The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where David E. Motaung sits on this spectrum.
This scientist: 160 publications — 17th percentile
17% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where David E. Motaung sits on this spectrum.
This scientist: 41 D-Index — 2nd percentile
2% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
David E. Motaung is affiliated with the University of the Free State in South Africa. Their research spans primarily the fields of engineering and materials science, with significant contributions to subfields such as electrical and electronic engineering, materials chemistry, biomedical engineering, bioengineering, and polymers and plastics.
Their scholarly work focuses on topics including gas sensing nanomaterials and sensors, advanced chemical sensor technologies, analytical chemistry and sensors, ZnO doping and properties, transition metal oxide nanomaterials, advanced photocatalysis techniques, and copper-based nanomaterials and applications.
Several frequent coauthors have collaborated with David E. Motaung, featuring:
David E. Motaung's work has been published repeatedly in a number of venues, including:
Recent papers authored or coauthored by David E. Motaung include:
Teboho P. Mokoena;Teboho P. Mokoena;Hendrik C. Swart;David E. Motaung
David E. Motaung;David E. Motaung;Gugu. H. Mhlongo;Gugu. H. Mhlongo;Peter R. Makgwane;Baban P. Dhonge
K. Shingange;Z.P. Tshabalala;O.M. Ntwaeaborwa;D.E. Motaung
Gugu H. Mhlongo;Katekani Shingange;Zamaswazi P. Tshabalala;Baban P. Dhonge
D. E. Motaung;G. H. Mhlongo;S. S. Nkosi;G. F. Malgas
Gugu H Mhlongo;David E Motaung;David E Motaung;FR Cummings;HC Swart
Aubrey Makofane;Aubrey Makofane;David E. Motaung;David E. Motaung;Nomso C. Hintsho-Mbita;Nomso C. Hintsho-Mbita
D.N. Oosthuizen;D.N. Oosthuizen;D.E. Motaung;D.E. Motaung;D.E. Motaung;H.C. Swart
Z.P. Tshabalala;Z.P. Tshabalala;K. Shingange;K. Shingange;B.P. Dhonge;O.M. Ntwaeaborwa
Teboho P. Mokoena;Teboho P. Mokoena;Teboho P. Mokoena;Hendrik C. Swart;Kenneth T. Hillie;Kenneth T. Hillie;Zamaswazi P. Tshabalala;Zamaswazi P. Tshabalala
Ioannis Kortidis;Ioannis Kortidis;Hendrik C. Swart;Suprakas Sinha Ray;Suprakas Sinha Ray;David E. Motaung;David E. Motaung
Gugu H. Mhlongo;David E. Motaung;Steven S. Nkosi;H.C. Swart
David E. Motaung;David E. Motaung;Gerald F. Malgas;Christopher J. Arendse;Sipho E. Mavundla;Sipho E. Mavundla
David E. Motaung;David E. Motaung;Gerald F. Malgas;Christopher J. Arendse;Sipho E. Mavundla;Sipho E. Mavundla
Huaping Wang;Jianmin Ma;Jun Zhang;Yuezhan Feng
Zamaswazi P. Tshabalala;Zamaswazi P. Tshabalala;Zamaswazi P. Tshabalala;Teboho P. Mokoena;Teboho P. Mokoena;Mudalo Jozela;James Tshilongo
Teboho P. Mokoena;Teboho P. Mokoena;Zamaswazi P. Tshabalala;Zamaswazi P. Tshabalala;Kenneth T. Hillie;Kenneth T. Hillie;Hendrik C. Swart
David E. Motaung;Gerald F. Malgas;Christopher J. Arendse
D.N. Oosthuizen;D.N. Oosthuizen;D.E. Motaung;D.E. Motaung;H.C. Swart
Z.P. Tshabalala;Z.P. Tshabalala;D.E. Motaung;G.H. Mhlongo;O.M. Ntwaeaborwa
Dina N Oosthuizen;Dina N Oosthuizen;David E Motaung;David E Motaung;HC Swart
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