2026 Diederik Depla: Materials Science Researcher – H-Index, Publications & Awards

Discipline name	D-Index	World Ranking	Current World Ranking	National Ranking	Current National Ranking	Publications	Citations
Materials Science	46	11345	10963	132	129	269	9903

Discipline name

D-Index

World Ranking

Current World Ranking

National Ranking

Current National Ranking

Publications

Citations

Materials Science

11345

10963

132

129

269

9903

Overview

Diederik Depla is affiliated with Ghent University in Belgium and has contributed extensively to research in engineering and materials science. Their work primarily focuses on metal and thin film mechanics, semiconductor materials and devices, as well as related interdisciplinary topics.

The scientist's main fields of study include:

Engineering
Materials Science

Within these broader areas, Depla has specialized in several subfields such as:

Mechanics of Materials
Electrical and Electronic Engineering
Materials Chemistry
Electronic, Optical and Magnetic Materials
Computational Mechanics

Their research topics cover:

Metal and Thin Film Mechanics
Semiconductor materials and devices
Copper Interconnects and Reliability
Ion-surface interactions and analysis
High-Temperature Coating Behaviors
Diamond and Carbon-based Materials Research
High Entropy Alloys Studies

Diederik Depla has published numerous articles, with significant appearances in key scientific journals. Frequent publication venues include:

Surface and Coatings Technology
SSRN Electronic Journal
Vacuum
Acta Materialia
Applied Surface Science

Their recent publications illustrate the range of their research focus:

On the grain size-thickness correlation for thin films (2021) in Acta Materialia
Influence of the nitrogen content on the structure and properties of MoNbTaVW high entropy alloy thin films (2020) in Journal of Alloys and Compounds
Diazonium chemistry surface treatment of piezoelectric polyhydroxybutyrate scaffolds for enhanced osteoblastic cell growth (2020) in Applied Materials Today
Sputter yield measurements to evaluate the target state during reactive magnetron sputtering (2020) in Surface and Coatings Technology
Mechanical properties of CoCrCuFeNi multi-principal element alloy thin films on Kapton substrates (2020) in Surface and Coatings Technology

Depla collaborates regularly with a number of researchers. Frequent co-authors include:

Josja Van Bever
Bogdan V. Parakhonskiy
André G. Skirtach
Zhaoxia Rao
Eric Chason

Best Publications

Determination of the V2p XPS binding energies for different vanadium oxidation states (V5+ to V0+)

Geert Silversmit;Diederik Depla;Hilde Poelman;Guy B. Marin

1987
Citations
Biaxial alignment in sputter deposited thin films

S. Mahieu;P. Ghekiere;D. Depla;R. De Gryse

573
Citations
Reactive Sputter Deposition

Diederik Depla;Stijn Mahieu

396
Citations
Magnetron sputter deposition: Linking discharge voltage with target properties

D. Depla;S. Mahieu;R. De Gryse

266
Citations
Understanding the discharge voltage behavior during reactive sputtering of oxides

D. Depla;S. Heirwegh;S. Mahieu;J. Haemers

251
Citations
Reactive sputter deposition of TiN layers: modelling the growth by characterization of particle fluxes towards the substrate

Stijn Mahieu;Diederik Depla

221
Citations
Synthesis, crystal structures, and luminescence properties of carboxylate based rare-earth coordination polymers.

Roel Decadt;Kristof Van Hecke;Diederik Depla;Karen Leus

202
Citations
An XPS study on the surface reduction of V2O5(001) induced by Ar+ ion bombardment

Geert Silversmit;Diederik Depla;Hilde Poelman;Guy B. Marin

190
Citations
Discharge voltage measurements during magnetron sputtering

D. Depla;G. Buyle;J. Haemers;R. De Gryse

161
Citations
Target poisoning during reactive magnetron sputtering: Part I: the influence of ion implantation

D. Depla;R. De Gryse

159
Citations
Sputter Deposition Processes

Diederik Depla;Stijn Mahieu;Joseph Greene

154
Citations
High entropy alloy thin films deposited by magnetron sputtering of powder targets

Bert Braeckman;Francis Boydens;H Hidalgo;P Dutheil

151
Citations
Magnetron sputter deposition as visualized by Monte Carlo modeling

Diederik Depla;Wouter Leroy

149
Citations
Tutorial: Hysteresis during the reactive magnetron sputtering process

Koen Strijckmans;Roeland Schelfhout;Diederik Depla

138
Citations
Towards a more complete model for reactive magnetron sputtering

D Depla;S Heirwegh;S Mahieu;R De Gryse

131
Citations
Physico-chemical characterization of nanofiltration membranes.

Katleen Boussu;Jérémie De Baerdemaeker;Jérémie De Baerdemaeker;Charles Dauwe;Marc Weber

122
Citations
A heterogeneous Ru-hydroxyapatite catalyst for mild racemization of alcohols

Stijn Wuyts;Dirk E. De Vos;Francis Verpoort;Diederik Depla

120
Citations
Mechanisms of target poisoning during magnetron sputtering as investigated by real-time in situ analysis and collisional computer simulation

D Guttler;B Abendroth;R Grotzschel;W Moller

116
Citations
Extracting organic contaminants from water using the metal-organic framework CrIII(OH)·{O2C-C6H4-CO2}.

Michael Maes;Stijn Schouteden;Luc Alaerts;Diederik Depla

105
Citations
Target poisoning during reactive magnetron sputtering: Part II: the influence of chemisorption and gettering

D. Depla;R. De Gryse

105
Citations
Monte Carlo simulation of the transport of atoms in DC magnetron sputtering

S. Mahieu;G. Buyle;D. Depla;S. Heirwegh

100
Citations
Determination of the effective electron emission yields of compound materials

D Depla;X Y Li;S Mahieu;R De Gryse

95
Citations