World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
49
Citations
7818
World Ranking
10624
National Ranking
466

Engineering and Technology

D-Index
49
Citations
7805
World Ranking
4395
National Ranking
105

Do Kyung Hwang publication distribution in Engineering and Technology in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Do Kyung Hwang sits on this spectrum.

38–47 publications: 20 scientists 48–57 publications: 35 scientists 58–67 publications: 96 scientists 68–77 publications: 135 scientists 78–87 publications: 190 scientists 88–97 publications: 259 scientists 98–107 publications: 283 scientists 108–117 publications: 369 scientists 118–127 publications: 341 scientists 128–137 publications: 386 scientists 138–147 publications: 372 scientists 148–157 publications: 457 scientists 158–167 publications: 415 scientists 168–177 publications: 407 scientists 178–187 publications: 421 scientists 188–197 publications: 378 scientists 198–207 publications: 403 scientists 208–217 publications: 317 scientists 218–227 publications: 346 scientists 228–237 publications: 321 scientists 238–247 publications: 260 scientists 248–257 publications: 280 scientists 258–267 publications: 240 scientists 268–277 publications: 214 scientists 278–287 publications: 242 scientists 288–297 publications: 203 scientists 298–307 publications: 166 scientists 308–317 publications: 154 scientists 318–327 publications: 175 scientists 328–337 publications: 159 scientists 338–347 publications: 99 scientists 348–357 publications: 131 scientists 358–367 publications: 106 scientists 368–377 publications: 118 scientists 378–387 publications: 97 scientists 388–397 publications: 108 scientists 398–407 publications: 82 scientists 408–417 publications: 71 scientists 418–427 publications: 64 scientists 428–437 publications: 55 scientists 438–447 publications: 54 scientists 448–457 publications: 60 scientists 458–467 publications: 47 scientists 468–477 publications: 40 scientists 478–487 publications: 30 scientists 488–497 publications: 29 scientists 498–507 publications: 38 scientists 508–517 publications: 40 scientists 518–527 publications: 32 scientists 528–537 publications: 23 scientists 538–547 publications: 28 scientists 548–557 publications: 23 scientists 558–567 publications: 19 scientists 568–577 publications: 16 scientists 578–587 publications: 17 scientists 588–597 publications: 18 scientists 598–607 publications: 22 scientists 608–617 publications: 15 scientists 618–627 publications: 9 scientists 628–637 publications: 11 scientists 638–647 publications: 21 scientists 648–657 publications: 12 scientists 658–667 publications: 9 scientists 668–677 publications: 11 scientists 678–687 publications: 9 scientists 688–697 publications: 6 scientists 698–707 publications: 14 scientists 708–717 publications: 7 scientists 718–727 publications: 8 scientists 728–737 publications: 10 scientists 738–747 publications: 9 scientists 748–757 publications: 5 scientists 758–767 publications: 5 scientists 768–777 publications: 11 scientists 778–787 publications: 7 scientists 788–797 publications: 2 scientists 798–803 publications: 4 scientists 804+ publications: 100 scientists
38 publications 804+

This scientist: 166 publications — 34th percentile

34% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 804 publications or more.

Do Kyung Hwang D-index placement in Engineering and Technology in 2026

The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Do Kyung Hwang sits on this spectrum.

30 D-Index: 59 scientists 31 D-Index: 114 scientists 32 D-Index: 129 scientists 33 D-Index: 189 scientists 34 D-Index: 200 scientists 35 D-Index: 262 scientists 36 D-Index: 311 scientists 37 D-Index: 312 scientists 38 D-Index: 350 scientists 39 D-Index: 385 scientists 40 D-Index: 348 scientists 41 D-Index: 362 scientists 42 D-Index: 426 scientists 43 D-Index: 380 scientists 44 D-Index: 310 scientists 45 D-Index: 341 scientists 46 D-Index: 301 scientists 47 D-Index: 306 scientists 48 D-Index: 271 scientists 49 D-Index: 246 scientists 50 D-Index: 210 scientists 51 D-Index: 253 scientists 52 D-Index: 213 scientists 53 D-Index: 221 scientists 54 D-Index: 195 scientists 55 D-Index: 186 scientists 56 D-Index: 170 scientists 57 D-Index: 167 scientists 58 D-Index: 166 scientists 59 D-Index: 144 scientists 60 D-Index: 152 scientists 61 D-Index: 141 scientists 62 D-Index: 138 scientists 63 D-Index: 131 scientists 64 D-Index: 118 scientists 65 D-Index: 114 scientists 66 D-Index: 119 scientists 67 D-Index: 95 scientists 68 D-Index: 87 scientists 69 D-Index: 77 scientists 70 D-Index: 89 scientists 71 D-Index: 69 scientists 72 D-Index: 54 scientists 73 D-Index: 46 scientists 74 D-Index: 55 scientists 75 D-Index: 54 scientists 76 D-Index: 49 scientists 77 D-Index: 53 scientists 78 D-Index: 46 scientists 79 D-Index: 28 scientists 80 D-Index: 39 scientists 81 D-Index: 36 scientists 82 D-Index: 24 scientists 83 D-Index: 26 scientists 84 D-Index: 36 scientists 85 D-Index: 18 scientists 86 D-Index: 25 scientists 87 D-Index: 19 scientists 88 D-Index: 26 scientists 89 D-Index: 27 scientists 90 D-Index: 23 scientists 91 D-Index: 15 scientists 92 D-Index: 12 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 13 scientists 97 D-Index: 13 scientists 98 D-Index: 9 scientists 99 D-Index: 7 scientists 100 D-Index: 7 scientists 101 D-Index: 8 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 9 scientists 105 D-Index: 6 scientists 106 D-Index: 9 scientists 107+ D-Index: 99 scientists
30 D-Index 107+

