The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Joel K. W. Yang sits on this spectrum.
This scientist: 216 publications — 36th percentile
36% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Joel K. W. Yang sits on this spectrum.
This scientist: 70 D-Index — 66th percentile
66% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Joel K. W. Yang is affiliated with the Singapore University of Technology and Design in Singapore. Their research primarily spans the fields of Engineering, Materials Science, and Physics and Astronomy, contributing extensively to subfields such as Biomedical Engineering, Atomic and Molecular Physics and Optics, Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, and Materials Chemistry.
Their work covers a range of topics including Photonic Crystals and Applications, Metamaterials and Metasurfaces Applications, Plasmonic and Surface Plasmon Research, Photonic and Optical Devices, Optical Coatings and Gratings, Nonlinear Optical Materials Studies, and Nanofabrication and Lithography Techniques.
Joel K. W. Yang has coauthored numerous publications with frequent collaborators such as Hao Wang, Hongtao Wang, Qifeng Ruan, Zhaogang Dong, and Cheng-Wei Qiu. These collaborative efforts have appeared across various prominent venues.
The scientist has published extensively in several key journals and platforms, notably:
Recent papers include:
In 2020, Joel K. W. Yang was recognized as an OSA Fellow with a citation for pioneering contributions in plasmonic color printing and sub-10-nm resolution patterning for nanophotonics.
Karthik Kumar;Huigao Duan;Ravi S. Hegde;Samuel C. W. Koh
Ion Bita;Joel K. W. Yang;Yeon Sik Jung;Caroline A. Ross
Anders Kristensen;Joel K. W. Yang;Sergey I. Bozhevolnyi;Stephan Link
Shawn J. Tan;Lei Zhang;Di Zhu;Xiao Ming Goh
Andrew J. Kerman;Eric A. Dauler;William E. Keicher;Joel K. W. Yang
Kristine M. Rosfjord;Joel K. W. Yang;Eric A. Dauler;Andrew J. Kerman
Huigao Duan;Antonio I. Fernández-Domínguez;Michel Bosman;Stefan A. Maier
Shu Fen Tan;Lin Wu;Joel K.W. Yang;Joel K.W. Yang;Ping Bai
Zhuo Wang;Zhaogang Dong;Yinghong Gu;Yung-Huang Chang
Ai Leen Koh;Antonio I. Fernández-Domínguez;David W. McComb;Stefan A. Maier
Zhaogang Dong;Jinfa Ho;Ye Feng Yu;Yuan Hsing Fu
Yinghong Gu;Lei Zhang;Joel K. W. Yang;Joel K. W. Yang;Swee Ping Yeo
Kevin T. P. Lim;Hailong Liu;Yejing Liu;Joel K. W. Yang
Xiao Ming Goh;Yihan Zheng;Shawn J. Tan;Lei Zhang
Weiling Dong;Hailong Liu;Jitendra K. Behera;Li Lu
Soroosh Daqiqeh Rezaei;Zhaogang Dong;John You En Chan;Jonathan Trisno
Joel K. W. Yang;Joel K. W. Yang;Yeon Sik Jung;Yeon Sik Jung;Jae-Byum Chang;R. A. Mickiewicz
Joel K. W. Yang;Karl K. Berggren
J.K.W. Yang;A.J. Kerman;E.A. Dauler;V. Anant
Huigao Duan;Hailong Hu;Karthik Kumar;Zexiang Shen
Yejing Liu;Hao Wang;Jinfa Ho;Ryan C. Ng
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