World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
45
Citations
9576
World Ranking
11642
National Ranking
186

Engineering and Technology

D-Index
50
Citations
10801
World Ranking
4036
National Ranking
49

Hejun Du publication distribution in Engineering and Technology in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Hejun Du sits on this spectrum.

38–47 publications: 20 scientists 48–57 publications: 35 scientists 58–67 publications: 96 scientists 68–77 publications: 135 scientists 78–87 publications: 190 scientists 88–97 publications: 259 scientists 98–107 publications: 283 scientists 108–117 publications: 369 scientists 118–127 publications: 341 scientists 128–137 publications: 386 scientists 138–147 publications: 372 scientists 148–157 publications: 457 scientists 158–167 publications: 415 scientists 168–177 publications: 407 scientists 178–187 publications: 421 scientists 188–197 publications: 378 scientists 198–207 publications: 403 scientists 208–217 publications: 317 scientists 218–227 publications: 346 scientists 228–237 publications: 321 scientists 238–247 publications: 260 scientists 248–257 publications: 280 scientists 258–267 publications: 240 scientists 268–277 publications: 214 scientists 278–287 publications: 242 scientists 288–297 publications: 203 scientists 298–307 publications: 166 scientists 308–317 publications: 154 scientists 318–327 publications: 175 scientists 328–337 publications: 159 scientists 338–347 publications: 99 scientists 348–357 publications: 131 scientists 358–367 publications: 106 scientists 368–377 publications: 118 scientists 378–387 publications: 97 scientists 388–397 publications: 108 scientists 398–407 publications: 82 scientists 408–417 publications: 71 scientists 418–427 publications: 64 scientists 428–437 publications: 55 scientists 438–447 publications: 54 scientists 448–457 publications: 60 scientists 458–467 publications: 47 scientists 468–477 publications: 40 scientists 478–487 publications: 30 scientists 488–497 publications: 29 scientists 498–507 publications: 38 scientists 508–517 publications: 40 scientists 518–527 publications: 32 scientists 528–537 publications: 23 scientists 538–547 publications: 28 scientists 548–557 publications: 23 scientists 558–567 publications: 19 scientists 568–577 publications: 16 scientists 578–587 publications: 17 scientists 588–597 publications: 18 scientists 598–607 publications: 22 scientists 608–617 publications: 15 scientists 618–627 publications: 9 scientists 628–637 publications: 11 scientists 638–647 publications: 21 scientists 648–657 publications: 12 scientists 658–667 publications: 9 scientists 668–677 publications: 11 scientists 678–687 publications: 9 scientists 688–697 publications: 6 scientists 698–707 publications: 14 scientists 708–717 publications: 7 scientists 718–727 publications: 8 scientists 728–737 publications: 10 scientists 738–747 publications: 9 scientists 748–757 publications: 5 scientists 758–767 publications: 5 scientists 768–777 publications: 11 scientists 778–787 publications: 7 scientists 788–797 publications: 2 scientists 798–803 publications: 4 scientists 804+ publications: 100 scientists
38 publications 804+

This scientist: 258 publications — 67th percentile

67% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 804 publications or more.

Hejun Du D-index placement in Engineering and Technology in 2026

The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Hejun Du sits on this spectrum.

