World's Best Scientists 2026 revealed!
Sui-Dong Wang

Sui-Dong Wang

D-Index & Metrics

Engineering and Technology

D-Index
46
Citations
7526
World Ranking
5200
National Ranking
1012

Sui-Dong Wang publication distribution in Engineering and Technology in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Sui-Dong Wang sits on this spectrum.

38–47 publications: 20 scientists 48–57 publications: 35 scientists 58–67 publications: 96 scientists 68–77 publications: 135 scientists 78–87 publications: 190 scientists 88–97 publications: 259 scientists 98–107 publications: 283 scientists 108–117 publications: 369 scientists 118–127 publications: 341 scientists 128–137 publications: 386 scientists 138–147 publications: 372 scientists 148–157 publications: 457 scientists 158–167 publications: 415 scientists 168–177 publications: 407 scientists 178–187 publications: 421 scientists 188–197 publications: 378 scientists 198–207 publications: 403 scientists 208–217 publications: 317 scientists 218–227 publications: 346 scientists 228–237 publications: 321 scientists 238–247 publications: 260 scientists 248–257 publications: 280 scientists 258–267 publications: 240 scientists 268–277 publications: 214 scientists 278–287 publications: 242 scientists 288–297 publications: 203 scientists 298–307 publications: 166 scientists 308–317 publications: 154 scientists 318–327 publications: 175 scientists 328–337 publications: 159 scientists 338–347 publications: 99 scientists 348–357 publications: 131 scientists 358–367 publications: 106 scientists 368–377 publications: 118 scientists 378–387 publications: 97 scientists 388–397 publications: 108 scientists 398–407 publications: 82 scientists 408–417 publications: 71 scientists 418–427 publications: 64 scientists 428–437 publications: 55 scientists 438–447 publications: 54 scientists 448–457 publications: 60 scientists 458–467 publications: 47 scientists 468–477 publications: 40 scientists 478–487 publications: 30 scientists 488–497 publications: 29 scientists 498–507 publications: 38 scientists 508–517 publications: 40 scientists 518–527 publications: 32 scientists 528–537 publications: 23 scientists 538–547 publications: 28 scientists 548–557 publications: 23 scientists 558–567 publications: 19 scientists 568–577 publications: 16 scientists 578–587 publications: 17 scientists 588–597 publications: 18 scientists 598–607 publications: 22 scientists 608–617 publications: 15 scientists 618–627 publications: 9 scientists 628–637 publications: 11 scientists 638–647 publications: 21 scientists 648–657 publications: 12 scientists 658–667 publications: 9 scientists 668–677 publications: 11 scientists 678–687 publications: 9 scientists 688–697 publications: 6 scientists 698–707 publications: 14 scientists 708–717 publications: 7 scientists 718–727 publications: 8 scientists 728–737 publications: 10 scientists 738–747 publications: 9 scientists 748–757 publications: 5 scientists 758–767 publications: 5 scientists 768–777 publications: 11 scientists 778–787 publications: 7 scientists 788–797 publications: 2 scientists 798–803 publications: 4 scientists 804+ publications: 100 scientists
38 publications 804+

This scientist: 176 publications — 38th percentile

38% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 804 publications or more.

Sui-Dong Wang D-index placement in Engineering and Technology in 2026

The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Sui-Dong Wang sits on this spectrum.

