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IEEE

2022 IEEE SYMPOSIUM ON VLSI TECHNOLOGY AND CIRCUITS (VLSIT)

Location: HONOLULU, HAWAII , United States

Submission deadline: 2/7/2022

Conference dates: 6/12/2022 - 6/17/2022

Research H-index
24

Ranking & Metrics

Discipline name Position Best Scientists Publications D-Index
Materials Science 2 111 173 20
Electronics and Electrical Engineering 25 267 520 24
Engineering and Technology 19 25 55 11

Call for Papers

Starting in 2022, the Symposia on Technology and Circuits are merging into one Symposium to maximize synergy across both domains.

The Symposium encourages submissions in all areas of VLSI Technology and Circuits, including:

Advanced CMOS devices and technologies
Advanced packaging, heterogeneous integration
Beyond-CMOS technologies and platforms, such as quantum devicesand computing systems
Biomedical devices, circuits, and systems
Data converters

Overview

This ranking presents a comprehensive list of scientific conferences in the field of Engineering and Technology, rigorously curated to assist researchers, professionals, and institutions in identifying top venues for academic and professional engagement. The list was developed by Research.com, a leading platform well-recognized for providing trusted and authoritative data on scientific contributions across all major fields, including Engineering and Technology, since 2014.

Conference positions in this ranking are determined based on a unique and robust bibliometric score, meticulously designed by Research.com. This exclusive metric is calculated using two key indicators: the estimated h-index and the number of distinguished leading scientists who have participated in each conference over the previous three years. The approach ensures a dynamic and reliable representation of each conference's academic influence and prestige.

The ranking is grounded in Impact Score values compiled as of 2024-11-27, offering the most up-to-date and relevant indicators of conference impact. The evaluation process for the ranking was extensive, involving an in-depth analysis of over 2,262 conferences. Selection was conducted through a detailed inspection and comprehensive examination of more than 26,934 scientific documents published in the last three years by 9,385 leading and well-respected scientists specializing in Engineering and Technology. This thorough methodology reflects the depth of research and the high standard maintained by the expert team responsible for the ranking’s development.

For those interested in a detailed explanation of the criteria and computations forming the basis of the ranking scores, further information is available on our Methodology Page.

Papers citation over time

A key indicator for each conference is its effectiveness in reaching other researchers with the papers published at that venue.

The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.

The top authors publishing at Symposium on VLSI Technology (based on the number of publications) are:

  • Kinam Kim (47 papers) absent at the last edition,
  • Yee-Chia Yeo (35 papers) published 3 papers at the last edition, 2 less than at the previous edition,
  • Paul Kirsch (30 papers) absent at the last edition,
  • Shinichi Takagi (28 papers) published 2 papers at the last edition the same number as at the previous edition,
  • U-In Chung (25 papers) absent at the last edition.

The overall trend for top authors publishing at this conference is outlined below. The chart shows the number of publications at each edition of the conference for top authors.

Only papers with recognized affiliations are considered

The top affiliations publishing at Symposium on VLSI Technology (based on the number of publications) are:

  • Samsung (176 papers) published 11 papers at the last edition, 4 more than at the previous edition,
  • IBM (168 papers) published 15 papers at the last edition, 6 more than at the previous edition,
  • Toshiba (113 papers) published 2 papers at the last edition, 4 less than at the previous edition,
  • Katholieke Universiteit Leuven (91 papers) published 8 papers at the last edition, 1 more than at the previous edition,
  • National Chiao Tung University (58 papers) published 13 papers at the last edition, 4 more than at the previous edition.

The overall trend for top affiliations publishing at this conference is outlined below. The chart shows the number of publications at each edition of the conference for top affiliations.

Publication chance based on affiliation

The publication chance index shows the ratio of articles published by the best research institutions at the conference edition to all articles published within that conference. The best research institutions were selected based on the largest number of articles published during all editions of the conference.

The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.

During the most recent 2017 edition, 6.11% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 49.59% were posted by at least one author from the top 10 institutions publishing at the conference. Another 17.07% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 11.38% of all publications and 21.95% were from other institutions.

Returning Authors Index

A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of conferences they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same conference from year to year.

The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the conference in relation to all participants in a given year.

Returning Institution Index

The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.

The experience to innovation index

Our experience to innovation index was created to show a cross-section of the experience level of authors publishing at a conference. The index includes the authors publishing at the last edition of a conference, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).

The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:

  • Novice - P < 5 or C < 25 (the number of publications less than 5 or the number of citations less than 25),
  • Competent - P < 10 or C < 100 (the number of publications less than 10 or the number of citations less than 100),
  • Experienced - P < 25 or C < 625 (the number of publications less than 25 or the number of citations less than 625),
  • Master - P < 50 or C < 2500 (the number of publications less than 50 or the number of citations less than 2500),
  • Star - P ≥ 50 and C ≥ 2500 (both the number of publications greater than 50 and the number of citations greater than 2500).

The chart below illustrates experience levels of first authors in cases of publications with multiple authors.

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