Her primary areas of study are Analytical chemistry, Composite material, Plasma-enhanced chemical vapor deposition, X-ray photoelectron spectroscopy and Amorphous solid. Her study in Analytical chemistry is interdisciplinary in nature, drawing from both Ion, Hydrogen, Elastic recoil detection and Substrate. Her Composite material research is multidisciplinary, relying on both Metallurgy and Tin.
Her Plasma-enhanced chemical vapor deposition research is multidisciplinary, incorporating perspectives in Deposition and Coating. Her research in X-ray photoelectron spectroscopy intersects with topics in Surface modification, Polyethylene, Glow discharge and Polymer. Her Microstructure research is multidisciplinary, incorporating elements of Surface roughness, Thin film, Indentation and Refractive index.
The scientist’s investigation covers issues in Composite material, Analytical chemistry, Coating, Thin film and Plasma-enhanced chemical vapor deposition. Her Analytical chemistry research incorporates themes from Hydrogen, Silicon nitride, Substrate and Sputtering. Jolanta E. Klemberg-Sapieha usually deals with Coating and limits it to topics linked to Metallurgy and Nitriding.
Her work deals with themes such as Optoelectronics, Oxide and Plasma processing, which intersect with Thin film. Her Plasma-enhanced chemical vapor deposition course of study focuses on Amorphous solid and Silicon. Her research integrates issues of Deposition, Optical coating and Refractive index in her study of Chemical vapor deposition.
Composite material, Coating, Tribology, Layer and Metallurgy are her primary areas of study. Her Composite material study combines topics from a wide range of disciplines, such as Ion beam and Pulsed DC. Jolanta E. Klemberg-Sapieha has researched Pulsed DC in several fields, including Residual stress, Amorphous solid, Pulsed laser deposition and Analytical chemistry.
Her Coating study integrates concerns from other disciplines, such as Supercooling, Tin, Microstructure and Tribometer. As a part of the same scientific family, she mostly works in the field of Metallurgy, focusing on Indentation and, on occasion, Galling. Her research integrates issues of Thin film, Optical coating, Transmission electron microscopy and X-ray photoelectron spectroscopy in her study of Chemical vapor deposition.
Jolanta E. Klemberg-Sapieha mainly focuses on Composite material, Metallurgy, Coating, Indentation and Composite number. The Composite material study combines topics in areas such as Tool wear and Analytical chemistry. Her study focuses on the intersection of Metallurgy and fields such as Scanning electron microscope with connections in the field of Titanium alloy, Nitriding and Nanoindentation.
Jolanta E. Klemberg-Sapieha has included themes like Tribology, Tin and Conductive polymer in her Coating study. Her research in Tribology intersects with topics in Thin film, Physical vapor deposition and Abrasive. Her work carried out in the field of Composite number brings together such families of science as Casting, Nanocomposite, Polymer and Contact resistance.
A. S. da Silva Sobrinho;M. Latrèche;G. Czeremuszkin;J. E. Klemberg-Sapieha
E. Bousser;L. Martinu;J.E. Klemberg-Sapieha
P. Jedrzejowski;J. Cizek;A. Amassian;J.E. Klemberg-Sapieha
M. Azzi;M. Azzi;M. Paquette;J.A. Szpunar;J.E. Klemberg-Sapieha
M. Azzi;P. Amirault;M. Paquette;J.E. Klemberg-Sapieha
M.R. Wertheimer;J.E. Klemberg-Sapieha;H.P. Schreiber
L. Martinu;J. E. Klemberg‐Sapieha;O. M. Küttel;A. Raveh
A. Holländer;J. E. Klemberg‐Sapieha;M. R. Wertheimer
J.-P. Masse;H. Szymanowski;O. Zabeida;A. Amassian
A. C. Fozza;J. E. Klemberg-Sapieha;Michael R. Wertheimer
J. E. Klemberg‐Sapieha;O. M. Küttel;L. Martinu;M. R. Wertheimer
M. Bousmina;Hua Qiu;M. Grmela;J. E. Klemberg-Sapieha
J.-P. Fortier;B. Baloukas;O. Zabeida;J.E. Klemberg-Sapieha
H. Szymanowski;O. Zabeida;J. E. Klemberg-Sapieha;L. Martinu
S. Hassani;M. Bielawski;W. Beres;L. Martinu
P Jedrzejowski;J.E Klemberg-Sapieha;L Martinu
A. Hollander;J. E. Klemberg-Sapieha;M. R. Wertheimer
Eda Çetinörgü;Bill Baloukas;Oleg Zabeida;Jolanta E. Klemberg-Sapieha
M Hála;J Čapek;O Zabeida;J E Klemberg-Sapieha
J Čapek;J Čapek;M Hála;O Zabeida;J E Klemberg-Sapieha
A.C. Fozza;J. Roch;J.E. Klemberg-Sapieha;A. Kruse
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