World's Best Scientists 2026 revealed!
David Scheschkewitz

David Scheschkewitz

D-Index & Metrics

Chemistry

D-Index
48
Citations
6945
World Ranking
15392
National Ranking
1128

David Scheschkewitz publication distribution in Chemistry in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Chemistry in 2026. The highlighted bar marks where David Scheschkewitz sits on this spectrum.

61–80 publications: 66 scientists 81–100 publications: 302 scientists 101–120 publications: 623 scientists 121–140 publications: 918 scientists 141–160 publications: 1,218 scientists 161–180 publications: 1,350 scientists 181–200 publications: 1,344 scientists 201–220 publications: 1,281 scientists 221–240 publications: 1,216 scientists 241–260 publications: 1,100 scientists 261–280 publications: 979 scientists 281–300 publications: 939 scientists 301–320 publications: 764 scientists 321–340 publications: 643 scientists 341–360 publications: 628 scientists 361–380 publications: 522 scientists 381–400 publications: 459 scientists 401–420 publications: 397 scientists 421–440 publications: 327 scientists 441–460 publications: 270 scientists 461–480 publications: 265 scientists 481–500 publications: 252 scientists 501–520 publications: 201 scientists 521–540 publications: 185 scientists 541–560 publications: 148 scientists 561–580 publications: 148 scientists 581–600 publications: 132 scientists 601–620 publications: 114 scientists 621–640 publications: 104 scientists 641–660 publications: 91 scientists 661–680 publications: 92 scientists 681–700 publications: 73 scientists 701–720 publications: 57 scientists 721–740 publications: 54 scientists 741–760 publications: 67 scientists 761–780 publications: 45 scientists 781–800 publications: 46 scientists 801–820 publications: 39 scientists 821–840 publications: 32 scientists 841–860 publications: 36 scientists 861–880 publications: 29 scientists 881–900 publications: 26 scientists 901–920 publications: 24 scientists 921–940 publications: 14 scientists 941–960 publications: 23 scientists 961–980 publications: 28 scientists 981–1,000 publications: 15 scientists 1,001–1,020 publications: 29 scientists 1,021–1,040 publications: 12 scientists 1,041–1,060 publications: 19 scientists 1,061–1,080 publications: 12 scientists 1,081–1,100 publications: 6 scientists 1,101–1,120 publications: 8 scientists 1,121–1,140 publications: 12 scientists 1,141–1,160 publications: 5 scientists 1,161–1,180 publications: 6 scientists 1,181–1,200 publications: 14 scientists 1,201–1,220 publications: 7 scientists 1,221–1,240 publications: 2 scientists 1,241–1,260 publications: 6 scientists 1,261–1,280 publications: 4 scientists 1,281–1,294 publications: 6 scientists 1,295+ publications: 100 scientists
61 publications 1,295+

This scientist: 197 publications — 31st percentile

31% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,295 publications or more.

David Scheschkewitz D-index placement in Chemistry in 2026

The chart shows the D-index (discipline H-index) distribution of Chemistry scientists ranked by Research.com in 2026. The highlighted bar marks where David Scheschkewitz sits on this spectrum.

40–41 D-Index: 289 scientists 42–43 D-Index: 612 scientists 44–45 D-Index: 808 scientists 46–47 D-Index: 776 scientists 48–49 D-Index: 835 scientists 50–51 D-Index: 861 scientists 52–53 D-Index: 872 scientists 54–55 D-Index: 933 scientists 56–57 D-Index: 1,051 scientists 58–59 D-Index: 930 scientists 60–61 D-Index: 882 scientists 62–63 D-Index: 834 scientists 64–65 D-Index: 731 scientists 66–67 D-Index: 775 scientists 68–69 D-Index: 683 scientists 70–71 D-Index: 646 scientists 72–73 D-Index: 561 scientists 74–75 D-Index: 501 scientists 76–77 D-Index: 437 scientists 78–79 D-Index: 388 scientists 80–81 D-Index: 354 scientists 82–83 D-Index: 292 scientists 84–85 D-Index: 275 scientists 86–87 D-Index: 254 scientists 88–89 D-Index: 235 scientists 90–91 D-Index: 185 scientists 92–93 D-Index: 192 scientists 94–95 D-Index: 155 scientists 96–97 D-Index: 163 scientists 98–99 D-Index: 125 scientists 100–101 D-Index: 105 scientists 102–103 D-Index: 105 scientists 104–105 D-Index: 112 scientists 106–107 D-Index: 88 scientists 108–109 D-Index: 68 scientists 110–111 D-Index: 69 scientists 112–113 D-Index: 65 scientists 114–115 D-Index: 79 scientists 116–117 D-Index: 61 scientists 118–119 D-Index: 44 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 40 scientists 124–125 D-Index: 33 scientists 126–127 D-Index: 26 scientists 128–129 D-Index: 34 scientists 130–131 D-Index: 35 scientists 132–133 D-Index: 25 scientists 134–135 D-Index: 27 scientists 136–137 D-Index: 17 scientists 138–139 D-Index: 16 scientists 140–141 D-Index: 20 scientists 142–143 D-Index: 20 scientists 144–145 D-Index: 15 scientists 146–147 D-Index: 9 scientists 148–149 D-Index: 9 scientists 150–151 D-Index: 16 scientists 152–153 D-Index: 11 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 3 scientists 158 D-Index: 3 scientists 159+ D-Index: 98 scientists
40 D-Index 159+

This scientist: 48 D-Index — 16th percentile

16% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 159 D-Index or more.

