The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where P. Shiv Halasyamani sits on this spectrum.
This scientist: 304 publications — 61st percentile
61% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where P. Shiv Halasyamani sits on this spectrum.
This scientist: 79 D-Index — 79th percentile
79% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
P. Shiv Halasyamani is affiliated with the University of Houston in the United States. Their research primarily focuses on Materials Science, with a significant number of publications in Materials Chemistry. The scholar's work also spans notable subfields including Electronic, Optical and Magnetic Materials, Inorganic Chemistry, Condensed Matter Physics, and Electrical and Electronic Engineering.
The scientist has contributed extensively to topics related to crystallization and solubility studies, and X-ray diffraction in crystallography. Other main topics covered in their publications include crystal structures and properties, solid-state spectroscopy and crystallography, multiferroics and related materials, advanced condensed matter physics, and ferroelectric and piezoelectric materials.
Recent research outputs reflect a focus on nonlinear optical materials and crystallographic studies. Selected recent papers include:
Halasyamani frequently collaborates with other researchers, with leading coauthors including:
Their publications are found predominantly in key scientific venues, including:
P. Shiv Halasyamani was recognized as a Fellow of the American Association for the Advancement of Science (AAAS) in 2018.
Kang Min Ok;Eun Ok Chi;P. Shiv Halasyamani
P. Shiv Halasyamani
T. Thao Tran;Hongwei Yu;James M. Rondinelli;Kenneth R. Poeppelmeier
Hyun-Seup Ra;Kang Min Ok;P Shiv Halasyamani
Sau Doan Nguyen;Jeongho Yeon;Sang-Hwan Kim;P. Shiv Halasyamani
Kang Min Ok and;P. Shiv Halasyamani;David Casanova;Miquel Llunell
Richard E. Sykora;Kang Min Ok;P. Shiv Halasyamani;Thomas E. Albrecht-Schmitt
T. Thao Tran;Jiangang He;James M. Rondinelli;P. Shiv Halasyamani
Hong-Young Chang;Sang-Hwan Kim;P. Shiv Halasyamani;Kang Min Ok
Hong-Young Chang;Sang-Hwan Kim;Kang Min Ok;P Shiv Halasyamani
Hongwei Yu;Weiguo Zhang;Joshua Young;Joshua Young;James M. Rondinelli
Jonathan W Lekse;Meghann A Moreau;Katie L McNerny;Jeongho Yeon
P. Shiv Halasyamani;James M. Rondinelli
Hongwei Yu;Joshua Young;Hongping Wu;Hongping Wu;Weiguo Zhang
T. Thao Tran;Joshua Young;James M. Rondinelli;P. Shiv Halasyamani
Weiguo Zhang;Hongwei Yu;Hongping Wu;P. Shiv Halasyamani
Eun Ok Chi;Kang Min Ok;Yetta Porter;P. Shiv Halasyamani
Yetta Porter;Kang Min Ok;N. S. P. Bhuvanesh;P. Shiv Halasyamani
Joanna Goodey;Jake Broussard;P. Shiv Halasyamani
Hongwei Yu;Nathan Z. Koocher;James M. Rondinelli;P. Shiv Halasyamani
P. Shiv Halasyamani;Weiguo Zhang
Youngsik Kim;In-seok Seo;Steve W. Martin;Jaewook Baek
Michael R. Marvel;Julien Lesage;Jaewook Baek;P. Shiv Halasyamani
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