World's Best Scientists 2026 revealed!
IEEE

Advanced Semiconductor Manufacturing Conference (ASMC)

Location: New York , United States

Conference dates: 5/1/2023 - 5/4/2023

Research H-index
4

Ranking & Metrics

Discipline name Position Best Scientists Publications D-Index
Electronics and Electrical Engineering 769 8 11 2
Engineering and Technology 301 7 7 3

Call for Papers

ASMC 2023 Call for Paper Topics
AM: Advanced Metrology
Development of new metrology techniques and methodologies; in-situ monitoring
methods; metrology for process control; measuring critical dimensions, overlay, films;
metrology of next-generation materials, processes and architectures (TSV, FinFETs,
EUV, etc.); scatterometry with reflectometry or ellipsometry; pros and cons of
machine learning in measurement signal analysis wide-bandgap semiconductors;
novel extension of existing metrology tools as well as evaluation of upcoming
measurement technologies to meet HVM requirements.
AEPM: Advanced Equipment Processes and Materials
Development of new front- and back-end processes; characterization and integration
of barrier layers, advanced gates, high-K and low-K dielectrics, isolators, optical and
conducting materials; evaluation of novel substrates; methodologies for driving new
materials from R&D to mass production.
AP/DFM: Advanced Patterning / Design for Manufacturability
Immersion, double/multiple patterning, and EUV lithography; advanced resolution
enhancement techniques; source/mask optimization; alignment and overlay
enhancement solutions; edge placement error measurement; advanced reticles;
alternative patterning methods; directed self-assembly; feedforward control
solutions; high versus low volume manufacturing effects on lithography processes;
computational lithography; process models and process model files; optical proximity
correction and verification; design rule creation and verification; DFM in support of
yield learning through product cycle; early manufacturing involvement; integrated
product and process development (IPPD).
APC: Advanced Process Control
Advanced control techniques such as run-to-run control; model-based control; nonlinear control methods; application of advanced statistical methods to control;
advanced SPC techniques; fault detection and classification (FDC); virtual metrology;
machine learning and artificial intelligence (ML/AI) monitoring and control.
CFM: Contamination Free Manufacturing
Backside contamination, ultraclean technologies, materials, control of minienvironments, FOUP cleanliness and control, vibration monitoring, vibration control,
wafer and reticle carriers/transport, ESD control, EUV lithography.
DM: Big Data Management and Mining
Fab and test floor data collection methods and analysis; data format, volume and
interface challenges; fast drill-down to problem tools and sources; foundry-to-fabless
data transfers and information issues; new visualization methods for improved data
understanding; applying data mining techniques and machine learning based
approaches to isolate and utilize critical information from large data volumes; data
ownership.
DI: Defect Inspection and Reduction
New brightfield, darkfield, e-beam and other techniques and technologies for costeffective yield control; process development using defect detection and management;
new methodologies for detection, characterization, classification and disposition of
defect counts, types and distributions; diagnostic techniques to correlate in-line
inspection results to product yield and defectivity.
DP: Discrete and Power Devices
Solutions manufacturers facing challenges other than smallest feature sizes, including
analog/mixed-signal applications for automotive devices, power management and
display drivers, RF communications, and wireless charging.
EO: EquipmentOptimization
Efficiency/productivity measurements; optimizing and extending fab productivity
within the framework of existing wafer sizes; cycle time reduction; cost reduction;
best practices; customer-supplier continuous improvement programs; CMP
Development; high mix/high-volume factories with high-equipment productivity;
small-lot manufacturing and single-wafer/mini batch tools; fab conversions;
integration of factory control systems into complete supply chain.
FA: Factory Automation
Automation in fab; probe; assembly and test factories; e-diagnostics;
e-manufacturing; WIP management; scheduling; planning; logistics; modeling;
productivity; supply chain management; manufacturing performance; capacity,
metrics, supply/demand management; deployment, cycle time and time-to-market;
fully automated factory and remote operation center equipment and equipment
