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D-Index & Metrics

Materials Science

D-Index
55
Citations
16266
World Ranking
8454
National Ranking
2084

Joseph A. Stroscio publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Joseph A. Stroscio sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 213 publications — 35th percentile

35% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Joseph A. Stroscio D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Joseph A. Stroscio sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 55 D-Index — 34th percentile

34% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Research.com Recognitions

  • 2018 - Joseph F. Keithley Award For Advances in Measurement Science, American Physical Society
  • 2010 - Fellow of the American Association for the Advancement of Science (AAAS)
  • 2002 - Fellow of American Physical Society (APS) Citation For advancing our fundamental knowledge of semiconductor and metal surfaces and the innovative development, application, and dissemination of advanced methods of scanning tunneling microscopy and spectroscopy

Overview

Joseph A. Stroscio is affiliated with the National Institute of Standards and Technology in the United States. Their research primarily focuses on physics and materials science, with specific subfields in atomic and molecular physics, optics, materials chemistry, artificial intelligence, and electrical and electronic engineering.

The scientist's work spans multiple topics within their fields of study, including:

  • Quantum and electron transport phenomena
  • Graphene research and applications
  • Topological materials and phenomena
  • Surface and thin film phenomena
  • Force microscopy techniques and applications
  • Quantum information and cryptography
  • Mechanical and optical resonators

Among recent publications by Joseph A. Stroscio are:

  • "Achieving μeV tunneling resolution in an in-operando scanning tunneling microscopy, atomic force microscopy, and magnetotransport system for quantum materials research," 2020, Review of Scientific Instruments
  • "Tuning single-electron charging and interactions between compressible Landau level islands in graphene," 2020, Physical Review B
  • "A quantum ruler for orbital magnetism in moiré quantum matter," 2023, Science
  • "Visualizing the merger of tunably coupled graphene quantum dots," 2023, Physical Review B
  • "Roadmap on atomically-engineered quantum platforms," 2025, Nano Futures

Frequent collaborators include Fereshte Ghahari, Kenji Watanabe, Nikolai B. Zhitenev, Takashi Taniguchi, and Daniel Walkup.

The venues where Joseph A. Stroscio has published most frequently are:

  • Physical Review B
  • arXiv (Cornell University)
  • Review of Scientific Instruments
  • Science
  • Nano Futures

Joseph A. Stroscio has received several recognitions, such as the Joseph F. Keithley Award For Advances in Measurement Science from the American Physical Society in 2018. They were named a Fellow of the American Association for the Advancement of Science (AAAS) in 2010 and a Fellow of the American Physical Society in 2002. The APS fellowship citation highlights contributions to semiconductor and metal surface knowledge and the development and dissemination of advanced scanning tunneling microscopy and spectroscopy methods.

Best Publications

  • Atomic and molecular manipulation with the scanning tunneling microscope

    Joseph A. Stroscio;D. M. Eigler

  • Scattering and interference in epitaxial graphene.

    G. M. Rutter;G. M. Rutter;J. N. Crain;J. N. Crain;N. P. Guisinger;N. P. Guisinger;T. Li;T. Li

  • Tunneling spectroscopy of the Si(111)2 × 1 surface

    R.M. Feenstra;Joseph A. Stroscio;A.P. Fein

  • Electronic Structure of the Si(111)2 × 1 Surface by Scanning-Tunneling Microscopy

    Joseph A. Stroscio;R. M. Feenstra;A. P. Fein

  • Atom-selective imaging of the GaAs(110) surface.

    R. M. Feenstra;Joseph A. Stroscio;J. Tersoff;A. P. Fein

  • Scanning tunneling microscopy

    Joseph Anthony Stroscio;William J. Kaiser

  • Observing the Quantization of Zero Mass Carriers in Graphene

    David L. Miller;Kevin D. Kubista;Gregory M. Rutter;Ming Ruan

  • Tunneling spectroscopy of the GaAs(110) surface

    R. M. Feenstra;Joseph A. Stroscio

  • Scaling of diffusion-mediated island growth in iron-on-iron homoepitaxy.

    Joseph A. Stroscio;Daniel T. Pierce

  • Homoepitaxial growth of iron and a real space view of reflection-high-energy-electron diffraction.

    Joseph A. Stroscio;Daniel T. Pierce;Robert A. Dragoset

  • Manipulation of adsorbed atoms and creation of new structures on room-temperature surfaces with a scanning tunneling microscope

    L Whitman;Joseph A. Stroscio;Robert A. Dragoset;Robert Celotta

  • Controlling the dynamics of a single atom in lateral atom manipulation.

    Joseph A. Stroscio;Robert J. Celotta

  • Electromechanical Properties of Graphene Drumheads

    Nikolai N. Klimov;Nikolai N. Klimov;Suyong Jung;Suyong Jung;Shuze Zhu;Teng Li

  • Coarsening of Unstable Surface Features during Fe(001) Homoepitaxy

    Joseph A. Stroscio;Daniel T. Pierce;Mark D. Stiles;A Zangwill

  • Epitaxial Graphenes on Silicon Carbide

    Phillip N. First;Walt A. de Heer;Thomas Seyller;Claire Berger

  • Local state density and long-range screening of adsorbed oxygen atoms on the GaAs(110) surface.

    Joseph A. Stroscio;R. M. Feenstra;A. P. Fein

  • Asymmetries in dislocation densities, surface morphology, and strain of GaInAs/GaAs single heterolayers

    K. L. Kavanagh;M. A. Capano;L. W. Hobbs;J. C. Barbour

  • Experimental evidence for s-wave pairing symmetry in superconducting Cu(x)Bi2Se3 single crystals using a scanning tunneling microscope

    Niv Levy;Tong Zhang;Tong Zhang;Jeonghoon Ha;Fred Sharifi

  • Imaging the interface of epitaxial graphene with silicon carbide via scanning tunneling microscopy

    Gregory M. Rutter;N Guisinger;Jason Crain;Emily Jarvis

  • Atomic-scale observations of alloying at the Cr-Fe(001) interface.

    Angela Davies;Joseph A. Stroscio;Daniel T. Pierce;Robert Celotta

Frequent Co-Authors

Kenji Watanabe
Kenji Watanabe National Institute for Materials Science
Randall M. Feenstra
Randall M. Feenstra Carnegie Mellon University
Takashi Taniguchi
Takashi Taniguchi National Institute for Materials Science
Walt A. de Heer
Walt A. de Heer Georgia Institute of Technology
Lloyd J. Whitman
Lloyd J. Whitman United States Naval Research Laboratory
Wilson Ho
Wilson Ho University of California, Irvine
Claire Berger
Claire Berger Georgia Institute of Technology
Cory Dean
Cory Dean Columbia University
Mei-Yin Chou
Mei-Yin Chou Academia Sinica

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