Evelyn L. Hu is affiliated with Harvard University in the United States. Their research spans multiple fields, including Engineering, Materials Science, and Physics and Astronomy, with notable contributions in subfields such as Atomic and Molecular Physics and Optics, Electrical and Electronic Engineering, Materials Chemistry, Biomedical Engineering, and Electronic, Optical and Magnetic Materials.
Their work covers main topics related to Diamond and Carbon-based Materials Research, Photonic Crystals and Applications, Photonic and Optical Devices, Silicon Nanostructures and Photoluminescence, Nanowire Synthesis and Applications, Semiconductor Materials and Devices, and Quantum and Electron Transport Phenomena.
Frequent publication venues for Evelyn L. Hu include arXiv (Cornell University), Nano Letters, Physical Review Letters, Applied Physics Letters, and Nature Materials.
Recent papers authored or coauthored by Evelyn L. Hu include:
Frequent coauthors include Aaron M. Day, Jonathan R. Dietz, Xueqi Ni, Eric Mazur, and Haoning Tang.
Evelyn L. Hu has been recognized with numerous awards, including the IEEE/RSE Wolfson James Clerk Maxwell Medal in 2021 for leadership in nanoscale science and engineering and seminal contributions at the intersection of semiconductor electronics and photonics. Other distinctions include the A.C. Eringen Medal (2019), Fellow of the American Academy of Arts and Sciences (2010), membership in the National Academy of Sciences (2008), and membership in the National Academy of Engineering (2002) for contributions to semiconductor processing. Additional fellowships include the American Association for the Advancement of Science (1998), the American Physical Society (1995) for contributions to the fabrication and study of low-dimensional structures, and IEEE Fellow (1994) for developments in high-resolution dry etching processes in compound semiconductors.
P. Michler;A. Kiraz;C. Becher;W. V. Schoenfeld
T. Fujii;Y. Gao;R. Sharma;E. L. Hu
Sandra R. Whaley;D. S. English;Evelyn L. Hu;Paul F. Barbara
S. Strauf;K. Hennessy;M. T. Rakher;Y.-S. Choi
S. F. Chichibu;A. C. Abare;M. S. Minsky;S. Keller
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David Awschalom;Karl K. Berggren;Hannes Bernien;Sunil Bhave
Adele C. Tamboli;Elaine D. Haberer;Rajat Sharma;Kwan H. Lee
Aurélien David;Tetsuo Fujii;Rajat Sharma;Kelly McGroddy
D.I. Babic;K. Streubel;R.P. Mirin;N.M. Margalit
C. F. Wang;R. Hanson;D. D. Awschalom;E. L. Hu
Chiou-Fu Wang;Ronald Hanson;Tatyana Feygelson;Jie Yang
Chanh Nguyen;Herbert Kroemer;Evelyn L. Hu
A. David;Cedrik Meier;R. Sharma;F. S. Diana
P. Michler;A. Kiraz;Lidong Zhang;C. Becher
K. Mcgroddy;A. David;Elison Matioli;M. Iza
Yating Wan;Justin Norman;Qiang Li;M. J. Kennedy
J. J. Dudley;D. I. Babić;R. Mirin;L. Yang
A. Black;A.R. Hawkins;N.M. Margalit;D.I. Babic
A. Kiraz;S. Fälth;C. Becher;C. Becher;B. Gayral
G. L. Snider;I.‐H. Tan;E. L. Hu
G. A. Turnbull;P. Andrew;William L. Barnes;I. D. W. Samuel
S.F Chichibu;A.C Abare;M.P Mack;M.S Minsky
S. F. Chichibu;S. F. Chichibu;H. Marchand;M. S. Minsky;S. Keller
Yan Gao;Tetsuo Fujii;Rajat Sharma;Kenji Fujito
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