interfaces; data collection interfaces; automated material handling systems (AMHS)
challenges and carriers; standards and standardization.
FE: The Fabless Experience
Challenges faced by fabless semiconductor companies; integrating material from
multiple sources; strategies for managing risk due to supply shortages and out of spec.
parts; foundry strategies for effectively supplying many customers; foundry methods
for controlling costs for small orders; related topics of general interest to fabless
semiconductor companies or foundries.
GF: Green Factory
The role of environment; health and safety; emissions and effluents control; energy
saving; recycling; safety and health; community involvement; ergonomics; zero
emission; global environment protection; waste reduction; sustainability.
IE: Industrial Engineering
Facilities design and layout; equipment design and AMHS interactions; manufacturing
systems design; statistics/quality; computer modeling; simulation; systems
management; human factors in engineering; financial decision making; cost reduction;
supply chain.
ISD: Innovative Silicon Devices and Processes
MEMS, PCM, silicon photonics, magnetic heads, micro displays, sensors, DLP, MRAM,
organic semiconductor, silicon modulators, novel structures, carbon nanotube,
graphene, interconnects; novel and emerging applications of existing process
techniques, quantum computing and sensors, radiation imaging, harsh environment,
nanowires.
LM: Lean Manufacturing
Establishing flow; standards and standard work; value stream mapping; Kaizen;
Kaikaku; cycle times; WIP; 5S; continuous improvement; metrics, training within
industry (TWI); waste reduction.
NS/NC: Non-silicon and Non-CMOS
SiC, GaN, GaAs, glass and quartz wafers, heterogenous devices, sub-200-mm
manufacturing, analog/mixed signals, power devices, automotive, power management,
flexible substrates, display drivers
SM: Smart Manufacturing
Smart manufacturing systems, equipment and technologies; supply chain modeling
and networks; system integration for manufacturing integration; crowdsourcing design
for manufacturing; manufacturing process simulation and optimization; information
technology; smart and intelligent manufacturing processes; cloud-enabled
manufacturing systems and applications; industrial Internet of Things; next-generation
robotics/automation; measurement and systems monitoring; business, health & safety,
processes, and cost learnings.
YE: Yield Enhancement/Learning
Yield analysis tools and methods, including identifying root cause of yield loss and
reliability fails; failure analysis; defect-to-yield correlation; zonal and spatial pattern
analysis; slot signature analysis; use of volume diagnostics for pinpointing net failures;
determination of critical particle size and types.
YM: Yield Methodologies
Yield monitoring and modeling accuracy; model types; critical area extraction
techniques; yield-targeted data mining; modeling of systematic and parametric yield;
process sector analysis; short-flow yield programs, machine learning and artificial
intelligence (ML/AI) based algorithms.
3D/TSV: Packaging and Through Silicon Via
3D integration in general and associated topics like wire bonding, flip chip bonding
(bump metallization), micro-bump bonding, C4 New Process, through wafer vias,
silicon carrier; Novel approaches to global/local interconnect issues, power delivery,
thermal management, and high-density interconnects.
WFD: Workforce Development
Soliciting abstracts on workforce development. Contributions from thought leaders,
hiring managers and HR professionals regarding best practices, case studies and
industry/academia/government partnerships to create a workforce to address current
and future workforce needs throughout the semiconductor manufacturing supply
chain are welcome. Abstracts related to opportunities and challenges in talent
acquisition, hiring and retention, including development of a diverse and inclusive
workforce, Organizational Learning; Training Methodologies; Retirement & Knowledge
Transition; Systematic Cross-Training for Out-of-Industry; College, Education and
Industry Co-Development are encouraged.

Overview

The scientific conference ranking presented on this page is dedicated to the field of Engineering and Technology, offering a comprehensive and trustworthy perspective on the most impactful conferences in this area. This ranking has been meticulously developed by Research.com, recognized as one of the leading websites in the domain of science research across diverse academic fields, including Engineering and Technology. Since 2014, Research.com has established itself as a reliable provider of data on scientific contributions.