30 D-Index: 59 scientists 31 D-Index: 114 scientists 32 D-Index: 129 scientists 33 D-Index: 189 scientists 34 D-Index: 200 scientists 35 D-Index: 262 scientists 36 D-Index: 311 scientists 37 D-Index: 312 scientists 38 D-Index: 350 scientists 39 D-Index: 385 scientists 40 D-Index: 348 scientists 41 D-Index: 362 scientists 42 D-Index: 426 scientists 43 D-Index: 380 scientists 44 D-Index: 310 scientists 45 D-Index: 341 scientists 46 D-Index: 301 scientists 47 D-Index: 306 scientists 48 D-Index: 271 scientists 49 D-Index: 246 scientists 50 D-Index: 210 scientists 51 D-Index: 253 scientists 52 D-Index: 213 scientists 53 D-Index: 221 scientists 54 D-Index: 195 scientists 55 D-Index: 186 scientists 56 D-Index: 170 scientists 57 D-Index: 167 scientists 58 D-Index: 166 scientists 59 D-Index: 144 scientists 60 D-Index: 152 scientists 61 D-Index: 141 scientists 62 D-Index: 138 scientists 63 D-Index: 131 scientists 64 D-Index: 118 scientists 65 D-Index: 114 scientists 66 D-Index: 119 scientists 67 D-Index: 95 scientists 68 D-Index: 87 scientists 69 D-Index: 77 scientists 70 D-Index: 89 scientists 71 D-Index: 69 scientists 72 D-Index: 54 scientists 73 D-Index: 46 scientists 74 D-Index: 55 scientists 75 D-Index: 54 scientists 76 D-Index: 49 scientists 77 D-Index: 53 scientists 78 D-Index: 46 scientists 79 D-Index: 28 scientists 80 D-Index: 39 scientists 81 D-Index: 36 scientists 82 D-Index: 24 scientists 83 D-Index: 26 scientists 84 D-Index: 36 scientists 85 D-Index: 18 scientists 86 D-Index: 25 scientists 87 D-Index: 19 scientists 88 D-Index: 26 scientists 89 D-Index: 27 scientists 90 D-Index: 23 scientists 91 D-Index: 15 scientists 92 D-Index: 12 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 13 scientists 97 D-Index: 13 scientists 98 D-Index: 9 scientists 99 D-Index: 7 scientists 100 D-Index: 7 scientists 101 D-Index: 8 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 9 scientists 105 D-Index: 6 scientists 106 D-Index: 9 scientists 107+ D-Index: 99 scientists
30 D-Index 107+

This scientist: 50 D-Index — 59th percentile

59% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 107 D-Index or more.

Overview

Hejun Du is affiliated with Nanyang Technological University in Singapore and has a substantial body of work primarily in the field of Engineering. Their publications span multiple subfields including Mechanical Engineering, Biomedical Engineering, Electrical and Electronic Engineering, Polymers and Plastics, and Computational Mechanics.

Their research addresses a variety of technical topics, with a focus on:

  • Additive Manufacturing and 3D Printing Technologies
  • Advanced Sensor and Energy Harvesting Materials
  • Additive Manufacturing Materials and Processes
  • Combustion and flame dynamics
  • Polymer crystallization and properties
  • Electrochemical sensors and biosensors
  • Conducting polymers and applications

Hejun Du has contributed to numerous articles published in a range of scientific journals and venues. Among the most frequent are:

  • SSRN Electronic Journal
  • Nano Energy
  • Journal of Hazardous Materials
  • Sensors and Actuators B Chemical
  • International Journal of Heat and Mass Transfer

Some recent publications include:

  • Recent Advances in Stimuli-Responsive Shape-Morphing Hydrogels (2022) published in Advanced Functional Materials
  • Novel flexible bifunctional amperometric biosensor based on laser engraved porous graphene array electrodes: Highly sensitive electrochemical determination of hydrogen peroxide and glucose (2020) published in Journal of Hazardous Materials
  • Hollow MnFeO oxide derived from MOF@MOF with multiple enzyme-like activities for multifunction colorimetric assay of biomolecules and Hg2+ (2020) published in Journal of Hazardous Materials
  • Tunable electrochemical of electrosynthesized layer-by-layer multilayer films based on multi-walled carbon nanotubes and metal-organic framework as high-performance electrochemical sensor for simultaneous determination cadmium and lead (2020) published in Sensors and Actuators B Chemical
  • MOF-derived Co3O4/FeCo2O4 incorporated porous biomass carbon: Simultaneous electrochemical determination of dopamine, acetaminophen and xanthine (2020) published in Journal of Alloys and Compounds

The scientist frequently collaborates with several coauthors, including:

  • Kun Zhou
  • Van-Thai Tran
  • How Wei Benjamin Teo
  • Jun Zeng
  • Kaijuan Chen