Overview

David Scheschkewitz is affiliated with Saarland University in Germany. Their research primarily focuses on materials science and chemistry, with a significant body of work contributing to subfields such as materials chemistry, organic chemistry, inorganic chemistry, electrical and electronic engineering, and physical and theoretical chemistry.

Their research topics cover a broad range of areas including crystallization and solubility studies, X-ray diffraction in crystallography, synthesis and characterization of novel inorganic and organometallic compounds, organometallic complex synthesis and catalysis, organoboron and organosilicon chemistry, coordination chemistry and organometallics, and crystallography and molecular interactions.

Frequent co-authors in their publications include Volker Hüch, Michael Zimmer, Bernd Morgenstern, Nadine E. Poitiers, and Luisa Giarrana.

Their work has been published extensively in various academic venues. The most frequent publication venues include The Cambridge Structural Database, Angewandte Chemie International Edition, Angewandte Chemie, Zeitschrift für anorganische und allgemeine Chemie, and Journal of the American Chemical Society.

Selected recent papers authored or co-authored by David Scheschkewitz are:

  • Molecular Silicon Clusters, 2021, Chemical Reviews
  • Equilibrium Formation of Stable All-Silicon Versions of 1,3-Cyclobutanediyl, 2020, Angewandte Chemie International Edition
  • Metathesis of Ge=Ge double bonds, 2021, Nature Chemistry
  • Exohedral functionalizationvs.core expansion of siliconoids with Group 9 metals: catalytic activity in alkene isomerization, 2020, Chemical Science
  • A Mixed Heavier Si=Ge Analogue of a Vinyl Anion, 2020, Angewandte Chemie International Edition

Best Publications

  • Singlet diradicals: from transition states to crystalline compounds.

    David Scheschkewitz;Hideki Amii;Heinz Gornitzka;Wolfgang W. Schoeller

  • A Tricyclic Aromatic Isomer of Hexasilabenzene

    Kai Abersfelder;Andrew J. P. White;Henry S. Rzepa;David Scheschkewitz

  • Reactivity in the periphery of functionalised multiple bonds of heavier group 14 elements

    Carsten Präsang;David Scheschkewitz

  • A silicon analogue of vinyllithium: structural characterization of a disilenide.

    David Scheschkewitz

  • A T‐Shaped Platinum(II) Boryl Complex as the Precursor to a Platinum Compound with a Base‐Stabilized Borylene Ligand

    Holger Braunschweig;Krzysztof Radacki;Daniela Rais;David Scheschkewitz

  • A molecular silicon cluster with a "naked" vertex atom*.

    David Scheschkewitz

  • Two Si-Si double bonds connected by a phenylene bridge.

    Iulia Bejan;David Scheschkewitz

  • Anionic Reagents with Silicon‐Containing Double Bonds

    David Scheschkewitz

  • A Stable Derivative of the Global Minimum on the Si6H6 Potential Energy Surface

    Kai Abersfelder;Kai Abersfelder;Andrew J. P. White;Raphael J. F. Berger;Henry S. Rzepa

  • The Versatile Chemistry of Disilenides : Disila Analogues of Vinyl Anions as Synthons in Low-valent Silicon Chemistry

    David Scheschkewitz

  • Equilibrium between a cyclotrisilene and an isolable base adduct of a disilenyl silylene

    Michael J. Cowley;Volker Huch;Henry S. Rzepa;David Scheschkewitz;David Scheschkewitz

  • Syntheses of trisila analogues of allyl chlorides and their transformations to chlorocyclotrisilanes, cyclotrisilanides, and a trisilaindane.

    Kai Abersfelder;David Scheschkewitz

  • Ein T‐förmiger Platin(II)borylkomplex als Vorstufe für einen Platinkomplex mit einem basenstabilisierten Borylenliganden

    Holger Braunschweig;Krzysztof Radacki;Daniela Rais;David Scheschkewitz

  • NHC-stabilized silagermenylidene: a heavier analogue of vinylidene.

    Anukul Jana;Volker Huch;David Scheschkewitz

  • Boron as a bridging ligand.

    Holger Braunschweig;George R. Whittell

  • Reversible Base Coordination to a Disilene

    Kinga Leszczyńska;Kai Abersfelder;Andreas Mix;Beate Neumann

  • Boron as a Bridging Ligand

    Holger Braunschweig;Krzysztof Radacki;David Scheschkewitz;George R. Whittell

  • Ein Siliciumanalogon des Vinyllithiums: strukturelle Charakterisierung eines Disilenids†

    David Scheschkewitz

  • Activation of a SiSi Bond by η1-Coordination to a Transition Metal

    Thi-loan Nguyen;David Scheschkewitz

  • σ‐Bond Stretching: A Static Approach for a Dynamic Process

    David Scheschkewitz;David Scheschkewitz;Hideki Amii;Heinz Gornitzka;Wolfgang W. Schoeller

Frequent Co-Authors

Volker Huch
Volker Huch Saarland University
Henry S. Rzepa
Henry S. Rzepa Imperial College London
Vadapalli Chandrasekhar
Vadapalli Chandrasekhar Indian Institute of Technology Kanpur
Guy Bertrand
Guy Bertrand University of California, San Diego
Andrew J. P. White
Andrew J. P. White Imperial College London
Werner Massa
Werner Massa Philipp University of Marburg
Holger Braunschweig
Holger Braunschweig University of Würzburg
Krzysztof Radacki
Krzysztof Radacki University of Würzburg
Akira Sekiguchi
Akira Sekiguchi University of Tsukuba
Didier Bourissou
Didier Bourissou Paul Sabatier University

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