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D-Index & Metrics

Discipline name D-Index World Ranking Current World Ranking National Ranking Current National Ranking Publications Citations
Electronics and Electrical Engineering 77 615 590 275 256 283 21836

Hong X. Tang publications per year

The chart shows the history of publications by Hong X. Tang between 2000 and 2025, highlighting the no. of papers published in each year and offering an overview of the publication velocity of this scholar. Hong X. Tang published across 26 years, from 2000 to 2025, averaging 14.7 papers a year. Output peaked at 36 publications in 2020. 44 of the 382 publications appeared in the last two years.

No. of publications
10 20 30
Bar chart. Horizontal axis: year, 2000 to 2025. Vertical axis: number of publications, 0 to 36. Peak 36 publications in 2020. 2000: 2 publications 2001: 0 publications 2002: 2 publications 2003: 2 publications 2004: 1 publication 2005: 2 publications 2006: 0 publications 2007: 5 publications 2008: 2 publications 2009: 9 publications 2010: 9 publications 2011: 12 publications 2012: 31 publications 2013: 20 publications 2014: 24 publications 2015: 13 publications 2016: 28 publications 2017: 16 publications 2018: 17 publications 2019: 34 publications 2020: 36 publications 2021: 29 publications 2022: 23 publications 2023: 21 publications 2024: 29 publications 2025: 15 publications
2000 2025

382 publications in total across all disciplines

View publications per year as a table
Hong X. Tang: publications per year, 2000 to 2025
Year Publications
2000 2
2001 0
2002 2
2003 2
2004 1
2005 2
2006 0
2007 5
2008 2
2009 9
2010 9
2011 12
2012 31
2013 20
2014 24
2015 13
2016 28
2017 16
2018 17
2019 34
2020 36
2021 29
2022 23
2023 21
2024 29
2025 15
Total 382
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Hong X. Tang publications per year - data summary

  • Hong X. Tang, a Electronics and Electrical Engineering scholar from Yale University, has 382 publications recorded across 26 years, from 2000 to 2025.
  • The oldest publication on record dates to 2000 and the most recent to 2025.
  • The most productive year is 2020, with 36 publications.
  • The least productive year with any output is 2004, with 1 publication.
  • 2 of the 26 years in the span carry no publications at all (2001 and 2006).
  • The rate of publication averages 14.7 papers per year over the whole span, or 15.9 per year counting only the 24 years with at least one publication.
  • The last 5 years on the chart (2021-2025) hold 117 publications, 31% of the career total.
  • Split into equal eras - 2000-2008: 16 publications (1.8 per year); 2009-2017: 162 publications (18.0 per year); 2018-2025: 204 publications (25.5 per year).
  • Comparing the opening and closing eras, the overall trend of publication is rising.

Hong X. Tang publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Hong X. Tang sits on this spectrum.

No. of scientists
100 200 300 400
Bar chart with 53 bars. Horizontal axis: publications, 34–53 to 1,065+. Vertical axis: number of scientists, 0 to 445. Most scientists, 445, have 174–193 publications. The last bar groups every scientist with 1,065 publications or more. The highlighted bar, 274–293 publications, is where this scientist sits. 34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34–53 publications 1,065+

This scientist: 283 publications — 53rd percentile

53% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

View publications distribution as a table
Number of Electronics and Electrical Engineering scientists by publication count, Research.com 2026 ranking edition. Based on 6,875 ranked scientists.
Publications Scientists This scientist
34–53 24
54–73 52
74–93 114
94–113 203
114–133 269
134–153 355
154–173 403
174–193 445
194–213 430
214–233 431
234–253 399
254–273 366
274–293 335 283
294–313 300
314–333 276
334–353 250
354–373 214
374–393 187
394–413 152
414–433 169
434–453 147
454–473 111
474–493 117
494–513 103
514–533 99
534–553 92
554–573 75
574–593 58
594–613 69
614–633 50
634–653 62
654–673 54
674–693 44
694–713 37
714–733 28
734–753 26
754–773 26
774–793 19
794–813 23
814–833 20
834–853 16
854–873 20
874–893 11
894–913 11
914–933 16
934–953 13
954–973 10
974–993 11
994–1,013 9
1,014–1,033 9
1,034–1,053 10
1,054–1,064 6
1,065+ 99
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Hong X. Tang publication distribution in Electronics and Electrical Engineering in 2026 - data summary

  • The chart plots the publication count of all 6,875 Electronics and Electrical Engineering scientists ranked by Research.com in 2026, grouped into 53 ranges running from 34–53 to 1,065+ publications.
  • Hong X. Tang, a Electronics and Electrical Engineering scholar from Yale University, records 283 publications - the 53rd percentile of the discipline.
  • 53% of ranked Electronics and Electrical Engineering scientists score the same or lower than Hong X. Tang, and about 47% score higher.
  • The median of the discipline falls in the 254–273 publications range, and Hong X. Tang ranks above the median.
  • The most crowded range is 174–193 publications, holding 445 scientists (6% of the field).
  • 60% of the field sits in the lowest quarter of the value range (up to 294–313 publications), so the distribution is heavily right-skewed and high scores are rare.
  • The final bar has no upper bound: it groups every scientist with 1,065 publications or more, 99 scientists in all (1% of the field).

