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IEEE

EOS/ESD 2027 — 49th Annual EOS/ESD Symposium and Exhibits (EOS/ESD)

Location: Riverside Convention Center, Riverside, California , United States

Conference dates: 9/19/2027 - 9/24/2027

Research H-index
5

Ranking & Metrics

Discipline name Position Best Scientists Publications D-Index
Electronics and Electrical Engineering 449 13 24 5

Call for Papers

The EOS/ESD Symposium is the annual technical symposium of the EOS/ESD Association on electrostatic discharge and electrical overstress, with IEEE-co-sponsored proceedings. It invites original contributions on electrostatic discharge, electrical overstress, ESD protection design, on-chip ESD, system-level ESD, ESD testing and modelling, manufacturing ESD control. Submissions may take the form of full research papers, extended abstracts and poster presentations reporting theoretical, computational and experimental work, as well as industrial case studies and applications. The meeting brings together researchers, engineers, industry practitioners and students to exchange recent results and discuss emerging directions in the field. Accepted papers are published in the conference proceedings and submitted to IEEE Xplore.

Overview

This comprehensive ranking presents a curated list of scientific conferences in the field of Electronics and Electrical Engineering. The ranking has been meticulously compiled by Research.com, a leading authority in scientific research data across all major disciplines, including Electronics and Electrical Engineering. Since 2014, Research.com has been providing reliable insights and trusted data on scientific achievements and contributions worldwide.

The ranking utilizes a unique bibliometric score, an advanced metric developed by Research.com experts, which combines the estimated h-index and the number of leading scientists who have participated in each conference over the preceding three years. This thorough approach ensures an objective and multifaceted assessment of a conference’s scientific impact and standing within the community.

Impact Score values featured in this ranking were collected on 2024-11-27, reflecting the most up-to-date analysis available. The selection and evaluation process entailed a detailed inspection of more than 2,204 conferences, which were chosen following a rigorous examination of over 95,378 scientific documents published during the last three years. Contributions were assessed from 6,160 established and respected scientists active in Electronics and Electrical Engineering, underscoring the depth and breadth of this analysis.

For an in-depth overview of the methodology and specific criteria used in computing the ranking scores, please refer to our Methodology Page.

Papers citation over time

A key indicator for each conference is its effectiveness in reaching other researchers with the papers published at that venue.

The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.

The top authors publishing at Electrical Overstress/Electrostatic Discharge Symposium (based on the number of publications) are:

  • David Pommerenke (5 papers) published 5 papers at the last edition,
  • Pasi Tamminen (5 papers) published 5 papers at the last edition,
  • Jianchi Zhou (3 papers) published 3 papers at the last edition,
  • Linus Maurer (3 papers) published 3 papers at the last edition,
  • Wolfgang Stadler (3 papers) published 3 papers at the last edition.

The overall trend for top authors publishing at this conference is outlined below. The chart shows the number of publications at each edition of the conference for top authors.

Only papers with recognized affiliations are considered

The top affiliations publishing at Electrical Overstress/Electrostatic Discharge Symposium (based on the number of publications) are:

  • NXP Semiconductors (7 papers) published 7 papers at the last edition,
  • Missouri University of Science and Technology (6 papers) published 6 papers at the last edition,
  • Intel (5 papers) published 5 papers at the last edition,
  • Indian Institute of Science (3 papers) published 3 papers at the last edition,
  • Analog Devices (2 papers) published 2 papers at the last edition.

The overall trend for top affiliations publishing at this conference is outlined below. The chart shows the number of publications at each edition of the conference for top affiliations.

Publication chance based on affiliation

The publication chance index shows the ratio of articles published by the best research institutions at the conference edition to all articles published within that conference. The best research institutions were selected based on the largest number of articles published during all editions of the conference.

The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.

During the most recent 2017 edition, 18.75% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 74.36% were posted by at least one author from the top 10 institutions publishing at the conference. Another 25.64% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 0.00% of all publications and 0.00% were from other institutions.

Returning Authors Index

A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of conferences they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same conference from year to year.

The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the conference in relation to all participants in a given year.

Returning Institution Index

The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.

The experience to innovation index

Our experience to innovation index was created to show a cross-section of the experience level of authors publishing at a conference. The index includes the authors publishing at the last edition of a conference, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).

The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:

  • Novice - P < 5 or C < 25 (the number of publications less than 5 or the number of citations less than 25),
  • Competent - P < 10 or C < 100 (the number of publications less than 10 or the number of citations less than 100),
  • Experienced - P < 25 or C < 625 (the number of publications less than 25 or the number of citations less than 625),
  • Master - P < 50 or C < 2500 (the number of publications less than 50 or the number of citations less than 2500),
  • Star - P ≥ 50 and C ≥ 2500 (both the number of publications greater than 50 and the number of citations greater than 2500).

The chart below illustrates experience levels of first authors in cases of publications with multiple authors.

Related Online Degrees & Career Pathways

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If you're looking for a more accessible start or a way to balance study with work, exploring the easy online college courses related to this field can also be a great option for building knowledge without overwhelming commitment.

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