The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Nowshad Amin sits on this spectrum.
This scientist: 515 publications — 95th percentile
95% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 804 publications or more.
The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Nowshad Amin sits on this spectrum.
This scientist: 58 D-Index — 75th percentile
75% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 107 D-Index or more.
Nowshad Amin is affiliated with Universiti Tenaga Nasional in Malaysia. Their research spans numerous areas within engineering and materials science, with significant contributions in the fields of electrical and electronic engineering and materials chemistry.
Their work focuses on topics such as chalcogenide semiconductor thin films, quantum dots synthesis and properties, perovskite materials and applications, copper-based nanomaterials and applications, ZnO doping and properties, semiconductor materials and interfaces, and photovoltaic system optimization techniques.
Frequent coauthors collaborating with Nowshad Amin include Md. Akhtaruzzaman, Tiong Sieh Kiong, Kamaruzzaman Sopian, Kazi Sajedur Rahman, and Puvaneswaran Chelvanathan.
Nowshad Amin publishes regularly in several journals, with frequent publications appearing in IEEE Access, Results in Physics, Coatings, Materials, and Nanomaterials.
Selected recent papers by Nowshad Amin include:
Md. Shahariar Chowdhury;Md. Shahariar Chowdhury;Kazi Sajedur Rahman;Tanjia Chowdhury;Narissara Nuthammachot
Mohammad Shakeri;Mohsen Shayestegan;Hamza Abunima;S. M Salim Reza
Arash Aghigh;Vahid Alizadeh;H.Y. Wong;Md. Shabiul Islam
Nowshad Amin;Kamaruzzaman Sopian;Makoto Konagai
Samiul Islam;K Sobayel;Ammar Al-Kahtani;M A Islam
Puvaneswaran Chelvanathan;Mohammad Istiaque Hossain;Nowshad Amin;Nowshad Amin
M.S. Chowdhury;M.S. Chowdhury;S.A. Shahahmadi;P. Chelvanathan;S.K. Tiong
M. S. Chowdhury;Kazi Sajedur Rahman;Vidhya Selvanathan;Narissara Nuthammachot
K. Sobayel;Md. Akhtaruzzaman;K. S. Rahman;M. T. Ferdaous
Mijanur Rahman;Mohammad Shakeri;Sieh Kiong Tiong;Fatema Khatun
Nowshad Amin;Chin Wen Lung;Kamaruzzaman Sopian
M. A. Islam;M. S. Hossain;M. M. Aliyu;P. Chelvanathan
M.S. Jamal;M.S. Jamal;S.A. Shahahmadi;Mohd. Aizat Abdul Wadi;P. Chelvanathan
A. A. Lahimer;M. A. Alghoul;Fadhil Yousif;T. M. Razykov
Rajib Baran Roy;Md. Rokonuzzaman;Nowshad Amin;Mahmuda Khatun Mishu
Kamaruzzaman Sopian;Mohd Zamri Ibrahim;Wan Ramli Wan Daud;Mohd Yusof Othman
Md. Khan Sobayel Bin Rafiq;N. Amin;N. Amin;Hamad F. Alharbi;Monis Luqman
P. Chelvanathan;Y. Yusoff;F. Haque;Md. Akhtaruzzaman
Mohammad Shahidul Islam;Mohammad Tariqul Islam;Md. Amanath Ullah;Gan Kok Beng
A. A. Lahimer;M. A. Alghoul;Kamaruzzaman Sopian;Nowshad Amin
Nowshad Amin;Takayuki Isaka;Akira Yamada;Makoto Konagai
Mohammad Shakeri;Mohsen Shayestegan;S.M. Salim Reza;Iskandar Yahya
Mohammad Shahidul Islam;Mohammad Tariqul Islam;Ali F. Almutairi;Gan Kok Beng
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