World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
46
Citations
7037
World Ranking
3434
National Ranking
51

Po-Tsun Liu publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Po-Tsun Liu sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 389 publications — 73rd percentile

73% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

Po-Tsun Liu D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Po-Tsun Liu sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 46 D-Index — 52nd percentile

52% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Research.com Recognitions

  • 2020 - IEEE Fellow For contributions to thin film transistor technologies

Overview

Po-Tsun Liu is affiliated with National Yang Ming Chiao Tung University in Taiwan and specializes primarily in the field of Engineering, with a strong focus on Electrical and Electronic Engineering. Their research portfolio encompasses a substantial body of work on semiconductor and thin-film transistor technologies, reflecting a multidisciplinary approach that bridges materials chemistry, polymers and plastics, biomedical engineering, and molecular biology.

Liu's main research topics include:

  • Thin-Film Transistor Technologies
  • Semiconductor materials and devices
  • Advanced Memory and Neural Computing
  • Transition Metal Oxide Nanomaterials
  • ZnO doping and properties
  • CCD and CMOS Imaging Sensors
  • Advancements in Semiconductor Devices and Circuit Design

The scientist has contributed extensively to both applied and theoretical aspects of electronic engineering, with a publication record in prominent venues. Frequent publication outlets include:

  • ECS Meeting Abstracts
  • IEEE Electron Device Letters
  • Applied Physics Letters
  • IEEE Transactions on Electron Devices
  • Journal of Nanoelectronics and Optoelectronics

Collaboration has been an important aspect of their career. Frequent co-authors include Dun-Bao Ruan, Kai-Jhih Gan, Chih-Chieh Hsu, Simon M. Sze, and Yue Kuo, indicating sustained research partnerships primarily within electronic and materials engineering domains.

Liu has published several papers in recent years that contribute to both engineering and biomedical fields. Notable recent papers include:

  • "Disturbed mitochondrial dynamics in CD8+ TILs reinforce T cell exhaustion" (2020), Nature Immunology
  • "PERK is a critical metabolic hub for immunosuppressive function in macrophages" (2022), Nature Immunology
  • "Functional polarization of tumor-associated macrophages dictated by metabolic reprogramming" (2023), Journal of Experimental & Clinical Cancer Research
  • "Role of tungsten dopants in indium oxide thin-film transistor on radiation hardness technology" (2020), Applied Physics Letters
  • "S-CO2 flow in vertical tubes of large-diameter: Experimental evaluation and numerical exploration for heat transfer deterioration and prevention" (2023), International Journal of Heat and Mass Transfer

The diversity of these papers demonstrates Liu's interdisciplinary reach, with contributions to immune cell metabolism and advanced materials research relevant to electronic device performance under radiation.

In recognition of their work in thin-film transistor technologies, Liu was awarded the IEEE Fellow distinction in 2020, illustrating professional acknowledgment from within the engineering community.

Best Publications

  • Environment-dependent metastability of passivation-free indium zinc oxide thin film transistor after gate bias stress

    Po-Tsun Liu;Yi Teh Chou;Li Feng Teng

  • Electrical and Photosensitive Characteristics of a-IGZO TFTs Related to Oxygen Vacancy

    Jianke Yao;Ningsheng Xu;Shaozhi Deng;Jun Chen

  • Image reconstruction of a perfectly conducting cylinder by the genetic algorithm

    C. C. Chiu;Po-Tsun Liu

  • Effects of microwave annealing on electrical enhancement of amorphous oxide semiconductor thin film transistor

    Li Feng Teng;Po-Tsun Liu;Yuan Jou Lo;Yao Jen Lee

  • Effective repair to ultra-low-k dielectric material (k∼2.0) by hexamethyldisilazane treatment

    Y. S. Mor;T. C. Chang;Po-Tsun Liu;T. M. Tsai

  • Effects of NH/sub 3/-plasma nitridation on the electrical characterizations of low-k hydrogen silsesquioxane with copper interconnects

    Po-Tsun Liu;Ting-Chang Chan;Ya-Liang Yang;Yi-Fang Cheng

  • The effects of plasma treatment for low dielectric constant hydrogen silsesquioxane (HSQ)

