World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
46
Citations
7037
World Ranking
3434
National Ranking
51

Research.com Recognitions

  • 2020 - IEEE Fellow For contributions to thin film transistor technologies

Overview

Po-Tsun Liu is affiliated with National Yang Ming Chiao Tung University in Taiwan and specializes primarily in the field of Engineering, with a strong focus on Electrical and Electronic Engineering. Their research portfolio encompasses a substantial body of work on semiconductor and thin-film transistor technologies, reflecting a multidisciplinary approach that bridges materials chemistry, polymers and plastics, biomedical engineering, and molecular biology.

Liu's main research topics include:

  • Thin-Film Transistor Technologies
  • Semiconductor materials and devices
  • Advanced Memory and Neural Computing
  • Transition Metal Oxide Nanomaterials
  • ZnO doping and properties
  • CCD and CMOS Imaging Sensors
  • Advancements in Semiconductor Devices and Circuit Design

The scientist has contributed extensively to both applied and theoretical aspects of electronic engineering, with a publication record in prominent venues. Frequent publication outlets include:

  • ECS Meeting Abstracts
  • IEEE Electron Device Letters
  • Applied Physics Letters
  • IEEE Transactions on Electron Devices
  • Journal of Nanoelectronics and Optoelectronics

Collaboration has been an important aspect of their career. Frequent co-authors include Dun-Bao Ruan, Kai-Jhih Gan, Chih-Chieh Hsu, Simon M. Sze, and Yue Kuo, indicating sustained research partnerships primarily within electronic and materials engineering domains.

Liu has published several papers in recent years that contribute to both engineering and biomedical fields. Notable recent papers include:

  • "Disturbed mitochondrial dynamics in CD8+ TILs reinforce T cell exhaustion" (2020), Nature Immunology
  • "PERK is a critical metabolic hub for immunosuppressive function in macrophages" (2022), Nature Immunology
  • "Functional polarization of tumor-associated macrophages dictated by metabolic reprogramming" (2023), Journal of Experimental & Clinical Cancer Research
  • "Role of tungsten dopants in indium oxide thin-film transistor on radiation hardness technology" (2020), Applied Physics Letters
  • "S-CO2 flow in vertical tubes of large-diameter: Experimental evaluation and numerical exploration for heat transfer deterioration and prevention" (2023), International Journal of Heat and Mass Transfer

The diversity of these papers demonstrates Liu's interdisciplinary reach, with contributions to immune cell metabolism and advanced materials research relevant to electronic device performance under radiation.

In recognition of their work in thin-film transistor technologies, Liu was awarded the IEEE Fellow distinction in 2020, illustrating professional acknowledgment from within the engineering community.

Best Publications

  • Environment-dependent metastability of passivation-free indium zinc oxide thin film transistor after gate bias stress

    Po-Tsun Liu;Yi Teh Chou;Li Feng Teng

  • Electrical and Photosensitive Characteristics of a-IGZO TFTs Related to Oxygen Vacancy

    Jianke Yao;Ningsheng Xu;Shaozhi Deng;Jun Chen

  • Image reconstruction of a perfectly conducting cylinder by the genetic algorithm

    C. C. Chiu;Po-Tsun Liu

  • Effects of microwave annealing on electrical enhancement of amorphous oxide semiconductor thin film transistor

    Li Feng Teng;Po-Tsun Liu;Yuan Jou Lo;Yao Jen Lee

  • Effective repair to ultra-low-k dielectric material (k∼2.0) by hexamethyldisilazane treatment

    Y. S. Mor;T. C. Chang;Po-Tsun Liu;T. M. Tsai

  • Effects of NH/sub 3/-plasma nitridation on the electrical characterizations of low-k hydrogen silsesquioxane with copper interconnects

    Po-Tsun Liu;Ting-Chang Chan;Ya-Liang Yang;Yi-Fang Cheng

  • The effects of plasma treatment for low dielectric constant hydrogen silsesquioxane (HSQ)