Hong X. Tang D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Hong X. Tang sits on this spectrum.

No. of scientists
50 100 150 200 250
Bar chart with 82 bars. Horizontal axis: D-Index, 30 to 111+. Vertical axis: number of scientists, 0 to 263. Most scientists, 263, have 32 D-Index. The last bar groups every scientist with 111 D-Index or more. The highlighted bar, 77 D-Index, is where this scientist sits. 30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 77 D-Index — 91st percentile

91% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

View D-Index distribution as a table
Number of Electronics and Electrical Engineering scientists by D-index, Research.com 2026 ranking edition. Based on 6,875 ranked scientists.
D-Index Scientists This scientist
30 178
31 257
32 263
33 262
34 244
35 236
36 211
37 220
38 214
39 214
40 205
41 187
42 194
43 201
44 155
45 189
46 148
47 160
48 134
49 130
50 141
51 156
52 108
53 130
54 112
55 97
56 111
57 102
58 108
59 120
60 103
61 93
62 92
63 74
64 77
65 73
66 64
67 69
68 60
69 39
70 57
71 59
72 46
73 49
74 38
75 35
76 32
77 35 77
78 31
79 22
80 34
81 31
82 34
83 23
84 18
85 30
86 19
87 19
88 20
89 8
90 17
91 7
92 14
93 9
94 15
95 10
96 12
97 10
98 10
99 12
100 16
101 5
102 7
103 7
104 8
105 9
106 13
107 4
108 5
109 10
110 8
111+ 96
Download as CSV

Hong X. Tang D-index placement in Electronics and Electrical Engineering in 2026 - data summary

  • The chart plots the discipline H-index (D-index) of all 6,875 Electronics and Electrical Engineering scientists ranked by Research.com in 2026, grouped into 82 ranges running from 30 to 111+ D-Index.
  • Hong X. Tang, a Electronics and Electrical Engineering scholar from Yale University, records 77 D-Index - the 91st percentile of the discipline.
  • 91% of ranked Electronics and Electrical Engineering scientists score the same or lower than Hong X. Tang, and about 9% score higher.
  • The median of the discipline falls in the 46 D-Index range, and Hong X. Tang ranks above the median.
  • The most crowded range is 32 D-Index, holding 263 scientists (4% of the field).
  • 60% of the field sits in the lowest quarter of the value range (up to 50 D-Index), so the distribution is heavily right-skewed and high scores are rare.
  • The final bar has no upper bound: it groups every scientist with 111 D-Index or more, 96 scientists in all (1% of the field).

Research.com Recognitions

  • 2021 - OSA Fellows Hong Tang Yale University, USA For outstanding contributions to chip-scale cavity optomechanics, and pioneering work on integrated nonlinear and quantum photonics based on chi(2) materials

Overview

Hong X. Tang is affiliated with Yale University in the United States and has contributed extensively to fields intersecting physics and engineering. Their research spans a broad array of subfields, including atomic and molecular physics, optics, electrical and electronic engineering, artificial intelligence, biomedical engineering, and condensed matter physics.

Their work often centers on topics such as photonic and optical devices, advanced fiber laser technologies, mechanical and optical resonators, photorefractive and nonlinear optics, quantum information and cryptography, acoustic wave resonator technologies, and quantum and electron transport phenomena.

Among recent publication venues where Hong X. Tang has contributed are arXiv (Cornell University), Applied Physics Letters, Optica, Physical Review Applied, and Nature Communications.

  • arXiv (Cornell University)
  • Applied Physics Letters
  • Optica
  • Physical Review Applied
  • Nature Communications

Coauthors frequently collaborating with Hong X. Tang include Chang-Ling Zou, Yuntao Xu, Mouquan Shen, Risheng Cheng, and Mingrui Xu.

  • Chang-Ling Zou
  • Yuntao Xu
  • Mouquan Shen
  • Risheng Cheng
  • Mingrui Xu

Hong X. Tang has recently published papers focusing on integrated quantum photonics, cavity magnonics, quantum frequency conversion, optical parametric oscillators, and optomagnonics. Notable papers include:

  • 2022 Roadmap on integrated quantum photonics (2022, Institutional Research Information System, Università degli Studi di Trento)
  • Cavity magnonics (2022, Physics Reports)
  • Microwave-optical quantum frequency conversion (2021, Optica)
  • Ultralow-threshold thin-film lithium niobate optical parametric oscillator (2021, Optica)
  • Waveguide cavity optomagnonics for microwave-to-optics conversion (2020, Optica)

In addition to journal publications, Hong X. Tang has contributed to book publications under the World Scientific publisher, with titles including Nanotechnology for Electronics, Photonics, Biosensors, and Emerging Technologies (2020) and Nanotechnology in Electronics, Photonics, Biosensors and Energy Systems (2023).