30 D-Index: 59 scientists 31 D-Index: 114 scientists 32 D-Index: 129 scientists 33 D-Index: 189 scientists 34 D-Index: 200 scientists 35 D-Index: 262 scientists 36 D-Index: 311 scientists 37 D-Index: 312 scientists 38 D-Index: 350 scientists 39 D-Index: 385 scientists 40 D-Index: 348 scientists 41 D-Index: 362 scientists 42 D-Index: 426 scientists 43 D-Index: 380 scientists 44 D-Index: 310 scientists 45 D-Index: 341 scientists 46 D-Index: 301 scientists 47 D-Index: 306 scientists 48 D-Index: 271 scientists 49 D-Index: 246 scientists 50 D-Index: 210 scientists 51 D-Index: 253 scientists 52 D-Index: 213 scientists 53 D-Index: 221 scientists 54 D-Index: 195 scientists 55 D-Index: 186 scientists 56 D-Index: 170 scientists 57 D-Index: 167 scientists 58 D-Index: 166 scientists 59 D-Index: 144 scientists 60 D-Index: 152 scientists 61 D-Index: 141 scientists 62 D-Index: 138 scientists 63 D-Index: 131 scientists 64 D-Index: 118 scientists 65 D-Index: 114 scientists 66 D-Index: 119 scientists 67 D-Index: 95 scientists 68 D-Index: 87 scientists 69 D-Index: 77 scientists 70 D-Index: 89 scientists 71 D-Index: 69 scientists 72 D-Index: 54 scientists 73 D-Index: 46 scientists 74 D-Index: 55 scientists 75 D-Index: 54 scientists 76 D-Index: 49 scientists 77 D-Index: 53 scientists 78 D-Index: 46 scientists 79 D-Index: 28 scientists 80 D-Index: 39 scientists 81 D-Index: 36 scientists 82 D-Index: 24 scientists 83 D-Index: 26 scientists 84 D-Index: 36 scientists 85 D-Index: 18 scientists 86 D-Index: 25 scientists 87 D-Index: 19 scientists 88 D-Index: 26 scientists 89 D-Index: 27 scientists 90 D-Index: 23 scientists 91 D-Index: 15 scientists 92 D-Index: 12 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 13 scientists 97 D-Index: 13 scientists 98 D-Index: 9 scientists 99 D-Index: 7 scientists 100 D-Index: 7 scientists 101 D-Index: 8 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 9 scientists 105 D-Index: 6 scientists 106 D-Index: 9 scientists 107+ D-Index: 99 scientists
30 D-Index 107+

This scientist: 46 D-Index — 49th percentile

49% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 107 D-Index or more.

Overview

Sui-Dong Wang is affiliated with Soochow University in China and has a research profile that spans multiple interdisciplinary fields in engineering and materials science. Their work focuses primarily on areas such as electrical and electronic engineering, polymers and plastics, and materials chemistry, with additional contributions in cellular and molecular neuroscience and biomedical engineering.

The main topics addressed in their research include:

  • Advanced Memory and Neural Computing
  • Conducting Polymers and Applications
  • Neuroscience and Neural Engineering
  • Quantum Dots Synthesis and Properties
  • Perovskite Materials and Applications
  • Chalcogenide Semiconductor Thin Films
  • Photoreceptor and Optogenetics Research

The scientist has numerous publications in prestigious journals, focusing on subjects that range from polymer composites to quantum dot technologies and neuromorphic computing. Notable recent papers include:

  • Conducting polymer-inorganic nanocomposite-based gas sensors: a review, 2020, Science and Technology of Advanced Materials
  • Long-range order enabled stability in quantum dot light-emitting diodes, 2024, Nature
  • Breaking the Size Limitation of Directly-Synthesized PbS Quantum Dot Inks Toward Efficient Short-wavelength Infrared Optoelectronic Applications, 2023, Angewandte Chemie International Edition
  • ZnO nanowire optoelectronic synapse for neuromorphic computing, 2021, Nanotechnology
  • Hybrid architecture based on two-dimensional memristor crossbar array and CMOS integrated circuit for edge computing, 2022, npj 2D Materials and Applications

Frequent coauthors collaborating with Sui-Dong Wang are:

  • Xu Gao
  • Jianlong Xu
  • Ya-Nan Zhong
  • Zhong-Da Zhang
  • Zhenni Lu

The scientist frequently publishes in venues including:

  • IEEE Electron Device Letters
  • Advanced Functional Materials
  • ACS Applied Materials & Interfaces
  • Advanced Electronic Materials
  • Applied Physics Letters

The body of work reflects cross-disciplinary integration, particularly linking materials science with advanced engineering applications, emphasizing quantum dot synthesis and neural computing technologies. This range indicates an active engagement with emerging areas in both fundamental and applied research.

