World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
61
Citations
12612
World Ranking
6824
National Ranking
124

C. K. Ong publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where C. K. Ong sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 486 publications — 85th percentile

85% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

C. K. Ong D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where C. K. Ong sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 61 D-Index — 48th percentile

48% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

C. K. Ong is affiliated with the National University of Singapore in Singapore. Their research primarily spans the fields of engineering, materials science, and physics and astronomy, with a focus on several subfields including materials chemistry, atomic and molecular physics and optics, mechanical engineering, electrical and electronic engineering, and electronic, optical, and magnetic materials.

The scientist's work centers on topics related to the magnetic properties of thin films, metallic glasses and amorphous alloys, 2D materials and their applications, magnetic properties and synthesis of ferrites, magnetic properties and applications more broadly, MXene and MAX phase materials, and semiconductor materials and devices.

Frequent collaborators in their research include Kh. Gheisari, Jiahao Chen, Yang Zuo, Jingyu He, and Yulin Yang.

Publications by C. K. Ong have appeared in various scientific venues. These include:

  • SSRN Electronic Journal (2 papers)
  • Physica B Condensed Matter (1 paper)
  • Journal of Superconductivity and Novel Magnetism (1 paper)
  • Advanced Functional Materials (1 paper)

Notable recent papers authored or co-authored by Ong include:

  • "Magnetic properties and thermal stability of nanocrystalline Fe films prepared by oblique sputtering deposition method," published in 2020 in Physica B Condensed Matter
  • "Enhancing High-Frequency Properties of Nanocrystalline Sputtered Fe Thin Films by Using MnIr Underlayer and Oblique Deposition," published in 2020 in Journal of Superconductivity and Novel Magnetism
  • "Tuning Interface Properties of 2d Metal Silicon Nitrides and Their Native High- Κ Dielectric Silicon Nitride," published in 2024 in SSRN Electronic Journal
  • "Nonreciprocal Interaction between Lamb Waves, Shear Horizontal Waves and Spin Waves at Confined Ferromagnetic Heterojunction," published in 2025 in SSRN Electronic Journal
  • "Hierarchical Structure Control and Unconventional Thermal Response of Excitonic Emission in a Superatomic Semiconductor," published in 2025 in Advanced Functional Materials

This collection of work illustrates contributions to the study of magnetic thin films, 2D materials, and semiconductor properties, among other areas. Their research outputs are documented with varying citation counts, reflecting ongoing engagement with topics in materials science and engineering.

Best Publications

  • Effect of Ba doping on magnetic, ferroelectric, and magnetoelectric properties in mutiferroic BiFeO3 at room temperature

    D. H. Wang;W. C. Goh;M. Ning;C. K. Ong

  • Broadband complex permeability characterization of magnetic thin films using shorted microstrip transmission-line perturbation

    Yan Liu;Linfeng Chen;C. Y. Tan;H. J. Liu

  • Particle size influence to the microwave properties of iron based magnetic particulate composites

    L.Z. Wu;J. Ding;H.B. Jiang;L.F. Chen

  • An omnidirectional retroreflector based on the transmutation of dielectric singularities

    Yun Gui Ma;C. K. Ong;Tomáš Tyc;Ulf Leonhardt

  • Fabrication of size-tunable gold nanoparticles array with nanosphere lithography, reactive ion etching, and thermal annealing.

    B. J. Y. Tan;C. H. Sow;T. S. Koh;K. C. Chin

  • Structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputtering

    H.B. Nie;S.Y. Xu;S.J. Wang;L.P. You

  • Magnetic order in Co-doped and (Mn, Co) codoped ZnO thin films by pulsed laser deposition

    L. Yan;C. K. Ong;X. S. Rao

  • High frequency complex permeability of iron particles in a nonmagnetic matrix

    L. Z. Wu;J. Ding;H. B. Jiang;C. P. Neo

  • Improvement of dielectric loss of doped Ba0.5Sr0.5TiO3 thin films for tunable microwave devices

    K. B. Chong;L. B. Kong;LinFeng Chen;L. Yan

  • Epitaxial Y-stabilized ZrO2 films on silicon: Dynamic growth process and interface structure

    S. J. Wang;C. K. Ong

  • Catalyst-free pulsed-laser-deposited ZnO nanorods and their room-temperature photoluminescence properties

    Z. W. Liu;C. K. Ong;T. Yu;Z. X. Shen

  • Room temperature ferroelectric, ferromagnetic and magnetoelectric properties of Ba-doped BiFeO3 thin films

    Meiya Li;Min Ning;Yungui Ma;Qibin Wu

  • Subwavelength imaging by a left-handed material superlens.

    X. S. Rao;C. K. Ong

  • Magnetoelectric effect in epitaxial Pb(Zr0.52Ti0.48)O3∕La0.7Sr0.3MnO3 composite thin film

    Y. G. Ma;W. N. Cheng;M. Ning;C. K. Ong

  • Reaction of SiO2 with hafnium oxide in low oxygen pressure

    S. J. Wang;P. C. Lim;A. C. H. Huan;C. L. Liu

  • Amendment of cavity perturbation method for permittivity measurement of extremely low-loss dielectrics

    Linfeng Chen;C.K. Ong;B.T.G. Tan

  • Nanoporous Ultra‐Low‐κ Films Prepared from Fluorinated Polyimide with Grafted Poly(acrylic acid) Side Chains

    Wen-Cai Wang;Rohitkumar H. Vora;Entang Kang;Koon-Gee Neoh

  • Amplification of evanescent waves in a lossy left-handed material slab

    X. S. Rao;C. K. Ong

  • Improvement of dielectric loss tangent of Al2O3 doped Ba0.5Sr0.5TiO3 thin films for tunable microwave devices

    K. B. Chong;L. B. Kong;Linfeng Chen;L. Yan

  • Microwave attenuation properties of W-type barium ferrite BaZn2−xCoxFe16O27 composites

    Z. W. Li;Linfeng Chen;Yuping Wu;C. K. Ong

  • Scaling of hysteresis dispersion in a model spin system

    J.-M. Liu;J.-M. Liu;J.-M. Liu;Helen L. W. Chan;Chung-loong Choy;C. K. Ong

Frequent Co-Authors

Yuan Ping Feng
Yuan Ping Feng National University of Singapore
Feng Xu
Feng Xu Xi'an Jiaotong University
Shijie Wang
Shijie Wang Agency for Science, Technology and Research
Hao Gong
Hao Gong National University of Singapore
Zhao-Liang Li
Zhao-Liang Li University of Strasbourg
Chorng Haur Sow
Chorng Haur Sow National University of Singapore
Ling Bing Kong
Ling Bing Kong Nanyang Technological University
Andrew T. S. Wee
Andrew T. S. Wee National University of Singapore
Zexiang Shen
Zexiang Shen Nanyang Technological University
Jian-Ping Wang
Jian-Ping Wang University of Minnesota

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