World's Best Scientists 2026 revealed!
IEEE

THE 29th INTERNATIONAL WORKSHOP ON ACTIVE-MATRIX FLATPANEL DISPLAYS AND DEVICES (AM-FPD)

Location: Kyoto , Japan

Submission deadline: 3/21/2022

Conference dates: 7/5/2022 - 7/8/2022

Research H-index
3

Ranking & Metrics

Discipline name Position Best Scientists Publications D-Index
Materials Science 76 30 39 3
Electronics and Electrical Engineering 835 19 17 1

Call for Papers

Papers are solicited on, but not limited to, the following topics:
●Flat Panel Displays (FPD): LCD, OLED, e-paper, flexible display, printed display, wearable display, 3D display, virtual reality
display, augmented reality display, high-resolution display, high-definition display, automotive display, IoT display, memory
display, novel display, touch screen technology, in-cell technology, driving technology, circuit technology, display manufacturing,
and other FPD technology,
●TFT Technologies (TFT): oxide TFTs, organic TFTs, amorphous, microcrystalline and polycrystalline Si-based TFTs, other
material TFTs such as graphene, carbon nanotubes, layered transition metal dichalcogenide, and semiconductor nanowires, device
modeling, device and circuit simulation, reliability, and other TFT technology,
●Photovoltaics (PV): thin-film solar cells (Si-based, compound, organic, and perovskite), amorphous/crystalline Si heterojunction,
passivation, transparent conductive oxides and light management, third-generation (quantum dots, interband, plasmon etc.), BIPV,
characterization, reliability, and other PV technology,
●Thin-Film Materials and Devices (TFMD): thin-film materials (2D materials, and others) and processing, apparatus technology,
wearable sensors, thin-film emerging devices (imaging devices, sensors, neuromorphic devices and others), thin film and devices
characterizations (structural, optical and electrical properties), substrate materials and passivation technologies, and other TFMD technology.

Overview

The scientific conference ranking featured on this page highlights the most impactful events in the field of Engineering and Technology. This comprehensive assessment has been meticulously prepared by Research.com, a leading authority in science research across numerous disciplines. Since 2014, Research.com has been dedicated to providing the academic community with reliable and trusted data on scientific contributions, further bolstering the credibility of its rankings.

The ranking positions are determined using a unique bibliometric score, exclusively developed by Research.com. This score is calculated based on the estimated h-index as well as the number of leading scientists who have contributed to each conference over the preceding three years. These factors ensure that the ranking reflects the true academic influence and prestige of each event within the engineering and technology landscape.

The Impact Score values presented in this ranking were collected on 2024-11-27, ensuring the relevance and recency of the assessment. In the process of compiling these rankings, more than 2,262 conferences underwent a stringent selection process. This involved rigorous analysis and detailed inspection of over 26,934 scientific documents published in the last three years by 9,385 distinguished and well-respected scientists within the Engineering and Technology community.

The depth of research, the complexity of the bibliometric analysis, and the expertise of the evaluators collectively ensure that this ranking serves as a reliable resource for researchers, academicians, and industry professionals. For a comprehensive overview of the methodologies used in computing these ranking scores, please refer to our Methodology Page.

Papers citation over time

A key indicator for each conference is its effectiveness in reaching other researchers with the papers published at that venue.

The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.

The top authors publishing at International Workshop on Active-Matrix Flatpanel Displays and Devices (based on the number of publications) are:

  • Mutsumi Kimura (42 papers) published 6 papers at the last edition, 3 more than at the previous edition,
  • Yukiharu Uraoka (31 papers) published 2 papers at the last edition the same number as at the previous edition,
  • Tokiyoshi Matsuda (28 papers) absent at the last edition,
  • Yasuaki Ishikawa (24 papers) absent at the last edition,
  • Toshiyuki Sameshima (22 papers) published 1 paper at the last edition the same number as at the previous edition.

The overall trend for top authors publishing at this conference is outlined below. The chart shows the number of publications at each edition of the conference for top authors.

Only papers with recognized affiliations are considered

The top affiliations publishing at International Workshop on Active-Matrix Flatpanel Displays and Devices (based on the number of publications) are:

  • Ryukoku University (53 papers) published 6 papers at the last edition, 3 more than at the previous edition,
  • Nara Institute of Science and Technology (40 papers) published 3 papers at the last edition, 2 less than at the previous edition,
  • National Cheng Kung University (34 papers) published 2 papers at the last edition the same number as at the previous edition,
  • Kyung Hee University (31 papers) absent at the last edition,
  • University of Hyogo (27 papers) published 1 paper at the last edition, 1 less than at the previous edition.

The overall trend for top affiliations publishing at this conference is outlined below. The chart shows the number of publications at each edition of the conference for top affiliations.

Publication chance based on affiliation

The publication chance index shows the ratio of articles published by the best research institutions at the conference edition to all articles published within that conference. The best research institutions were selected based on the largest number of articles published during all editions of the conference.

The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.

During the most recent 2021 edition, 12.00% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 34.09% were posted by at least one author from the top 10 institutions publishing at the conference. Another 18.18% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 18.18% of all publications and 29.55% were from other institutions.

Returning Authors Index

A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of conferences they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same conference from year to year.

The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the conference in relation to all participants in a given year.

Returning Institution Index

The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.

The experience to innovation index

Our experience to innovation index was created to show a cross-section of the experience level of authors publishing at a conference. The index includes the authors publishing at the last edition of a conference, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).

The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:

  • Novice - P < 5 or C < 25 (the number of publications less than 5 or the number of citations less than 25),
  • Competent - P < 10 or C < 100 (the number of publications less than 10 or the number of citations less than 100),
  • Experienced - P < 25 or C < 625 (the number of publications less than 25 or the number of citations less than 625),
  • Master - P < 50 or C < 2500 (the number of publications less than 50 or the number of citations less than 2500),
  • Star - P ≥ 50 and C ≥ 2500 (both the number of publications greater than 50 and the number of citations greater than 2500).

The chart below illustrates experience levels of first authors in cases of publications with multiple authors.

Related Online Degrees & Career Pathways

For students interested in Materials Science, exploring related online degrees can broaden career opportunities. Many professionals choose accelerated programs, such as a 1 year masters degree, which enables them to quickly gain advanced knowledge and enter the workforce sooner.

Choosing the right program is crucial. Those looking to balance quality and affordability should consider the cheapest msw online programs to understand how cost-effective education options can complement scientific fields like Materials Science.

In terms of career prospects, degrees in STEM fields (including Materials Science) often align with online degrees that pay well. Prioritizing majors with strong job markets helps ensure a sustainable and rewarding career path.

Selecting from the good majors in college list can provide valuable guidance for students weighing their options. Materials Science remains a top choice due to its interdisciplinary nature and expanding role in innovation.

Best Scientists who published in this Conference

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