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Jocelyn Achard

Jocelyn Achard

Jocelyn Achard publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Jocelyn Achard sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

The last bar groups every scientist with 1,163 publications or more.

Jocelyn Achard D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Jocelyn Achard sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

The last bar groups every scientist with 165 D-Index or more.

Overview

Jocelyn Achard is affiliated with Paris 13 University in France and conducts research primarily in the fields of Materials Science and Engineering. Their work focuses on a range of specialized subfields including Materials Chemistry, Atomic and Molecular Physics and Optics, Mechanics of Materials, Geophysics, and Biomedical Engineering.

The main topics of Achard's research encompass Diamond and Carbon-based Materials Research, Metal and Thin Film Mechanics, High-pressure Geophysics and Materials, Atomic and Subatomic Physics Research, Electronic and Structural Properties of Oxides, Semiconductor Materials and Devices, and Ion-surface Interactions and Analysis.

Among frequent publication venues, Achard has contributed extensively to arXiv (Cornell University) with 10 publications, Diamond and Related Materials with 5 publications, Journal of Physics D Applied Physics with 4 publications, as well as Scientific Reports and Carbon with 2 publications each.

Their notable recent papers include:

  • Chemical vapour deposition diamond single crystals with nitrogen-vacancy centres: a review of material synthesis and technology for quantum sensing applications, 2020, Journal of Physics D Applied Physics
  • Detection of biological signals from a live mammalian muscle using an early stage diamond quantum sensor, 2021, Scientific Reports
  • High NV density in a pink CVD diamond grown with N2O addition, 2020, Carbon
  • Optimization of a Diamond Nitrogen Vacancy Centre Magnetometer for Sensing of Biological Signals, 2020, Frontiers in Physics
  • Dislocation density reduction using overgrowth on hole arrays made in heteroepitaxial diamond substrates, 2021, Applied Physics Letters

Jocelyn Achard frequently collaborates with several researchers, including Ovidiu Brinza, Alexandre Tallaire, Fabien Bénédic, Riadh Issaoui, and Robert Staacke. These collaborations reflect a research network engaged in materials science and related experimental investigations.

Best Publications

  • Ultralong spin coherence time in isotopically engineered diamond

    Gopalakrishnan Balasubramanian;Philipp Neumann;Daniel Twitchen;Matthew Markham

  • CVD diamond films: from growth to applications

    Alix Gicquel;Khaled Hassouni;François Silva;Jocelyn Achard

  • Characterisation of high-quality thick single-crystal diamond grown by CVD with a low nitrogen addition

    A. Tallaire;A.T. Collins;D. Charles;J. Achard

  • High quality MPACVD diamond single crystal growth: high microwave power density regime

    J Achard;F Silva;A Tallaire;X Bonnin

  • Growth of large size diamond single crystals by plasma assisted chemical vapour deposition: Recent achievements and remaining challenges

    Alexandre Tallaire;Jocelyn Achard;François Silva;Ovidiu Brinza

  • Magnetic imaging with an ensemble of nitrogen-vacancy centers in diamond

    Mayeul Chipaux;Alexandre Tallaire;Jocelyn Achard;Sébastien Pezzagna

  • High quality, large surface area, homoepitaxial MPACVD diamond growth

    F. Silva;J. Achard;O. Brinza;X. Bonnin

  • The control of growth parameters in the synthesis of high-quality single crystalline diamond by CVD

    Jocelyn Achard;Alexandre Tallaire;Ricardo Sussmann;Ricardo Sussmann;François Silva

  • Coupled effect of nitrogen addition and surface temperature on the morphology and the kinetics of thick CVD diamond single crystals

    J. Achard;F. Silva;O. Brinza;A. Tallaire

  • Homoepitaxial deposition of high-quality thick diamond films: effect of growth parameters

    A. Tallaire;J. Achard;F. Silva;R.S. Sussmann;R.S. Sussmann

  • Enhanced generation of single optically active spins in diamond by ion implantation.

    Boris Naydenov;V. Richter;Johannes Beck;Matthias Steiner

  • Perfect preferential orientation of nitrogen-vacancy defects in a synthetic diamond sample

    M. Lesik;J.-P. Tetienne;A. Tallaire;J. Achard

  • Engineered arrays of nitrogen-vacancy color centers in diamond based on implantation of CN− molecules through nanoapertures

    P. Spinicelli;A. Dréau;L. Rondin;F. Silva

  • Thick boron doped diamond single crystals for high power electronics

    J. Achard;F. Silva;R. Issaoui;O. Brinza

  • Oxygen plasma pre-treatments for high quality homoepitaxial CVD diamond deposition

    A. Tallaire;J. Achard;F. Silva;R. S. Sussmann;R. S. Sussmann

  • Preferential orientation of NV defects in CVD diamond films grown on (113)-oriented substrates

    M. Lesik;T. Plays;A. Tallaire;J. Achard

  • Chemical vapour deposition diamond single crystals with nitrogen-vacancy centres: a review of material synthesis and technology for quantum sensing applications

    Jocelyn Achard;Vincent Jacques;Alexandre Tallaire;Alexandre Tallaire

  • Etch‐pit formation mechanism induced on HPHT and CVD diamond single crystals by H2/O2 plasma etching treatment

    M. Naamoun;A. Tallaire;F. Silva;J. Achard

  • Engineered arrays of NV color centers in diamond based on implantation of CN molecules through nanoapertures

    P. Spinicelli;L. Rondin;F. Silva;J. Achard

  • Initialization and Readout of Nuclear Spins via a Negatively Charged Silicon-Vacancy Center in Diamond

    Mathias H. Metsch;Katharina Senkalla;Benedikt Tratzmiller;Jochen Scheuer

  • Photonic nano-structures on (111)-oriented diamond

    Elke Neu;Patrick Appel;Marc Ganzhorn;Javier Miguel-Sánchez

Frequent Co-Authors

Vincent Jacques
Vincent Jacques University of Montpellier
Alain Mauger
Alain Mauger Sorbonne University
Rafi Kalish
Rafi Kalish Technion – Israel Institute of Technology
Philippe Bergonzo
Philippe Bergonzo University College London

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