The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Thomas David Novlan sits on this spectrum.
This scientist: 79 publications — 3rd percentile
3% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 804 publications or more.
The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Thomas David Novlan sits on this spectrum.
This scientist: 35 D-Index — 10th percentile
10% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 107 D-Index or more.
Thomas David Novlan is affiliated with AT&T in the United States and primarily works within the field of Engineering. Their research focuses mainly on Electrical and Electronic Engineering, with additional contributions to Management Science and Operations Research, Aerospace Engineering, and Computer Networks and Communications.
The scientist's work covers several specialized topics, including:
Recent publications by Thomas David Novlan include the following:
Their frequent co-authors include:
Thomas David Novlan's work has been published notably across different venues, with the highest number of publications appearing in arXiv (Cornell University). Other venues include IEEE Transactions on Wireless Communications, IEEE Transactions on Communications, IEEE Journal on Selected Areas in Communications, and the 2022 IEEE Wireless Communications and Networking Conference (WCNC).
This publication record reflects a focus on wireless communication systems, particularly in areas involving beamforming, self-interference measurement, and millimeter-wave technologies. Their research contributes to the optimization of communication system performance through both empirical measurements and theoretical modeling approaches.
A. Ghosh;N. Mangalvedhe;R. Ratasuk;B. Mondal
T. D. Novlan;H. S. Dhillon;J. G. Andrews
T. D. Novlan;R. K. Ganti;A. Ghosh;J. G. Andrews
Thomas Novlan;Jeffrey G. Andrews;Illsoo Sohn;Radha Krishna Ganti
Thomas David Novlan;Boon Loong Ng;Young Han Nam;Aris Papasakellariou
T. D. Novlan;R. K. Ganti;A. Ghosh;J. G. Andrews
Thomas David Novlan;Sridhar Rajagopal
Yingzhe Li;Francois Baccelli;Jeffrey G. Andrews;Thomas D. Novlan
Boon Loong Ng;Ying Li;Thomas David Novlan;Aris Papasakellariou
Juho Lee;Younsun Kim;Yongjun Kwak;Jianzhong Zhang
Hwan-Joon Kwon;Jeongho Jeon;Abhijeet Bhorkar;Qiaoyang Ye
Li Ying;Dong Mian;Choe David;Novlan Thomas David
Boon Loong Ng;Jianzhing Zhang;Thomas David Novlan;Aris Papasakellariou
Yingzhe Li;Jeffrey G. Andrews;Francois Baccelli;Thomas D. Novlan
Boon Loong Ng;Thomas Novlan;Aris Papasakellariou;Younghan Nam
Boon Loong Ng;Aris Papasakellariou;Thomas David Novlan
David B. Taylor;Harpreet S. Dhillon;Thomas D. Novlan;Jeffrey G. Andrews
Ying Li;Boon Loong Ng;Thomas David Novlan;Gerardus Johannes Petrus van Lieshout
Ying Li;Thomas David Novlan;Boon Loong Ng;Gerardus Johannes Petrus van Lieshout
Thomas David Novlan;Krishna Sayana;Young Han Nam;Jin-Kyu Han
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