This scientist: 49 D-Index — 57th percentile

57% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 107 D-Index or more.

Overview

Do Kyung Hwang is affiliated with the Korea Institute of Science and Technology in South Korea. Their research focuses primarily on materials science and engineering, with significant contributions in subfields such as materials chemistry, electrical and electronic engineering, biomedical engineering, polymers and plastics, and electronic, optical, and magnetic materials.

The scientist's work extensively covers topics related to 2D materials and applications, MXene and MAX phase materials, perovskite materials and applications, graphene research and applications, advanced memory and neural computing, organic electronics and photovoltaics, and neural networks and reservoir computing.

Do Kyung Hwang has collaborated frequently with several researchers including Jongtae Ahn, Jisu Jang, Soohyung Park, Kenji Watanabe, and Tae Wook Kim.

Their research has been published in various scientific journals, with frequent appearances in:

  • Advanced Materials
  • ACS Applied Materials & Interfaces
  • ACS Photonics
  • Advanced Optical Materials
  • ACS Nano

Among the recent papers authored or co-authored by Do Kyung Hwang are:

  • "Fermi-Level Pinning-Free WSe2 Transistors via 2D Van der Waals Metal Contacts and Their Circuits," 2022, Advanced Materials
  • "2D MoTe2/ReS2 van der Waals Heterostructure for High-Performance and Linear Polarization-Sensitive Photodetector," 2021, ACS Photonics
  • "Near-Infrared Self-Powered Linearly Polarized Photodetection and Digital Incoherent Holography Using WSe2/ReSe2 van der Waals Heterostructure," 2021, ACS Nano
  • "Recent progress in the development of backplane thin film transistors for information displays," 2020, Journal of Information Display
  • "Self-Powered Visible-Invisible Multiband Detection and Imaging Achieved Using High-Performance 2D MoTe2/MoS2 Semivertical Heterojunction Photodiodes," 2020, ACS Applied Materials & Interfaces

Best Publications

  • Improving the Gate Stability of ZnO Thin-Film Transistors with Aluminum Oxide Dielectric Layers

    Min Suk Oh;Kimoon Lee;J. H. Song;Byoung H. Lee

  • Few-Layer Black Phosphorus Field-Effect Transistors with Reduced Current Fluctuation

    Junhong Na;Young Tack Lee;Jung Ah Lim;Do Kyung Hwang

  • Comparative studies on the stability of polymer versus SiO2 gate dielectrics for pentacene thin-film transistors

    D. K. Hwang;Kimoon Lee;Jae Hoon Kim;Seongil Im

  • Top-Gate Organic Field-Effect Transistors with High Environmental and Operational Stability

    Do Kyung Hwang;Canek Fuentes-Hernandez;Jungbae Kim;William J. Potscavage

  • Hysteresis mechanisms of pentacene thin-film transistors with polymer/oxide bilayer gate dielectrics

    D. K. Hwang;Min Suk Oh;Jung Min Hwang;Jae Hoon Kim

  • Ultrasensitive PbS quantum-dot-sensitized InGaZnO hybrid photoinverter for near-infrared detection and imaging with high photogain

    Do Kyung Hwang;Young Tack Lee;Hee Sung Lee;Yun Jae Lee;Yun Jae Lee

  • Black Phosphorus–Zinc Oxide Nanomaterial Heterojunction for p–n Diode and Junction Field-Effect Transistor

    Pyo Jin Jeon;Young Tack Lee;June Yeong Lim;Jin Sung Kim

  • Fermi‐Level Pinning‐Free WSe2 Transistors via 2D Van der Waals Metal Contacts and Their Circuits

    Unknown

  • Nonvolatile Ferroelectric Memory Circuit Using Black Phosphorus Nanosheet-Based Field-Effect Transistors with P(VDF-TrFE) Polymer.