Best Publications

  • Human hair-derived carbon flakes for electrochemical supercapacitors

    Wenjing Qian;Fengxia Sun;Yanhui Xu;Lihua Qiu

  • Synapse‐Like Organic Thin Film Memristors

    Ya-Nan Zhong;Tian Wang;Xu Gao;Jian-Long Xu

  • Conducting polymer-inorganic nanocomposite-based gas sensors: a review

    Yan Yan;Guiqin Yang;Jian-Long Xu;Meng Zhang

  • Contact-metal dependent current injection in pentacene thin-film transistors

    S. D. Wang;T. Minari;T. Miyadera;K. Tsukagoshi

  • Forming mechanism of nitrogen doped graphene prepared by thermal solid-state reaction of graphite oxide and urea

    Zhigang Mou;Xiaoye Chen;Yukou Du;Xiaomei Wang

  • Freestanding transparent metallic network based ultrathin, foldable and designable supercapacitors

    Yan-Hua Liu;Jian-Long Xu;Xu Gao;Yi-Lin Sun

  • Highly Reproducible Surface‐Enhanced Raman Scattering on a Capillarity‐Assisted Gold Nanoparticle Assembly

    Ronghui Que;Mingwang Shao;Shujuan Zhuo;Chunye Wen

  • Probing solid state N-doping in graphene by X-ray absorption near-edge structure spectroscopy

    Jun Zhong;Jiu-Jun Deng;Bao-Hua Mao;Tian Xie

  • Direct Work Function Measurement by Gas Phase Photoelectron Spectroscopy and Its Application on PbS Nanoparticles

    Stephanus Axnanda;Marcus Scheele;Ethan Crumlin;Baohua Mao

  • FTIR spectroscopic studies of the stabilities and reactivities of hydrogen-terminated surfaces of silicon nanowires.

    X. H. Sun;S. D. Wang;N. B. Wong;D. D. D. Ma

  • Bias stress instability in pentacene thin film transistors: Contact resistance change and channel threshold voltage shift

    S. D. Wang;T. Minari;T. Miyadera;Y. Aoyagi

  • Eosin Y functionalized graphene for photocatalytic hydrogen production from water

    Zhigang Mou;Zhigang Mou;Yupei Dong;Shujin Li;Yukou Du

  • Surface selective deposition of molecular semiconductors for solution-based integration of organic field-effect transistors

    Takeo Minari;Masataka Kano;Tetsuhiko Miyadera;Sui Dong Wang

  • Correlation between grain size and device parameters in pentacene thin film transistors

    S. D. Wang;T. Miyadera;T. Minari;Y. Aoyagi

  • High-Performance Photoelectrochemical Cells from Ionic Liquid Electrolyte in Methyl-Terminated Silicon Nanowire Arrays

    Xiaojuan Shen;Baoquan Sun;Feng Yan;Jie Zhao

  • Bottom contact ambipolar organic thin film transistor and organic inverter based on C60/pentacene heterostructure

    S.D. Wang;K. Kanai;Y. Ouchi;K. Seki

  • Controlled synthesis and synergistic effects of graphene-supported PdAu bimetallic nanoparticles with tunable catalytic properties

    Chang-Hai Liu;Rui-Hua Liu;Qi-Jun Sun;Jian-Bing Chang

  • Transfer-Free Synthesis of Doped and Patterned Graphene Films

    Qi-Qi Zhuo;Qi Wang;Yi-Ping Zhang;Duo Zhang

  • Flexible Nanogenerators Based on Graphene Oxide Films for Acoustic Energy Harvesting

    Ronghui Que;Qi Shao;Qinliang Li;Mingwang Shao

  • High-performance, ultra-flexible and transparent embedded metallic mesh electrodes by selective electrodeposition for all-solid-state supercapacitor applications

    Yan-Hua Liu;Jian-Long Xu;Su Shen;Xin-Lei Cai

  • Charge trapping induced current instability in pentacene thin film transistors: Trapping barrier and effect of surface treatment

    T. Miyadera;S. D. Wang;T. Minari;K. Tsukagoshi

Frequent Co-Authors

Jie Liu
Jie Liu Duke University
Shuit-Tong Lee
Shuit-Tong Lee Macau University of Science and Technology
Kazuhito Tsukagoshi
Kazuhito Tsukagoshi National Institute for Materials Science
Xuhui Sun
Xuhui Sun Soochow University
Qijun Sun
Qijun Sun Chinese Academy of Sciences
Takeo Minari
Takeo Minari National Institute for Materials Science
Tsun-Kong Sham
Tsun-Kong Sham University of Western Ontario
Zhi Liu
Zhi Liu ShanghaiTech University
Chun-Sing Lee
Chun-Sing Lee City University of Hong Kong
Yoshinobu Aoyagi
Yoshinobu Aoyagi Ritsumeikan University

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