World's Best Scientists 2026 revealed!
Siegfried Hofmann

Siegfried Hofmann

D-Index & Metrics

Materials Science

D-Index
57
Citations
9764
World Ranking
8067
National Ranking
468

Overview

Siegfried Hofmann is affiliated with the Max Planck Society in Germany. Their research spans multiple fields primarily focused on engineering and materials science, with notable contributions in the subfields of computational mechanics, electrical and electronic engineering, mechanical engineering, materials chemistry, and surfaces, coatings and films.

The scientist has contributed notably to topics including ion-surface interactions and analysis, integrated circuits and semiconductor failure analysis, electron and X-ray spectroscopy techniques, microstructure and mechanical properties, material dynamics and properties, theoretical and computational physics, and granular flow and fluidized beds.

Frequent collaborators include Pavel Lejček, Jiangyong Wang, Hao Yang, Janez Kovač, and Monika Všianská. The strong collaboration network reflects interdisciplinary work, particularly in materials characterization and surface analysis.

Hofmann's research has been published in a range of scientific journals. Frequent publication venues are:

  • Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
  • Acta Materialia
  • Metals
  • Journal of Materials Science
  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Some of their recent papers include:

  • "Entropy matters in grain boundary segregation," 2020, Acta Materialia
  • "Entropy-Driven Grain Boundary Segregation: Prediction of the Phenomenon," 2021, Metals
  • "Entropy-dominated grain boundary segregation," 2021, Journal of Materials Science
  • "Dynamic character of compositional sputter depth profiling by SIMS: A comparison of different models for quantitative profile evaluation," 2023, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • "Artifacts in multilayer depth profiling: Origin and quantification of a double peak layer profile of Ag in ToF-SIMS depth profiles of an Ag/Ni multilayer," 2020, Materials Characterization

Best Publications

  • Quantitative depth profiling in surface analysis: A review

    S. Hofmann

  • Thermodynamics and structural aspects of grain boundary segregation

    Pavel Lejček;Siegfried Hofmann

  • Preferential sputtering of oxides: A comparison of model predictions with experimental data

    J.B. Malherbe;S. Hofmann;J.M. Sanz

  • Auger- and X-Ray Photoelectron Spectroscopy in Materials Science

    Siegfried Hofmann

  • Probing depth of soft x‐ray absorption spectroscopy measured in total‐electron‐yield mode

    M. Abbate;J. B. Goedkoop;F. M. F. de Groot;M. Grioni

  • Atomic mixing, surface roughness and information depth in high‐resolution AES depth profiling of a GaAs/AlAs superlattice structure

    Siegfried Hofmann

  • Morphology and properties of sputtered (Ti,Al)N layers on high speed steel substrates as a function of deposition temperature and sputtering atmosphere

    Hermann A. Jehn;Siegfried Hofmann;Vera‐Ellen Rückborn;Wolf‐Dieter Münz

  • Sputter depth profile analysis of interfaces

    Unknown

  • The contribution of characteristic energy losses in the core-level X-ray photoelectron spectroscopy peaks of TiN and (Ti, Al)N studied by electron energy loss spectroscopy and X-ray photoelectron spectroscopy

    I. leR. Strydom;S. Hofmann

  • Surface and interface characterization of heat- treated (Ti, Al)N coatings on high speed steel substrates☆

    Hermann A. Jehn;Siegfried Hofmann;Wolf-Dieter Münz

  • Depth resolution and surface roughness effects in sputter profiling of NiCr multilayer sandwich samples using Auger electron spectroscopy

    S. Hofmann;J. Erlewein;A. Zalar

  • Solute segregation and classification of [100] tilt grain boundaries in α-iron: consequences for grain boundary engineering

    Pavel Lejček;Siegfried Hofmann;Václav Paidar

  • Practical surface analysis: state of the art and recent developments in AES, XPS, ISS and SIMS

    Siegfried Hofmann

  • High temperature oxidation behaviour of (Ti1−xCrx)N coatings

    Y. Otani;S. Hofmann

  • Selective oxidation and chemical state of Al and Ti in (Ti, Al)n coatings

    Siegfried Hofmann;Hermann A. Jehn

  • Formation and diffusion properties of oxide films on metals and on nitride coatings studied with Auger electron spectroscopy and X-ray photoelectron spectroscopy

    S Hofmann

  • Solute segregation at grain boundaries

    Siegfried Hofmann;Pavel Leiĉek

  • Auger electron spectroscopy depth profiling of Ni/Cr multilayers by sputtering with N2+ ions

    S. Hofmann;A. Zalar

  • Auger electron spectroscopy and X-ray photoelectron spectroscopy studies of the oxidation of polycrystalline tantalum and niobium at room temperature and low oxygen pressures

    J.M Sanz;S Hofmann

  • Factor analysis and superposition of Auger electron spectra applied to room temperature oxidation of Ni and NiCr21Fe12

    S. Hofmann;J. Steffen

  • Characterization of nitride coatings by Auger electron spectroscopy and x‐ray photoelectron spectroscopy

    Unknown

  • Approaching the limits of high resolution depth profiling

    S. Hofmann

  • Thermodynamics of Grain Boundary Segregation and Applications to Anisotropy, Compensation Effect and Prediction

    Pavel Lejček;Siegfried Hofmann

Frequent Co-Authors

Peter Panjan
Peter Panjan Jožef Stefan Institute
Janez Kovač
Janez Kovač Jožef Stefan Institute
Brigitte Baretzky
Brigitte Baretzky Karlsruhe Institute of Technology
Manfred Rühle
Manfred Rühle Max Planck Society
Eugen Rabkin
Eugen Rabkin Technion – Israel Institute of Technology
E. J. Mittemeijer
E. J. Mittemeijer Max Planck Institute for Intelligent Systems
Boris B. Straumal
Boris B. Straumal Institute of Solid State Physics, Russian Academy of Sciences
Kenichi Shimizu
Kenichi Shimizu Keio University

If you think any of the details on this page are incorrect, let us know.

Report an issue

We appreciate your kind effort to assist us to improve this page, it would be helpful providing us with as much detail as possible in the text box below:

Best Scientists Citing Siegfried Hofmann

Trending Scientists

Recently Published Articles