The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Douglas H. Adamson sits on this spectrum.
This scientist: 172 publications — 21st percentile
21% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Douglas H. Adamson sits on this spectrum.
This scientist: 47 D-Index — 15th percentile
15% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Douglas H. Adamson is affiliated with the University of Connecticut in the United States. Their research activity centers largely on materials science and engineering, with a particular emphasis on materials chemistry and biomedical engineering subfields.
Their publication record highlights work on topics including graphene research and applications, polymer surface interaction studies, advanced sensor and energy harvesting materials, Pickering emulsions and particle stabilization, surface modification and superhydrophobicity, supercapacitor materials and fabrication, and advancements in battery materials.
Recent scientific contributions include the following papers:
Frequent co-authors in Adamson's work include Shawn P. Ward, Sean T. McDermott, Prabodha G. Abeykoon, Chinthani D. Liyanage, and Harish Kumar. These collaborations indicate ongoing active research partnerships within their scientific network.
The scientist's publications appear predominantly in certain venues, reflecting the focus of their work:
The main domains of study for Douglas H. Adamson encompass materials science and engineering. Within these domains, the subfield concentration includes materials chemistry, biomedical engineering, surfaces, coatings and films, electrical and electronic engineering, and electronic, optical and magnetic materials.
Hannes C. Schniepp;Je-Luen Li;Michael J. Mcallister;Hiroaki Sai
Michael J McAllister;Je-Luen Li;Douglas H Adamson;Hannes C Schniepp
T. Ramanathan;A. A. Abdala;A. A. Abdala;S. Stankovich;D. A. Dikin
Miri Park;Christopher Harrison;Paul M. Chaikin;Richard Alan Register
Minzhen Cai;Daniel Thorpe;Douglas H. Adamson;Hannes C. Schniepp
Christopher Harrison;Douglas H. Adamson;Zhengdong Cheng;John M. Sebastian
Dan E. Angelescu;Judith H. Waller;Douglas H. Adamson;Paru Deshpande
R. R. Li;P. D. Dapkus;M. E. Thompson;W. G. Jeong
Robert K. Prud'homme;Ilhan A. Aksay
Christopher Harrison;Miri Park;Richard Register;Douglas Adamson
Miri Park;Miri Park;P. M. Chaikin;Richard Alan Register;Douglas H. Adamson
Zhenhua Cui;Andrew J. Oyer;A. Jaeton Glover;Hannes C. Schniepp
Christopher Harrison;Zhengdong Cheng;Srinivasan Sethuraman;David A. Huse
Steven J. Woltornist;Andrew J. Oyer;Jan-Michael Y. Carrillo;Andrey V. Dobrynin
Christopher Harrison;Miri Park;Paul M. Chaikin;Richard Alan Register
Daniel J. Quiram;Richard A. Register;Gary R. Marchand;Douglas H. Adamson
Pratima Rangarajan;Richard A. Register;Douglas H. Adamson;Lewis J. Fetters
Robert K. Prud'homme;Christopher D. O'neil;Bulent Ozbas;Ilhan A. Aksay
Robert K. Prud'homme;Bulent Ozbas;Iihan A. Aksay;Richard A. Register
C. Harrison;D. E. Angelescu;M. Trawick;Zhengdong Cheng
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