World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
53
Citations
9118
World Ranking
9297
National Ranking
547

Yuzo Shigesato publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Yuzo Shigesato sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 255 publications — 48th percentile

48% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Yuzo Shigesato D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Yuzo Shigesato sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 53 D-Index — 30th percentile

30% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Yuzo Shigesato is affiliated with Aoyama Gakuin University in Japan and has contributed extensively to the fields of materials science and engineering. Their research has primarily focused on the thermal properties of materials, ZnO doping and properties, advanced thermoelectric materials and devices, thin-film transistor technologies, transition metal oxide nanomaterials, phase-change materials and chalcogenides, as well as the electronic and structural properties of oxides.

Their main fields of study include:

  • Materials Science
  • Engineering

Within these fields, their work spans subfields such as materials chemistry, electrical and electronic engineering, polymers and plastics, condensed matter physics, and electronic, optical and magnetic materials.

  • Materials Chemistry
  • Electrical and Electronic Engineering
  • Polymers and Plastics
  • Condensed Matter Physics
  • Electronic, Optical and Magnetic Materials

Yuzo Shigesato has authored papers on a range of topics related to oxide thin films and thermal conduction, with recent notable publications including:

  • "Temporal Evolution of Microscopic Structure and Functionality during Crystallization of Amorphous Indium-Based Oxide Films" (2021), published in ACS Applied Materials & Interfaces
  • "Emerging Solid-State Thermal Switching Materials" (2024), published in Advanced Functional Materials
  • "p-type conduction mechanism in continuously varied non-stoichimetric SnOx thin films deposited by reactive sputtering with the impedance control" (2020), published in Journal of Applied Physics
  • "Thermal conductivity across the van der Waals layers of α-MoO3 thin films composed of mosaic domains with in-plane 90° rotations" (2021), published in Journal of Applied Physics
  • "Thermal conduction in polycrystalline or amorphous transparent conductive oxide films" (2024), published in Solar Energy Materials and Solar Cells

Their frequent co-authors include Junjun Jia, Takashi Yagi, Makoto Kashiwagi, Yuki Oguchi, and Yuichiro Yamashita. These collaborations reflect a sustained research effort into the advanced materials and device physics related to oxide semiconductors and thermal management at microscopic levels.

Publication venues where Shigesato's work has appeared most often include:

  • Applied Physics Letters
  • physica status solidi (RRL) - Rapid Research Letters
  • Journal of Applied Physics
  • Advanced Functional Materials
  • ACS Applied Materials & Interfaces

Best Publications

  • Electrical and structural properties of low resistivity tin‐doped indium oxide films

    Yuzo Shigesato;Satoru Takaki;Takeshi Haranoh

  • Electrical and optical properties of amorphous indium zinc oxide films

    N. Ito;Y. Sato;P.K. Song;P.K. Song;A. Kaijio

  • A microstructural study of low resistivity tin-doped indium oxide prepared by d.c. magnetron sputtering

    Yuzo Shigesato;David C. Paine

  • Thin film TiO2 photocatalyst deposited by reactive magnetron sputtering

    Makiko Yamagishi;Shna Kuriki;P.K. Song;Yuzo Shigesato

  • Study of the effect of Sn doping on the electronic transport properties of thin film indium oxide

    Yuzo Shigesato;David C. Paine

  • Comparative study on structure and internal stress in tin-doped indium oxide and indium-zinc oxide films deposited by r.f. magnetron sputtering

    T Sasabayashi;N Ito;E Nishimura;M Kon

  • Visible photoluminescence from nanocrystalline Ge formed by H2 reduction of Si0.6Ge0.4O2

    D. C. Paine;C. Caragianis;T. Y. Kim;Y. Shigesato

  • Origin of characteristic grain-subgrain structure of tin-doped indium oxide films

    Masayuki Kamei;Yuzo Shigesato;Satoru Takaki

  • Electrical and Structural Properties of Tin-Doped Indium Oxide Films Deposited by DC Sputtering at Room Temperature

    Pung Keun Song;Yuzo Shigesato;Masayuki Kamei;Itaru Yasui

  • Study of the effect of ion implantation on the electrical and microstructural properties of tin-doped indium oxide thin films

    Yuzo Shigesato;David C. Paine;T. E. Haynes

  • Transparent conductive Nb-doped TiO2 films deposited by direct-current magnetron sputtering using a TiO2-x target

    Yasushi Sato;Hideo Akizuki;Toshihisa Kamiyama;Yuzo Shigesato

  • Thermal transport properties of polycrystalline tin-doped indium oxide films

    Toru Ashida;Amica Miyamura;Nobuto Oka;Yasushi Sato

  • Early stages of ITO deposition on glass or polymer substrates

    Y Shigesato;R Koshi-ishi;T Kawashima;J Ohsako

  • Electrical and optical properties of gallium-doped zinc oxide films deposited by dc magnetron sputtering

    P.K Song;M Watanabe;M Kon;A Mitsui

  • Study on Crystallinity of Tin-Doped Indium Oxide Films Deposited by DC Magnetron Sputtering

    Pung Keun Song;Yuzo Shigesato;Itaru Yasui;Cleva W. Ow-Yang

  • Preparation and Crystallization of Tin-doped and Undoped Amorphous Indium Oxide Films Deposited by Sputtering

    Pung Keun Song;Hirotaka Akao;Masayuki Kamei;Yuzo Shigesato

  • Experimental observation on the Fermi level shift in polycrystalline Al-doped ZnO films

    Junjun Jia;Aiko Takasaki;Nobuto Oka;Yuzo Shigesato

  • Crystallinity and electrical properties of tin-doped indium oxide films deposited by DC magnetron sputtering

    Yuzo Shigesato;Satoru Takaki;Takeshi Haranou

  • Characterization of evaporated amorphous WO3 films by Raman and FTIR spectroscopies

    Y. Shigesato;A. Murayama;T. Kamimori;K. Matsuhiro

  • Photochromic Properties of Amorphous WO3 Films

    Yuzo Shigesato

Frequent Co-Authors

Brian W. Sheldon
Brian W. Sheldon Brown University
Andreas Klein
Andreas Klein Technical University of Darmstadt
Ryo Hayashi
Ryo Hayashi Canon (Japan)
Tetsuo Tsutsui
Tetsuo Tsutsui Kyushu University
Rodrigo Martins
Rodrigo Martins Universidade Nova de Lisboa
Claes-Göran Granqvist
Claes-Göran Granqvist Uppsala University
Toshihiro Kogure
Toshihiro Kogure University of Tokyo
Masaki Takata
Masaki Takata Tohoku University
Gunnar A. Niklasson
Gunnar A. Niklasson Uppsala University

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