Diederik Depla publications per year

The chart shows the history of publications by Diederik Depla between 1991 and 2025, highlighting the no. of papers published in each year and offering an overview of the publication velocity of this scholar. Diederik Depla published across 35 years, from 1991 to 2025, averaging 8.6 papers a year. Output peaked at 25 publications in 2008. 13 of the 302 publications appeared in the last two years.

No. of publications

5 10 15 20 25

1991 2025

302 publications in total across all disciplines

View publications per year as a table

Diederik Depla: publications per year, 1991 to 2025
Year	Publications
1991	1
1992	2
1993	0
1994	1
1995	0
1996	1
1997	2
1998	0
1999	0
2000	1
2001	3
2002	11
2003	7
2004	15
2005	14
2006	19
2007	7
2008	25
2009	17
2010	14
2011	19
2012	21
2013	13
2014	15
2015	13
2016	11
2017	10
2018	10
2019	8
2020	3
2021	9
2022	9
2023	8
2024	5
2025	8
Total	302

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Diederik Depla publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Diederik Depla sits on this spectrum.

No. of scientists

200 400 600 800

50–69 publications 1,163+

This scientist: 269 publications — 52nd percentile

52% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

View publications distribution as a table

Number of Materials Science scientists by publication count, Research.com 2026 ranking edition. Based on 12,847 ranked scientists.
Publications	Scientists	This scientist
50–69	28
70–89	152
90–109	356
110–129	487
130–149	723
150–169	835
170–189	850
190–209	891
210–229	862
230–249	766
250–269	726	269
270–289	665
290–309	593
310–329	537
330–349	477
350–369	440
370–389	356
390–409	321
410–429	256
430–449	246
450–469	216
470–489	212
490–509	174
510–529	194
530–549	162
550–569	131
570–589	111
590–609	103
610–629	99
630–649	77
650–669	92
670–689	56
690–709	53
710–729	53
730–749	38
750–769	52
770–789	43
790–809	38
810–829	34
830–849	25
850–869	18
870–889	20
890–909	24
910–929	27
930–949	20
950–969	17
970–989	10
990–1,009	16
1,010–1,029	13
1,030–1,049	12
1,050–1,069	9
1,070–1,089	8
1,090–1,109	7
1,110–1,129	9
1,130–1,149	2
1,150–1,162	5
1,163+	100

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Diederik Depla D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Diederik Depla sits on this spectrum.

No. of scientists

200 400 600

40–41 D-Index 165+

This scientist: 46 D-Index — 12th percentile

12% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

View D-Index distribution as a table

Number of Materials Science scientists by D-index, Research.com 2026 ranking edition. Based on 12,847 ranked scientists.
D-Index	Scientists	This scientist
40–41	211
42–43	450
44–45	612
46–47	612	46
48–49	598
50–51	657
52–53	667
54–55	621
56–57	597
58–59	610
60–61	587
62–63	606
64–65	533
66–67	490
68–69	469
70–71	378
72–73	421
74–75	359
76–77	323
78–79	299
80–81	230
82–83	210
84–85	195
86–87	203
88–89	175
90–91	175
92–93	142
94–95	121
96–97	117
98–99	107
100–101	88
102–103	85
104–105	68
106–107	62
108–109	57
110–111	45
112–113	49
114–115	50
116–117	34
118–119	38
120–121	37
122–123	29
124–125	28
126–127	24
128–129	33
130–131	28
132–133	21
134–135	20
136–137	23
138–139	17
140–141	12
142–143	17
144–145	21
146–147	13
148–149	11
150–151	14
152–153	13
154–155	9
156–157	10
158–159	7
160–161	4
162–163	4
164	3
165+	98

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Overview

Diederik Depla is affiliated with Ghent University in Belgium and has contributed extensively to research in engineering and materials science. Their work primarily focuses on metal and thin film mechanics, semiconductor materials and devices, as well as related interdisciplinary topics.

