The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Daniel A. Nolan sits on this spectrum.
This scientist: 164 publications — 33rd percentile
33% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 804 publications or more.
The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Daniel A. Nolan sits on this spectrum.
This scientist: 30 D-Index — 1st percentile
1% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 107 D-Index or more.
Daniel A. Nolan is a researcher affiliated with Corning in the United States. Their work spans multiple fields including engineering and computer science, with a primary focus on electrical and electronic engineering and artificial intelligence. Their subfields extend to atomic and molecular physics, optics, ceramics and composites, and materials chemistry.
The scientist's research topics cover a range of areas centered on optical and quantum technologies. These include optical network technologies, quantum information and cryptography, photonic and optical devices, quantum computing algorithms and architecture, neural networks and reservoir computing, quantum optics and atomic interactions, as well as glass properties and applications.
They collaborate frequently with several co-authors, including Dan T. Nguyen, Nicholas F. Borrelli, Wei C. Jiang, Kangmei Li, and Xin Gai, each contributing to multiple joint publications.
Their research has appeared repeatedly in notable venues such as:
Selected recent papers authored by Daniel A. Nolan include:
Giovanni Milione;H. I. Sztul;D. A. Nolan;R. R. Alfano
Hua-Lei Yin;Teng-Yun Chen;Zong-Wen Yu;Hui Liu
Alberto Boaron;Gianluca Boso;Davide Rusca;Cédric Vulliez
Boris Korzh;Charles Ci Wen Lim;Raphael Houlmann;Nicolas Gisin
Giovanni Milione;Martin P. J. Lavery;Hao Huang;Yongxiong Ren
Giovanni Milione;Thien An Nguyen;Jonathan Leach;Daniel A. Nolan
Giovanni Milione;Martin P. J. Lavery;Hao Huang;Yongxiong Ren
Hao Huang;Giovanni Milione;Martin P. J. Lavery;Guodong Xie
Dana Craig Bookbinder;Ming-Jun Li;Daniel Aloysius Nolan
Giovanni Milione;S. Evans;D. A. Nolan;R. R. Alfano
Scott Robertson Bickham;Dana Craig Bookbinder;Xin Chen;Ming-Jun Li
Logan G. Wright;Zhanwei Liu;Daniel A. Nolan;Ming-Jun Li
M.-J. Li;P. Tandon;D.C. Bookbinder;S.R. Bickham
M. J. Li;D. A. Nolan
Darren Rand;Ivan Glesk;Camille Sophie Brès;Daniel A. Nolan
Yisa S. Rumala;Giovanni Milione;Thien An Nguyen;Sebastião Pratavieira
Daniel A. Nolan;George E. Berkey;Ming-Jun Li;Xin Chen
G. A. Nowak;Y.-H. Kao;T. J. Xia;M. N. Islam
D.A. Nolan;Xin Chen;Ming-Jun Li
Ming-Jun Li;D.A. Nolan
Alberto Boaron;Boris Korzh;Raphael Houlmann;Gianluca Boso
Chenan Xia;M. Kumar;Ming-Yuan Cheng;O.P. Kulkarni
Ojas P. Kulkarni;Chenan Xia;Dong Joon Lee;Malay Kumar
Scott R. Bickham;Dana C. Bookbinder;Ming-Jun Li;Snigdharaj K. Mishra
Ming-Jun Li;Xin Chen;D.A. Nolan;G.E. Berkey
Ming-Jun Li;Shenping Li;D.A. Nolan
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