| Discipline name | D-Index | World Ranking | Current World Ranking | National Ranking | Current National Ranking | Publications | Citations |
|---|---|---|---|---|---|---|---|
| Electronics and Electrical Engineering | 42 | 4163 | 3997 | 66 | 64 | 236 | 5874 |
The chart shows the history of publications by Aaron J. Danner between 1999 and 2025, highlighting the no. of papers published in each year and offering an overview of the publication velocity of this scholar. Aaron J. Danner published across 27 years, from 1999 to 2025, averaging 9.9 papers a year. Output peaked at 25 publications in 2025. 36 of the 268 publications appeared in the last two years.
268 publications in total across all disciplines
| Year | Publications |
|---|---|
| 1999 | 1 |
| 2000 | 0 |
| 2001 | 1 |
| 2002 | 1 |
| 2003 | 9 |
| 2004 | 8 |
| 2005 | 18 |
| 2006 | 10 |
| 2007 | 0 |
| 2008 | 6 |
| 2009 | 7 |
| 2010 | 20 |
| 2011 | 19 |
| 2012 | 18 |
| 2013 | 15 |
| 2014 | 11 |
| 2015 | 14 |
| 2016 | 11 |
| 2017 | 4 |
| 2018 | 4 |
| 2019 | 7 |
| 2020 | 15 |
| 2021 | 14 |
| 2022 | 6 |
| 2023 | 13 |
| 2024 | 11 |
| 2025 | 25 |
| Total | 268 |
The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Aaron J. Danner sits on this spectrum.
This scientist: 236 publications — 40th percentile
40% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,065 publications or more.
| Publications | Scientists | This scientist |
|---|---|---|
| 34–53 | 24 | |
| 54–73 | 52 | |
| 74–93 | 114 | |
| 94–113 | 203 | |
| 114–133 | 269 | |
| 134–153 | 355 | |
| 154–173 | 403 | |
| 174–193 | 445 | |
| 194–213 | 430 | |
| 214–233 | 431 | |
| 234–253 | 399 | 236 |
| 254–273 | 366 | |
| 274–293 | 335 | |
| 294–313 | 300 | |
| 314–333 | 276 | |
| 334–353 | 250 | |
| 354–373 | 214 | |
| 374–393 | 187 | |
| 394–413 | 152 | |
| 414–433 | 169 | |
| 434–453 | 147 | |
| 454–473 | 111 | |
| 474–493 | 117 | |
| 494–513 | 103 | |
| 514–533 | 99 | |
| 534–553 | 92 | |
| 554–573 | 75 | |
| 574–593 | 58 | |
| 594–613 | 69 | |
| 614–633 | 50 | |
| 634–653 | 62 | |
| 654–673 | 54 | |
| 674–693 | 44 | |
| 694–713 | 37 | |
| 714–733 | 28 | |
| 734–753 | 26 | |
| 754–773 | 26 | |
| 774–793 | 19 | |
| 794–813 | 23 | |
| 814–833 | 20 | |
| 834–853 | 16 | |
| 854–873 | 20 | |
| 874–893 | 11 | |
| 894–913 | 11 | |
| 914–933 | 16 | |
| 934–953 | 13 | |
| 954–973 | 10 | |
| 974–993 | 11 | |
| 994–1,013 | 9 | |
| 1,014–1,033 | 9 | |
| 1,034–1,053 | 10 | |
| 1,054–1,064 | 6 | |
| 1,065+ | 99 |
The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Aaron J. Danner sits on this spectrum.
This scientist: 42 D-Index — 42nd percentile
42% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 111 D-Index or more.