    Po-Tsun Liu;T. C. Chang;S. M. Sze;Fu-Ming Pan

  • Enhancing the oxygen plasma resistance of low-k methylsilsesquioxane by H2 plasma treatment

    Po–Tsun Liu;Ting–Chang Chang;Yi–Shian Mor;Simon M. Sze

  • Role of environmental and annealing conditions on the passivation-free in-Ga–Zn–O TFT

    Chur Shyang Fuh;Simon Min Sze;Po-Tsun Liu;Li Feng Teng

  • Nitrogenated amorphous InGaZnO thin film transistor

    Po-Tsun Liu;Yi Teh Chou;Li Feng Teng;Fu Hai Li

  • Effect of Annealing on Defect Elimination for High Mobility Amorphous Indium-Zinc-Tin-Oxide Thin-Film Transistor

    Chur-Shyang Fuh;Po-Tsun Liu;Wei-Hsun Huang;Simon M. Sze

  • Effect of carrier gas on the structure and electrical properties of low dielectric constant SiCOH film using trimethylsilane prepared by plasma enhanced chemical vapor deposition

    Y. L. Cheng;Y. L. Wang;Y. L. Wang;J. K. Lan;H. C. Chen

  • Multilevel resistive switching memory with amorphous InGaZnO-based thin film

    Ching-Hui Hsu;Yang-Shun Fan;Po-Tsun Liu

  • Effects of Microwave Annealing on Nitrogenated Amorphous In-Ga-Zn-O Thin-Film Transistor for Low Thermal Budget Process Application

    Chur-Shyang Fuh;Po-Tsun Liu;Li-Feng Teng;Sih-Wei Huang

  • Electron Charging and Discharging Effects of Tungsten Nanocrystals Embedded in Silicon Dioxide for Low-Voltage Nonvolatile Memory Technology

    T. C. Chang;Po-Tsun Liu;S. T. Yan;S. M. Sze

  • Memory characteristics of Co nanocrystal memory device with HfO2 as blocking oxide

    F. M. Yang;T. C. Chang;Po-Tsun Liu;P. H. Yeh

  • Nickel nanocrystals with HfO2 blocking oxide for nonvolatile memory application

    F. M. Yang;T. C. Chang;Po-Tsun Liu;U. S. Chen

  • Formation of stacked Ni silicide nanocrystals for nonvolatile memory application

    Wei Ren Chen;Ting Chang Chang;Po-Tsun Liu;Po Sun Lin

  • METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

    Liu Po-Tsun;Teng Li-Feng;Lo Yuan-Jou;Lee Yao-Jen

  • A Novel Nanowire Channel Poly-Si TFT Functioning as Transistor and Nonvolatile SONOS Memory

    Shih-Ching Chen;Ting-Chang Chang;Po-Tsun Liu;Yung-Chun Wu

  • The Novel Improvement of Low Dielectric Constant Methylsilsesquioxane by N 2 O Plasma Treatment

    T. C. Chang;P. T. Liu;Y. S. Mor;S. M. Sze

Frequent Co-Authors

Ting-Chang Chang
Ting-Chang Chang National Sun Yat-sen University
Simon M. Sze
Simon M. Sze National Yang Ming Chiao Tung University
Tseung-Yuen Tseng
Tseung-Yuen Tseng National Yang Ming Chiao Tung University
Hsiao-Wen Zan
Hsiao-Wen Zan National Yang Ming Chiao Tung University
Sien Chi
Sien Chi National Yang Ming Chiao Tung University
Ming-Dou Ker
Ming-Dou Ker National Yang Ming Chiao Tung University
Tuo-Hung Hou
Tuo-Hung Hou National Yang Ming Chiao Tung University
Feng-Chih Chang
Feng-Chih Chang National Yang Ming Chiao Tung University
Ningsheng Xu
Ningsheng Xu Fudan University
Chih Chen
Chih Chen National Yang Ming Chiao Tung University

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