advanced material science, nanotechnology, and photophysics, emphasizing the behavior and application of nanomaterials such as quantum dots. Their investigations also extend into photocatalysis and light-matter interaction phenomena relevant to both fundamental science and potential technological innovations.
Zhiji Han;Fen Qiu;Richard Eisenberg;Patrick L. Holland
Xiaoyong Wang;Xiaofan Ren;Keith Kahen;Megan A. Hahn
Hui Du;Chialing Chen;Rishikesh Krishnan;Todd D. Krauss
Achim Hartschuh;Hermeneglido N. Pedrosa;Lukas Novotny;Todd D. Krauss
Todd D. Krauss;Louis E. Brus
Joanne M. Haremza;and Megan A. Hahn;Todd D. Krauss;Samuel Chen and
A. Lipovskii;E. Kolobkova;V. Petrikov;I. Kang
Jeffrey J Peterson;Todd D Krauss
Todd D. Krauss;Frank W. Wise
Reto Haggenmueller;Sameer S. Rahatekar;Jeffrey A. Fagan;Jaehun Chun
Hui Du;Matthew D Disney;Benjamin L Miller;Todd D Krauss
Todd D. Krauss;Frank W. Wise
Todd D. Krauss;Frank W. Wise
Megan A Hahn;Joel S Tabb;Todd D Krauss
Zhenjia Wang;Shanlin Pan;Todd D. Krauss;Hui Du
Helen Hsiu-Ying Wei;Christopher M. Evans;Brett D. Swartz;Amanda J. Neukirch
Hui Du;Christopher M. Strohsahl;James Camera;Benjamin L. Miller, ,‡,§ and
Christopher M. Evans;Meagan E. Evans;Todd D. Krauss
Joseph M. Fox;Thomas J. Katz;Sven Van Elshocht;Thierry Verbiest
Jill A. Caputo;Leah C. Frenette;Norman Zhao;Kelly L. Sowers
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