    Young Tack Lee;Hyeokjae Kwon;Jin Sung Kim;Hong Hee Kim

  • Inverted quantum dot light emitting diodes using polyethylenimine ethoxylated modified ZnO.

    Hong Hee Kim;Soohyung Park;Yeonjin Yi;Dong Ick Son

  • Homogeneous 2D MoTe2 p–n Junctions and CMOS Inverters formed by Atomic-Layer-Deposition-Induced Doping

    June Yeong Lim;Atiye Pezeshki;Sehoon Oh;Jin Sung Kim

  • Recent progress in the development of backplane thin film transistors for information displays

    Unknown

  • Solvent and polymer matrix effects on TIPS-pentacene/polymer blend organic field-effect transistors

    Do Kyung Hwang;Canek Fuentes-Hernandez;John D. Berrigan;Yunnan Fang

  • Phase evolution of perovskite LaNiO3 nanofibers for supercapacitor application and p-type gas sensing properties of LaOCl–NiO composite nanofibers

    Do Kyung Hwang;Soohyun Kim;Jong Heun Lee;In Sung Hwang

  • ZnO-based nonvolatile memory thin-film transistors with polymer dielectric/ferroelectric double gate insulators

    Seok Hwan Noh;Wonjun Choi;Min Suk Oh;D. K. Hwang;D. K. Hwang

  • Mixed-Dimensional 1D ZnO–2D WSe2 van der Waals Heterojunction Device for Photosensors

    Young Tack Lee;Young Tack Lee;Pyo Jin Jeon;Jae Hyun Han;Jae Hyun Han;Jongtae Ahn

  • Graphene Versus Ohmic Metal as Source‐Drain Electrode for MoS2 Nanosheet Transistor Channel

    Young Tack Lee;Kyunghee Choi;Hee Sung Lee;Sung Wook Min

  • Enhanced light scattering and trapping effect of Ag nanowire mesh electrode for high efficient flexible organic solar cell

    Byung Yong Wang;Byung Yong Wang;Tae Hee Yoo;Tae Hee Yoo;Ju Won Lim;Byoung In Sang

  • Flexible and stable solution-processed organic field-effect transistors

    D.K. Hwang;C. Fuentes-Hernandez;J.B. Kim;W.J. Potscavage

  • 2D MoTe2/ReS2 van der Waals Heterostructure for High-Performance and Linear Polarization-Sensitive Photodetector

    Jongtae Ahn;Ji-Hoon Kyhm;Hee Kyoung Kang;Namhee Kwon

  • Polymer/YOx Hybrid‐Sandwich Gate Dielectrics for Semitransparent Pentacene Thin‐Film Transistors Operating Under 5 V

    Do Kyung Hwang;Chang Su Kim;Jeong Min Choi;Kimoon Lee

  • Dual Gate Black Phosphorus Field Effect Transistors on Glass for NOR Logic and Organic Light Emitting Diode Switching

    Jin Sung Kim;Pyo Jin Jeon;Junyeong Lee;Kyunghee Choi

  • Studies on poly(methyl methacrylate) dielectric layer for field effect transistor: Influence of polymer tacticity

    Ji Hoon Park;D.K. Hwang;Jiyoul Lee;Seongil Im

Frequent Co-Authors

Won Kook Choi
Won Kook Choi Korea Institute of Science and Technology
Seongil Im
Seongil Im Yonsei University
Bernard Kippelen
Bernard Kippelen Georgia Institute of Technology
Canek Fuentes-Hernandez
Canek Fuentes-Hernandez Northeastern University
Jung Ah Lim
Jung Ah Lim Korea Institute of Science and Technology
Seth R. Marder
Seth R. Marder University of Colorado Boulder
Byeong Kwon Ju
Byeong Kwon Ju Korea University
Hyoung Joon Choi
Hyoung Joon Choi Yonsei University
Stephen Barlow
Stephen Barlow Georgia Institute of Technology
Chong-Yun Kang
Chong-Yun Kang Korea Institute of Science and Technology

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