| D-Index | Scientists | This scientist |
|---|---|---|
| 30 | 178 | |
| 31 | 257 | |
| 32 | 263 | |
| 33 | 262 | |
| 34 | 244 | |
| 35 | 236 | |
| 36 | 211 | |
| 37 | 220 | |
| 38 | 214 | |
| 39 | 214 | |
| 40 | 205 | |
| 41 | 187 | |
| 42 | 194 | 42 |
| 43 | 201 | |
| 44 | 155 | |
| 45 | 189 | |
| 46 | 148 | |
| 47 | 160 | |
| 48 | 134 | |
| 49 | 130 | |
| 50 | 141 | |
| 51 | 156 | |
| 52 | 108 | |
| 53 | 130 | |
| 54 | 112 | |
| 55 | 97 | |
| 56 | 111 | |
| 57 | 102 | |
| 58 | 108 | |
| 59 | 120 | |
| 60 | 103 | |
| 61 | 93 | |
| 62 | 92 | |
| 63 | 74 | |
| 64 | 77 | |
| 65 | 73 | |
| 66 | 64 | |
| 67 | 69 | |
| 68 | 60 | |
| 69 | 39 | |
| 70 | 57 | |
| 71 | 59 | |
| 72 | 46 | |
| 73 | 49 | |
| 74 | 38 | |
| 75 | 35 | |
| 76 | 32 | |
| 77 | 35 | |
| 78 | 31 | |
| 79 | 22 | |
| 80 | 34 | |
| 81 | 31 | |
| 82 | 34 | |
| 83 | 23 | |
| 84 | 18 | |
| 85 | 30 | |
| 86 | 19 | |
| 87 | 19 | |
| 88 | 20 | |
| 89 | 8 | |
| 90 | 17 | |
| 91 | 7 | |
| 92 | 14 | |
| 93 | 9 | |
| 94 | 15 | |
| 95 | 10 | |
| 96 | 12 | |
| 97 | 10 | |
| 98 | 10 | |
| 99 | 12 | |
| 100 | 16 | |
| 101 | 5 | |
| 102 | 7 | |
| 103 | 7 | |
| 104 | 8 | |
| 105 | 9 | |
| 106 | 13 | |
| 107 | 4 | |
| 108 | 5 | |
| 109 | 10 | |
| 110 | 8 | |
| 111+ | 96 |
Aaron J. Danner is affiliated with the National University of Singapore in Singapore. Their research focuses primarily on areas within Engineering and Physics and Astronomy, with significant work in subfields such as Electrical and Electronic Engineering, Atomic and Molecular Physics and Optics, Artificial Intelligence, Materials Chemistry, and Electronic, Optical and Magnetic Materials.
The scientist's research topics encompass a range of areas in photonics and optical systems. Key topics in their body of work include:
Recent papers representative of their research include:
Danner frequently collaborates with colleagues including Hong-Lin Lin, Guanyu Chen, Yu Cao, Jun Da Ng, and Qi Luo. These collaborations reflect a network engaged in advancing photonic technologies and related fields.
The scientist's work is published in several recurring venues that include:
M. Q. Mehmood;Shengtao Mei;Sajid Hussain;Kun Huang
Jaesung Son;Shreya Kundu;Lalit K. Verma;Mridul Sakhuja
L.K. Verma;M. Sakhuja;J. Son;A.J. Danner
Guangyuan Si;Yanhui Zhao;Jiangtao Lv;Mengqian Lu
N. Yokouchi;A.J. Danner;K.D. Choquette
Yan Jun Liu;Guang Yuan Si;Eunice S. P. Leong;Ning Xiang
Guangyuan Si;Yanhui Zhao;Hong Liu;Siewlang Teo
Lei Jin;Yao-Wei Huang;Yao-Wei Huang;Zhongwei Jin;Robert C. Devlin
Baojuan Xi;Lalit Kumar Verma;Jing Li;Charanjit Singh Bhatia
Kun Huang;Hong Liu;Sara Restuccia;Muhammad Q Mehmood
Noriyuki Yokouchi;Aaron J. Danner;Kent D. Choquette
Shengtao Mei;Kun Huang;Hong Liu;Fei Qin
H. Tanoto;J. H. Teng;Q. Y. Wu;M. Sun
Unknown
Y.K. Kim;A.J. Danner;J.J. Raftery;K.D. Choquette
Shengtao Mei;Muhammad Qasim Mehmood Mehmood;Muhammad Qasim Mehmood Mehmood;Sajid Hussain;Kun Huang
Aaron J. Danner;James J. Raftery;Noriyuki Yokouchi;Kent D. Choquette
Aaron J. Danner;Tomáš Tyc;Ulf Leonhardt
A. J. Danner;J. C. Lee;J. J. Raftery;N. Yokouchi
A. J. Danner;T. S. Kim;Kent D Choquette
James J. Raftery;James J. Raftery;Ann C. Lehman;Aaron J. Danner;Aaron J. Danner;Paul O. Leisher
Hong Liu;Muhammad Q. Mehmood;Kun Huang;Lin Ke
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