The position of each conference in the ranking is determined according to a distinctive bibliometric score devised by the expert team at Research.com. This score is calculated based on two principal indicators: the estimated h-index and the number of renowned scientists who have participated in the conference over the last three years. Such a methodology ensures a data-driven and nuanced assessment of each event's influence and standing within the global research community.

Impact Score values featured in this ranking were compiled as of 2024-11-27, ensuring up-to-date and relevant insights for stakeholders and researchers. The ranking process involved a detailed examination of more than 2,262 conferences, which were rigorously selected following comprehensive scrutiny of over 26,934 scientific documents published during the preceding three years. The evaluation drew upon the substantial contributions of 9,385 leading and highly respected scientists in the field of Engineering and Technology, reflecting the depth and complexity of the research underpinning these results.

For comprehensive information on the criteria and analytical techniques employed in establishing the ranking scores, please refer to our Methodology Page.

Papers citation over time

A key indicator for each conference is its effectiveness in reaching other researchers with the papers published at that venue.

The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.

The top authors publishing at Advanced Semiconductor Manufacturing Conference (based on the number of publications) are:

  • Kuang-Chao Chen (17 papers) published 2 papers at the last edition the same number as at the previous edition,
  • Oliver D. Patterson (17 papers) published 1 paper at the last edition,
  • Hong-Ji Lee (16 papers) published 2 papers at the last edition the same number as at the previous edition,
  • Jeanne P. Bickford (15 papers) published 2 papers at the last edition, 1 more than at the previous edition,
  • Tahone Yang (15 papers) published 2 papers at the last edition the same number as at the previous edition.

The overall trend for top authors publishing at this conference is outlined below. The chart shows the number of publications at each edition of the conference for top authors.

Only papers with recognized affiliations are considered

The top affiliations publishing at Advanced Semiconductor Manufacturing Conference (based on the number of publications) are:

  • IBM (170 papers) absent at the last edition,
  • GlobalFoundries (129 papers) published 24 papers at the last edition, 14 less than at the previous edition,
  • KLA-Tencor (95 papers) published 7 papers at the last edition, 2 less than at the previous edition,
  • Intel (58 papers) published 1 paper at the last edition the same number as at the previous edition,
  • Applied Materials (50 papers) published 5 papers at the last edition, 1 less than at the previous edition.

The overall trend for top affiliations publishing at this conference is outlined below. The chart shows the number of publications at each edition of the conference for top affiliations.

Publication chance based on affiliation

The publication chance index shows the ratio of articles published by the best research institutions at the conference edition to all articles published within that conference. The best research institutions were selected based on the largest number of articles published during all editions of the conference.

The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.

During the most recent 2017 edition, 14.44% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 62.34% were posted by at least one author from the top 10 institutions publishing at the conference. Another 10.39% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 10.39% of all publications and 16.88% were from other institutions.

Returning Authors Index

A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of conferences they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same conference from year to year.

The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the conference in relation to all participants in a given year.

Returning Institution Index

The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.

The experience to innovation index

Our experience to innovation index was created to show a cross-section of the experience level of authors publishing at a conference. The index includes the authors publishing at the last edition of a conference, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).

The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:

  • Novice - P < 5 or C < 25 (the number of publications less than 5 or the number of citations less than 25),
  • Competent - P < 10 or C < 100 (the number of publications less than 10 or the number of citations less than 100),
  • Experienced - P < 25 or C < 625 (the number of publications less than 25 or the number of citations less than 625),
  • Master - P < 50 or C < 2500 (the number of publications less than 50 or the number of citations less than 2500),
  • Star - P ≥ 50 and C ≥ 2500 (both the number of publications greater than 50 and the number of citations greater than 2500).

The chart below illustrates experience levels of first authors in cases of publications with multiple authors.

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Best Scientists who published in this Conference

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