The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Karl K. Berggren sits on this spectrum.
This scientist: 396 publications — 74th percentile
74% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,065 publications or more.
The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Karl K. Berggren sits on this spectrum.
This scientist: 74 D-Index — 90th percentile
90% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 111 D-Index or more.
Karl K. Berggren is affiliated with MIT in the United States. Their research spans multiple fields including Physics and Astronomy, with 162 publications, and Engineering, with 128 publications. Within these fields, their work focuses on subfields such as Atomic and Molecular Physics, and Optics; Electrical and Electronic Engineering; Biomedical Engineering; Condensed Matter Physics; and Artificial Intelligence.
Their research interests cover a variety of topics, with significant contributions in Photonic and Optical Devices, Physics of Superconductivity and Magnetism, Superconducting and THz Device Technology, Quantum Information and Cryptography, Advanced Fiber Laser Technologies, Atomic and Subatomic Physics Research, and Mechanical and Optical Resonators.
Berggren has contributed to research published in several notable venues, including arXiv (Cornell University), the Conference on Lasers and Electro-Optics, Applied Physics Letters, Physical Review Applied, and Nano Letters.
Recent papers featuring their work include:
Frequent collaborators in Berggren's research include Marco Colangelo, Phillip D. Keathley, Owen Medeiros, Boris Korzh, and Di Zhu, each contributing to multiple co-authored works.
The scientist has been recognized by peer organizations with distinctions including the IEEE Fellow award in 2016 for contributions in nanofabrication and nanomanufacturing in the sub-10 nm regime, and the Fellow of the American Association for the Advancement of Science (AAAS) in 2015.
Ion Bita;Joel K. W. Yang;Yeon Sik Jung;Caroline A. Ross
Boris Korzh;Qing-Yuan Zhao;Jason P. Allmaras;Simone Frasca
G Timp;RE Behringer;DM Tennant;JE Cunningham
Andrew J. Kerman;Eric A. Dauler;William E. Keicher;Joel K. W. Yang
Vitor R. Manfrinato;Lihua Zhang;Dong Su;Huigao Duan
William D. Oliver;Yang Yu;Janice C. Lee;Karl K. Berggren
Kristine M. Rosfjord;Joel K. W. Yang;Eric A. Dauler;Andrew J. Kerman
Amirhasan Nourbakhsh;Ahmad Zubair;Redwan N. Sajjad;K G Amir Tavakkoli
K. S. Johnson;J. H. Thywissen;N. H. Dekker;K. K. Berggren
George M. Whitesides;Younan Xia;James L. Wilbur;Rebecca J. Jackman
David Awschalom;Karl K. Berggren;Hannes Bernien;Sunil Bhave
Faraz Najafi;Jacob Mower;Nicholas Christopher Harris;Francesco Bellei
Karl K. Berggren;Andreas Bard;James L. Wilbur;John D. Gillaspy
George M. Whitesides;Younan Xia;James L. Wilbur;Rebecca J. Jackman
John R. Clem;Karl K. Berggren
K. W. Gotrik;A. F. Hannon;A. Alexander-Katz
Joel K. W. Yang;Joel K. W. Yang;Yeon Sik Jung;Yeon Sik Jung;Jae-Byum Chang;R. A. Mickiewicz
Joel K. W. Yang;Karl K. Berggren
Yeon Sik Jung;Jae-Byum Chang;Eric Verploegen;Karl K. Berggren
J.K.W. Yang;A.J. Kerman;E.A. Dauler;V. Anant
B. A. Korzh;Q-Y. Zhao;S. Frasca;J. P. Allmaras
Andrew Dane;Jason Allmaras;Di Zhu;Murat Onen
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