The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Marca M. Doeff sits on this spectrum.
This scientist: 270 publications — 52nd percentile
52% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Marca M. Doeff sits on this spectrum.
This scientist: 73 D-Index — 71st percentile
71% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Marca M. Doeff is affiliated with Lawrence Berkeley National Laboratory in the United States. Their research primarily spans the fields of Engineering and Materials Science, with a particular focus on Electrical and Electronic Engineering and Materials Chemistry as key subfields. Additional specialized interests include Automotive Engineering, Mechanical Engineering, and Electronic, Optical and Magnetic Materials.
Their main research topics center on various aspects of battery technology and materials, including:
Marca M. Doeff has contributed to multiple scientific papers published in well-regarded journals and venues. Selected recent publications include:
The scientist frequently publishes in several venues, with the following showing notable repeated contributions:
Frequent collaborators include:
Feng Lin;Isaac M. Markus;Isaac M. Markus;Dennis Nordlund;Tsu-Chien Weng
Marca M. Doeff;Yaoqin Hu;Frank McLarnon;Robert Kostecki
Marca M. Doeff;Yanping Ma;Steven J. Visco;Lutgard C. De Jonghe
Feng Lin;Yijin Liu;Xiqian Yu;Xiqian Yu;Lei Cheng
Jing Xu;Feng Lin;Marca M. Doeff;Wei Tong
Lei Cheng;Lei Cheng;Ethan J. Crumlin;Wei Chen;Ruimin Qiao
Lei Cheng;Wei Chen;Martin Kunz;Kristin Persson
Paul Albertus;Venkataramani Anandan;Chunmei Ban;Nitash Balsara
Yaoqin Hu;Marca M. Doeff;Robert Kostecki;Rita Finones
Yanping Ma;Marc Doyle;Thomas F. Fuller;Marca M. Doeff
Linqin Mu;Ruoqian Lin;Rong Xu;Lili Han
Daniel Rettenwander;Günther J. Redhammer;Florian Preishuber-Pflügl;Lei Cheng
James D. Wilcox;Marca M. Doeff;Marek Marcinek;Robert Kostecki
Marca M. Doeff;James D. Wilcox;Robert Kostecki;Grace Lau
Lei Cheng;Lei Cheng;Cheng Hao Wu;Cheng Hao Wu;Angelique Jarry;Wei Chen
Feng Lin;Dennis Nordlund;Yuyi Li;Matthew K. Quan
Lei Cheng;Lei Cheng;Joong Sun Park;Huaming Hou;Huaming Hou;Vassilia Zorba
Marca M. Doeff;Marcus Y. Peng;Yanping Ma;L. C. De Jonghe
Chixia Tian;Feng Lin;Marca M. Doeff
Mona Shirpour;Jordi Cabana;Marca Doeff
Feng Lin;Dennis Nordlund;Isaac M. Markus;Isaac M. Markus;Tsu-Chien Weng
If you think any of the details on this page are incorrect, let us know.
Yonsei University
Imperial College London
University of Göttingen
University of Nebraska–Lincoln
University of Nottingham
University of Toronto
Advanced Technology Center
Marshfield Clinic
University of Helsinki
University of Birmingham
Université Libre de Bruxelles
University of Würzburg
Bocconi University
University of Brighton
Chinese University of Hong Kong, Shenzhen
University of Hong Kong