The scientist's main fields of study include:

Engineering
Materials Science

Within these broader areas, Depla has specialized in several subfields such as:

Mechanics of Materials
Electrical and Electronic Engineering
Materials Chemistry
Electronic, Optical and Magnetic Materials
Computational Mechanics

Their research topics cover:

Metal and Thin Film Mechanics
Semiconductor materials and devices
Copper Interconnects and Reliability
Ion-surface interactions and analysis
High-Temperature Coating Behaviors
Diamond and Carbon-based Materials Research
High Entropy Alloys Studies

Diederik Depla has published numerous articles, with significant appearances in key scientific journals. Frequent publication venues include:

Surface and Coatings Technology
SSRN Electronic Journal
Vacuum
Acta Materialia
Applied Surface Science

Their recent publications illustrate the range of their research focus:

On the grain size-thickness correlation for thin films (2021) in Acta Materialia
Influence of the nitrogen content on the structure and properties of MoNbTaVW high entropy alloy thin films (2020) in Journal of Alloys and Compounds
Diazonium chemistry surface treatment of piezoelectric polyhydroxybutyrate scaffolds for enhanced osteoblastic cell growth (2020) in Applied Materials Today
Sputter yield measurements to evaluate the target state during reactive magnetron sputtering (2020) in Surface and Coatings Technology
Mechanical properties of CoCrCuFeNi multi-principal element alloy thin films on Kapton substrates (2020) in Surface and Coatings Technology

Depla collaborates regularly with a number of researchers. Frequent co-authors include:

Josja Van Bever
Bogdan V. Parakhonskiy
André G. Skirtach
Zhaoxia Rao
Eric Chason

Best Publications

Determination of the V2p XPS binding energies for different vanadium oxidation states (V5+ to V0+)

Geert Silversmit;Diederik Depla;Hilde Poelman;Guy B. Marin

1987
Citations
Biaxial alignment in sputter deposited thin films

S. Mahieu;P. Ghekiere;D. Depla;R. De Gryse

573
Citations
Reactive Sputter Deposition

Diederik Depla;Stijn Mahieu

396
Citations
Magnetron sputter deposition: Linking discharge voltage with target properties

D. Depla;S. Mahieu;R. De Gryse

266
Citations
Understanding the discharge voltage behavior during reactive sputtering of oxides

D. Depla;S. Heirwegh;S. Mahieu;J. Haemers

251
Citations
Reactive sputter deposition of TiN layers: modelling the growth by characterization of particle fluxes towards the substrate

Stijn Mahieu;Diederik Depla

221
Citations
Synthesis, crystal structures, and luminescence properties of carboxylate based rare-earth coordination polymers.

Roel Decadt;Kristof Van Hecke;Diederik Depla;Karen Leus

202
Citations
An XPS study on the surface reduction of V2O5(001) induced by Ar+ ion bombardment

Geert Silversmit;Diederik Depla;Hilde Poelman;Guy B. Marin

190
Citations
Discharge voltage measurements during magnetron sputtering

D. Depla;G. Buyle;J. Haemers;R. De Gryse

161
Citations
Target poisoning during reactive magnetron sputtering: Part I: the influence of ion implantation

D. Depla;R. De Gryse

159
Citations
Sputter Deposition Processes

Diederik Depla;Stijn Mahieu;Joseph Greene

154
Citations
High entropy alloy thin films deposited by magnetron sputtering of powder targets

Bert Braeckman;Francis Boydens;H Hidalgo;P Dutheil

151
Citations
Magnetron sputter deposition as visualized by Monte Carlo modeling

Diederik Depla;Wouter Leroy

149
Citations
Tutorial: Hysteresis during the reactive magnetron sputtering process

Koen Strijckmans;Roeland Schelfhout;Diederik Depla

138
Citations
Towards a more complete model for reactive magnetron sputtering

D Depla;S Heirwegh;S Mahieu;R De Gryse

131
Citations
Physico-chemical characterization of nanofiltration membranes.

Katleen Boussu;Jérémie De Baerdemaeker;Jérémie De Baerdemaeker;Charles Dauwe;Marc Weber

122
Citations
A heterogeneous Ru-hydroxyapatite catalyst for mild racemization of alcohols

Stijn Wuyts;Dirk E. De Vos;Francis Verpoort;Diederik Depla

120
Citations
Mechanisms of target poisoning during magnetron sputtering as investigated by real-time in situ analysis and collisional computer simulation

D Guttler;B Abendroth;R Grotzschel;W Moller

116
Citations
Extracting organic contaminants from water using the metal-organic framework CrIII(OH)·{O2C-C6H4-CO2}.

Michael Maes;Stijn Schouteden;Luc Alaerts;Diederik Depla

105
Citations
Target poisoning during reactive magnetron sputtering: Part II: the influence of chemisorption and gettering

D. Depla;R. De Gryse

105
Citations
Monte Carlo simulation of the transport of atoms in DC magnetron sputtering

S. Mahieu;G. Buyle;D. Depla;S. Heirwegh

100
Citations
Determination of the effective electron emission yields of compound materials

D Depla;X Y Li;S Mahieu;R De Gryse

95
Citations