The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Mark T. Swihart sits on this spectrum.
This scientist: 367 publications — 73rd percentile
73% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Mark T. Swihart sits on this spectrum.
This scientist: 86 D-Index — 84th percentile
84% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Mark T. Swihart is affiliated with the University at Buffalo, State University of New York in the United States. Their work spans materials science and engineering, with a strong focus on the intersection of chemistry and electrical engineering.
Swihart's research includes significant contributions in subfields such as materials chemistry, electrical and electronic engineering, biomedical engineering, catalysis, and electronic, optical, and magnetic materials. They have produced work related to catalytic processes, gas sensing nanomaterials and sensors, copper-based nanomaterials, analytical chemistry, and advanced chemical sensor technologies.
Their recent publications reflect a diverse range of topics within these areas. Notable recent papers include:
Swihart often collaborates with several researchers, including Zhengxi Xuan, Kaiwen Chen, Abhishek Kumar, Yang Liu, and Paras N. Prasad. These co-authors have repeatedly contributed to the advancement of their shared research areas.
Their work has been published frequently in journals such as ACS Applied Nano Materials, Chemical Engineering Journal, ACS Applied Materials & Interfaces, ACS Sensors, and Advanced Functional Materials.
Key topics of Swihart's research include:
Swihart's contributions to the scientific community were recognized with the distinction of Fellow of the American Association for the Advancement of Science (AAAS) in 2015.
Xiao Xia Wang;Mark T. Swihart;Gang Wu
Mark T Swihart
Folarin Erogbogbo;Ken-Tye Yong;Indrajit Roy;GaiXia Xu
Weili Shi;Hao Zeng;Yudhisthira Sahoo;Tymish Y. Ohulchanskyy
Gaixia Xu;Shuwen Zeng;Butian Zhang;Mark T. Swihart
Yudhisthira Sahoo;Alireza Goodarzi;Mark T. Swihart;Tymish Y. Ohulchanskyy
Ken Tye Yong;Wing Cheung Law;Rui Hu;Ling Ye
Ling Ye;Ken-Tye Yong;Ken-Tye Yong;Liwei Liu;Indrajit Roy
Guanying Chen;Tymish Y. Ohulchanskyy;Sha Liu;Wing Cheung Law
Folarin Erogbogbo;Ken-Tye Yong;Indrajit Roy;Rui Hu
Xin Liu;Mark T. Swihart
Xuegeng Li;Yuanqing He;Suddha S. Talukdar;Mark T. Swihart
Xuegeng Li;Yuanqing He;Mark T. Swihart
Fengjun Hua;Mark T. Swihart;Eli Ruckenstein
Weili Shi;Y. Sahoo;Mark T. Swihart;P. N. Prasad
Xin Liu;Xianliang Wang;Bin Zhou;Wing Cheung Law
Anoop Gupta;Mark T. Swihart;Hartmut Wiggers
Meng Qiu;Ajay Singh;Dou Wang;Junle Qu
Erqun Song;Mengqun Yu;Yunyun Wang;Weihua Hu
Sha Liu;Guanying Chen;Paras N. Prasad;Mark T. Swihart
Folarin Erogbogbo;Ken Tye Yong;Rui Hu;Wing Cheung Law
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