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D-Index & Metrics

Materials Science

D-Index
58
Citations
20207
World Ranking
7550
National Ranking
1865

S. K. Streiffer publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where S. K. Streiffer sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 204 publications — 32nd percentile

32% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

S. K. Streiffer D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where S. K. Streiffer sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 58 D-Index — 41st percentile

41% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Research.com Recognitions

  • 2007 - Fellow of American Physical Society (APS) Citation For experimental studies of ferroelectric thin film physics, that have established the relationships between epitaxial strain, ferroelectric phase transition behavior and domain structure, and size effects, and for advancing the fundamental understanding of complex oxide thin film microstructure

Overview

S. K. Streiffer is affiliated with Argonne National Laboratory in the United States. Streiffer's research work focuses on experimental studies related to ferroelectric thin film physics. Their investigations have addressed the relationships between epitaxial strain, ferroelectric phase transition behavior, domain structure, and size effects in complex oxide thin films.

In 2007, Streiffer was recognized as a Fellow of the American Physical Society (APS). The award citation highlights their contributions to advancing the fundamental understanding of complex oxide thin film microstructure.

Best Publications

  • Room-temperature ferroelectricity in strained SrTiO3.

    J. H. Haeni;P. Irvin;W. Chang;R. Uecker

  • Ferroelectric thin films: Review of materials, properties, and applications

    Nava Setter;D. Damjanovic;L. Eng;G. Fox

  • Alternative dielectrics to silicon dioxide for memory and logic devices

    Angus I. Kingon;Jon-Paul Maria;S. K. Streiffer

  • Ferroelectricity in ultrathin perovskite films.

    Dillon D. Fong;G. Brian Stephenson;Stephen K. Streiffer;Jeffrey A. Eastman

  • Strain Tuning of Ferroelectric Thin Films

    Darrell G. Schlom;Long Qing Chen;Chang Beom Eom;Karin M. Rabe

  • Observation of nanoscale 180 degrees stripe domains in ferroelectric PbTiO3 thin films.

    S. K. Streiffer;J. A. Eastman;D. D. Fong;Carol Thompson;Carol Thompson

  • The dielectric response as a function of temperature and film thickness of fiber-textured (Ba,Sr)TiO3 thin films grown by chemical vapor deposition

    Cem Basceri;S. K. Streiffer;Angus I. Kingon;R. Waser

  • Giant Piezoelectricity on Si for Hyperactive MEMS

    S. H. Baek;J. Park;D. M. Kim;Vladimir A. Aksyuk

  • Leakage currents in Ba0.7Sr0.3TiO3 thin films for ultrahigh-density dynamic random access memories

    G. W. Dietz;M. Schumacher;R. Waser;S. K. Streiffer

  • Composition-control of magnetron-sputter-deposited (BaxSr1−x)Ti1+yO3+z thin films for voltage tunable devices

    Jaemo Im;O. Auciello;P. K. Baumann;S. K. Streiffer

  • Domain patterns in epitaxial rhombohedral ferroelectric films. I. Geometry and experiments

    S. K. Streiffer;C. B. Parker;A. E. Romanov;M. J. Lefevre

  • Ferroelectricity in thin films: The dielectric response of fiber-textured (BaxSr1−x)Ti1+yO3+z thin films grown by chemical vapor deposition

    S. K. Streiffer;Cem Basceri;C. B. Parker;S. E. Lash

  • Stabilization of Monodomain Polarization in Ultrathin PbTiO3 Films

    DD Fong;AM Kolpak;JA Eastman;SK Streiffer

  • Synthesis and ferroelectric properties of epitaxial BiFeO3 thin films grown by sputtering

    R. R. Das;D. M. Kim;S. H. Baek;C. B. Eom

  • Reversible chemical switching of a ferroelectric film.

    R. V. Wang;D. D. Fong;F. Jiang;M. J. Highland

  • High-Permittivity Perovskite Thin Films for Dynamic Random-Access Memories

    A.I. Kingon;S.K. Streiffer;C. Basceri;S.R. Summerfelt

  • Impact of thermal strain on the dielectric constant of sputtered barium strontium titanate thin films

    T. R. Taylor;P. J. Hansen;B. Acikel;N. Pervez

  • Synthesis and properties of YBa2Cu3O7 thin films grown in situ by 90° off-axis single magnetron sputtering

    C.B. Eom;J.Z. Sun;B.M. Lairson;S.K. Streiffer

  • Strength and fracture toughness of aluminum/alumina composites with interpenetrating networks

    Helge Prielipp;Mathias Knechtel;Nils Claussen;S.K. Streiffer

  • Evaluation of intrinsic and extrinsic contributions to the piezoelectric properties of Pb(Zr1-xTx)O3 thin films as a function of composition

    Dong Joo Kim;Jon-Paul Maria;Angus I. Kingon;S. K. Streiffer

Frequent Co-Authors

Angus I. Kingon
Angus I. Kingon Brown University
Orlando Auciello
Orlando Auciello The University of Texas at Dallas
Paul H. Fuoss
Paul H. Fuoss SLAC National Accelerator Laboratory
Susanne Stemmer
Susanne Stemmer University of California, Santa Barbara
Jeffrey A. Eastman
Jeffrey A. Eastman Argonne National Laboratory
Darrell G. Schlom
Darrell G. Schlom Cornell University
Chang-Beom Eom
Chang-Beom Eom University of Wisconsin–Madison
Susan Trolier-McKinstry
Susan Trolier-McKinstry Pennsylvania State University
Jon-Paul Maria
Jon-Paul Maria Pennsylvania State University
Xiaoqing Pan
Xiaoqing Pan University of California, Irvine

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