  • Nanotechnology for Electronics, Photonics, Biosensors, and Emerging Technologies (2020)
  • Nanotechnology in Electronics, Photonics, Biosensors and Energy Systems (2023)

In 2021, Hong X. Tang was recognized as an OSA Fellow for contributions to chip-scale cavity optomechanics and pioneering work on integrated nonlinear and quantum photonics based on chi(2) materials.

Best Publications

  • Ultra-sensitive NEMS-based cantilevers for sensing, scanned probe and very high-frequency applications.

    Mo Li;H. X. Tang;H. X. Tang;M. L. Roukes

  • Strongly coupled magnons and cavity microwave photons.

    Xufeng Zhang;Chang-Ling Zou;Chang-Ling Zou;Liang Jiang;Hong X. Tang

  • Nanomoulding with amorphous metals

    Golden Kumar;Hong X. Tang;Jan Schroers

  • Harnessing optical forces in integrated photonic circuits

    Mo Li;W. H. P. Pernice;C. Xiong;T. Baehr-Jones

  • High-speed and high-efficiency travelling wave single-photon detectors embedded in nanophotonic circuits

    W.H.P. Pernice;C. Schuck;O. Minaeva;M. Li

  • Giant Planar Hall Effect in Epitaxial (Ga,Mn)As Devices

    H. X. Tang;R. K. Kawakami;D. D. Awschalom;M. L. Roukes

  • Cavity magnomechanics

    Xufeng Zhang;Chang-Ling Zou;Liang Jiang;Hong X. Tang

  • Optomagnonic Whispering Gallery Microresonators.

    Xufeng Zhang;Na Zhu;Chang-Ling Zou;Hong X. Tang

  • Periodically poled thin-film lithium niobate microring resonators with a second-harmonic generation efficiency of 250,000%/W

    Juanjuan Lu;Joshua B. Surya;Xianwen Liu;Alexander W. Bruch

  • Magnon dark modes and gradient memory.

    Xufeng Zhang;Chang-Ling Zou;Chang-Ling Zou;Na Zhu;Florian Marquardt

  • Low-loss, silicon integrated, aluminum nitride photonic circuits and their use for electro-optic signal processing.

    Chi Xiong;Wolfram H. P. Pernice;Hong X. Tang

  • Roadmap on Integrated Quantum Photonics

    Galan Moody;Volker J Sorger;Daniel J Blumenthal;Paul W Juodawlkis

  • Optical frequency comb generation from aluminum nitride microring resonator

    Hojoong Jung;Chi Xiong;King Y. Fong;Xufeng Zhang

  • Parametric down-conversion photon pair source on a nanophotonic chip

    Xiang Guo;Chang-ling Zou;Carsten Schuck;Hojoong Jung

  • Active silicon integrated nanophotonics: ferroelectric BaTiO3 devices

    Chi Xiong;Wolfram H. P. Pernice;Joseph H. Ngai;James W. Reiner

  • Active silicon integrated nanophotonics: ferroelectric BaTiO₃ devices.

    Chi Xiong;Wolfram H. P. Pernice;Joseph H. Ngai;James W. Reiner

  • Aluminum nitride as a new material for chip-scale optomechanics and nonlinear optics

    Chi Xiong;Wolfram H P Pernice;Xiankai Sun;Carsten Schuck

  • Integrated GaN photonic circuits on silicon (100) for second harmonic generation

    Chi Xiong;Wolfram Pernice;Kevin K Ryu;Carsten Schuck

  • Dynamic manipulation of nanomechanical resonators in the high-amplitude regime and non-volatile mechanical memory operation

    Mahmood Bagheri;Menno Poot;Mo Li;Mo Li;Wolfram P. H. Pernice

  • Tunable bipolar optical interactions between guided lightwaves

    Mo Li;W. H. P. Pernice;H. X. Tang

  • Second-harmonic generation in aluminum nitride microrings with 2500%/W conversion efficiency

    Xiang Guo;Chang-Ling Zou;Hong X. Tang

  • Reactive cavity optical force on microdisk-coupled nanomechanical beam waveguides.

    Mo Li;Wolfram H. P. Pernice;Hong X. Tang

Frequent Co-Authors

Chang-Ling Zou
Chang-Ling Zou University of Science and Technology of China
Wolfram H. P. Pernice
Wolfram H. P. Pernice University of Münster
Mo Li
Mo Li University of Washington
Liang Jiang
Liang Jiang University of Chicago
Guang-Can Guo
Guang-Can Guo University of Science and Technology of China
Michael L. Roukes
Michael L. Roukes California Institute of Technology
Junxi Wang
Junxi Wang Chinese Academy of Sciences
Scott A. Diddams
Scott A. Diddams University of Colorado Boulder
Scott B. Papp
Scott B. Papp National Institute of Standards and Technology
Harish Bhaskaran
Harish Bhaskaran University of Oxford

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