Best Publications

  • TiNi-based thin films in MEMS applications: a review

    Yong Qing Fu;Yong Qing Fu;Hejun Du;Hejun Du;Wei Min Huang;Sam Zhang

  • Recent advances of superhard nanocomposite coatings: a review

    Sam Zhang;Deen Sun;Yong Qing Fu;Hejun Du

  • Advances in piezoelectric thin films for acoustic biosensors, acoustofluidics and lab-on-chip applications

    Yong Qing Fu;Yong Qing Fu;Jack Luo;Nam-Trung Nguyen;Anthony Walton

  • Toughness measurement of thin films: a critical review

    Sam Zhang;Deen Sun;Yong Qing Fu;Hejun Du

  • Design and Experimental Evaluation of a Magnetorheological Brake

    W.H. Li;H. Du

  • Toughening of hard nanostructural thin films: a critical review

    Sam Zhang;Deen Sun;Yong Qing Fu;Hejun Du

  • Paper/Carbon Nanotube-Based Wearable Pressure Sensor for Physiological Signal Acquisition and Soft Robotic Skin

    Zhaoyao Zhan;Rongzhou Lin;Van-Thai Tran;Jianing An

  • Characterization of TiNi shape-memory alloy thin films for MEMS applications

    Yong Qing Fu;Wei Min Huang;Hejun Du;Xu Huang

  • Application of generalized differential quadrature method to structural problems

    H. Du;M. K. Lim;R. M. Lin

  • Functionally graded TiN/TiNi shape memory alloy films

    Yong Qing Fu;Hejun Du;Sam Zhang

  • Enhanced photoelectrochemical water-splitting effect with a bent ZnO nanorod photoanode decorated with Ag nanoparticles

    Yuefan Wei;Lin Ke;Junhua Kong;Hong Liu

  • Inkjet-printed optoelectronics

    Zhaoyao Zhan;Jianing An;Yuefan Wei;Van Thai Tran

  • Effect of sputtering target power on microstructure and mechanical properties of nanocomposite nc-TiN/a-SiNx thin films

    Sam Zhang;Deen Sun;Yong Qing Fu;Hejun Du

  • XPS characterization of surface and interfacial structure of sputtered TiNi films on Si substrate

    Yong Qing Fu;Yong Qing Fu;Hejun Du;Sam Zhang;Wei Min Huang

  • Finite Element Analysis and Simulation Evaluation of a Magnetorheological Valve

    N.Q. Guo;H. Du;W.H. Li

  • Magnetron sputtering of nanocomposite (Ti,Cr)CN/DLC coatings

    Sam Zhang;Yong Qing Fu;Hejun Du;X. T. Zeng

  • On the lower thickness boundary of sputtered TiNi films for shape memory application

    Yong Qing Fu;Yong Qing Fu;Sam Zhang;M. J. Wu;Wei Min Huang

  • A Power Series Solution For Vibration Of A Rotating Timoshenko Beam

    H. Du;M.K. Lim;K.M. Liew

  • Polydopamine-assisted decoration of ZnO nanorods with Ag nanoparticles: an improved photoelectrochemical anode

    Yuefan Wei;Junhua Kong;Liping Yang;Lin Ke

  • Bias-graded deposition of diamond-like carbon for tribological applications

    Sam Zhang;Xuan Lam Bui;Yong Qing Fu;David L. Butler

Frequent Co-Authors

Yong Qing Fu
Yong Qing Fu Northumbria University
Sam Zhang
Sam Zhang Nanyang Technological University
Weihua Li
Weihua Li University of Wollongong
Xiao Wei Sun
Xiao Wei Sun Southern University of Science and Technology
Wei Min Huang
Wei Min Huang Nanyang Technological University
Junhua Kong
Junhua Kong Agency for Science, Technology and Research
William I. Milne
William I. Milne University of Cambridge
Andrew J. Flewitt
Andrew J. Flewitt University of Cambridge
Chaobin He
Chaobin He National University of Singapore
Subbu S. Venkatraman
Subbu S. Venkatraman National University of Singapore

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