    Po-Tsun Liu;T. C. Chang;S. M. Sze;Fu-Ming Pan

  • Enhancing the oxygen plasma resistance of low-k methylsilsesquioxane by H2 plasma treatment

    Po–Tsun Liu;Ting–Chang Chang;Yi–Shian Mor;Simon M. Sze

  • Role of environmental and annealing conditions on the passivation-free in-Ga–Zn–O TFT

    Chur Shyang Fuh;Simon Min Sze;Po-Tsun Liu;Li Feng Teng

  • Nitrogenated amorphous InGaZnO thin film transistor

    Po-Tsun Liu;Yi Teh Chou;Li Feng Teng;Fu Hai Li

  • Effect of Annealing on Defect Elimination for High Mobility Amorphous Indium-Zinc-Tin-Oxide Thin-Film Transistor

    Chur-Shyang Fuh;Po-Tsun Liu;Wei-Hsun Huang;Simon M. Sze

  • Effect of carrier gas on the structure and electrical properties of low dielectric constant SiCOH film using trimethylsilane prepared by plasma enhanced chemical vapor deposition

    Y. L. Cheng;Y. L. Wang;Y. L. Wang;J. K. Lan;H. C. Chen

  • Multilevel resistive switching memory with amorphous InGaZnO-based thin film

    Ching-Hui Hsu;Yang-Shun Fan;Po-Tsun Liu

  • Effects of Microwave Annealing on Nitrogenated Amorphous In-Ga-Zn-O Thin-Film Transistor for Low Thermal Budget Process Application

    Chur-Shyang Fuh;Po-Tsun Liu;Li-Feng Teng;Sih-Wei Huang

  • Electron Charging and Discharging Effects of Tungsten Nanocrystals Embedded in Silicon Dioxide for Low-Voltage Nonvolatile Memory Technology

    T. C. Chang;Po-Tsun Liu;S. T. Yan;S. M. Sze

  • Memory characteristics of Co nanocrystal memory device with HfO2 as blocking oxide

    F. M. Yang;T. C. Chang;Po-Tsun Liu;P. H. Yeh

  • Nickel nanocrystals with HfO2 blocking oxide for nonvolatile memory application

    F. M. Yang;T. C. Chang;Po-Tsun Liu;U. S. Chen

  • Formation of stacked Ni silicide nanocrystals for nonvolatile memory application

    Wei Ren Chen;Ting Chang Chang;Po-Tsun Liu;Po Sun Lin

  • METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

    Liu Po-Tsun;Teng Li-Feng;Lo Yuan-Jou;Lee Yao-Jen

  • A Novel Nanowire Channel Poly-Si TFT Functioning as Transistor and Nonvolatile SONOS Memory

    Shih-Ching Chen;Ting-Chang Chang;Po-Tsun Liu;Yung-Chun Wu

  • The Novel Improvement of Low Dielectric Constant Methylsilsesquioxane by N 2 O Plasma Treatment

    T. C. Chang;P. T. Liu;Y. S. Mor;S. M. Sze

Frequent Co-Authors

Ting-Chang Chang
Ting-Chang Chang National Sun Yat-sen University
Simon M. Sze
Simon M. Sze National Yang Ming Chiao Tung University
Han-Ping D. Shieh
Han-Ping D. Shieh National Yang Ming Chiao Tung University
Tseung-Yuen Tseng
Tseung-Yuen Tseng National Yang Ming Chiao Tung University
Hsiao-Wen Zan
Hsiao-Wen Zan National Yang Ming Chiao Tung University
Sien Chi
Sien Chi National Yang Ming Chiao Tung University
Ming-Dou Ker
Ming-Dou Ker National Yang Ming Chiao Tung University
Tuo-Hung Hou
Tuo-Hung Hou National Yang Ming Chiao Tung University
Feng-Chih Chang
Feng-Chih Chang National Yang Ming Chiao Tung University
Chih Chen
Chih Chen National Yang Ming Chiao Tung University

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